Fabrication of ordered arrays of tio2 nanotubes on al2o3 ceramic substrate
A technology of ordered arrays and ceramic substrates, applied in the field of preparation of one-dimensional nanomaterials, can solve the problems of difficult to obtain nanotube films and difficult separation of nanotube arrays, and achieve the effects of uniform film formation, low price and easy operation
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Embodiment 1
[0031] (1) Put 5×5cm Al 2 o 3 The ceramic sheet was ultrasonically cleaned in acetone, alcohol and deionized water for 10 min in sequence;
[0032] (2) Place the ceramic sheet in (1) in the magnetron sputtering chamber, use DC sputtering titanium target, sputter a layer of pure Ti, sputtering power 200W, sputtering time 1h, pure argon gas flow rate 40sccm, Back vacuum degree 4.0×10 -4 Pa, the sputtering pressure is 0.6pa, and the final titanium film thickness is about 1.5μm;
[0033] (3) To configure anodic oxidation, measure 360mL of glycerin, 40mL of deionized water, and weigh NH 4 F4.7972g.
[0034] (4) Anodize the titanium film obtained in (2) with a voltage of 30V and a time of 1.5h.
[0035] Such as figure 1 Shown is the SEM image of the Ti film after magnetron sputtering (150W, 2h), such as figure 2 As shown, TiO after anodic oxidation 2 SEM image of nanotubes (30V, 1.5h), where: figure 1 It can be clearly seen that the granular Ti, figure 2 It can be observ...
Embodiment 2
[0037] (1) Al 2 o 3 The ceramic sheet was ultrasonically cleaned in acetone, alcohol and deionized water for 10 min in sequence;
[0038] (2) Place the ceramic sheet in (1) in the magnetron sputtering chamber, use DC sputtering titanium target, sputter a layer of pure Ti, sputtering power 150W, sputtering time 2h, pure argon gas flow rate 40sccm, Back vacuum degree 4.0×10 -4Pa, the sputtering pressure is 0.3pa, and the final titanium film thickness is about 1.3μm; the substrate temperature is 200°C;
[0039] (3) Configure the electrolyte for anodic oxidation, measure 360mL of glycerin, 36mL of deionized water, and weigh 4.8034g of NH4F.
[0040] (4) Anodize the titanium film obtained in (2) with a voltage of 30V and a time of 2h.
[0041] Such as image 3 Shown, is the TiO after anodic oxidation 2 SEM images of nanotubes (30V, 2h), where, image 3 TiO can be observed 2 The diameter of the nanotube is 80-100nm, and the thickness of the tube wall is 10-20nm. However, the...
Embodiment 3
[0043] (1) Al 2 o 3 The ceramic sheet was ultrasonically cleaned in acetone, alcohol and deionized water for 10 min in sequence;
[0044] (2) Place the ceramic sheet in (1) in the magnetron sputtering chamber, use DC sputtering titanium target, sputter a layer of pure Ti, sputtering power 180W, sputtering time 2h, pure argon gas flow rate 80sccm, Back vacuum degree 4.0×10 -4 Pa, the sputtering pressure is 0.6pa, and the final titanium film thickness is about 1.3μm; the substrate temperature is 400°C;
[0045] (3) Configure the electrolyte for anodic oxidation, measure 360mL of glycerin, 40mL of deionized water, and weigh 4.8044g of NH4F.
[0046] (4) Anodize the titanium film obtained in (2) with a voltage of 30V and a time of 1h.
[0047] Such as Figure 4 Shown, is the TiO after anodic oxidation 2 SEM images of nanotubes (30V, 1h), where, Figure 4 TiO can be observed 2 The diameter of the nanotube is 70-80nm, and the thickness of the tube wall is 10-20nm.
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