High-impedance material, and display substrate black matrix and liquid crystal display apparatus containing same
A high-impedance, black-matrix technology, applied in instruments, coatings, optics, etc., can solve the problems of increasing frame width, contradicting the development trend of narrow frame, and increasing cost, and achieve the effect of simple preparation process conditions.
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Embodiment 1
[0055] The component distribution ratio of the high-resistance material in this embodiment is: 230 g of opacifying agent titanium black, 120 g of acrylic resin, 648.8 g of solvent, and 1.2 g of bis-3-(aminopropyl)tetramethylsiloxane as a silane coupling agent.
[0056] Concrete preparation process is as follows:
[0057] Using a homogenizer, mix 230g of titanium black (chemical formula, TiN x o y , x: 0.7~1.0, y: 0.3~0.6) (purchased from Mitsubishi Materials Denkasei Co., Ltd. Titanium Black Electronic Materials), 120g acrylic resin (60% dipentaerythritol hexa(meth)acrylate and 40% diphenoxy ethylene glycol fluorene diacrylate), 648.8g solvent (250g 1,2-propylene glycol methyl ether acetate (PGMEA), 12g ethylene glycol monomethyl ether acetate, 130g ethylene glycol diethyl ether and 256.8g cyclohexane Ketone mixture) was stirred and dispersed for 1 hour to obtain a pre-dispersion, and then, the pre-dispersion was added to a grinder filled with 70% (based on the volume of the...
Embodiment 2
[0061] In addition to 490g of titanium black, 208.8g of acrylic resin, 300g of solvent (117g of 1,2-propylene glycol methyl ether acetate (PGMEA), 3g of ethylene glycol monomethyl ether acetate 0% to 2%, 60g of ethylene glycol diethyl ether and 120g of cyclohexanone). The same method as in Example 1 was used to form a high-resistance material for a resin black matrix, and a black composition comprising 49% titanium black as a light-shielding agent and 20.88% resin was prepared.
[0062] The obtained high-resistance material is coated on glass by a slit coating method to form a black matrix with a thickness of 1.0 um, which can be used in liquid crystal display devices. After testing, the OD value is 5, the resistivity is 6.5E+14Ω.cm, and has high optical density and high resistance.
Embodiment 3
[0064] Except for 200 g of titanium black and 30 g of carbon black, a high resistance material for a resin black matrix was formed in the same manner as in Example 1.
[0065] The obtained high-resistance material is coated on glass by a slit coating method to form a black matrix with a thickness of 1.0 um, which can be used in liquid crystal display devices. After testing, the OD value is 3.5, the resistivity is 4.0E+14Ω.cm, and has high optical density and high resistance.
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