Shell and producing method thereof

A shell and matrix technology, applied in the field of shell and its preparation, can solve the problems of difficult processing and high cost of rare earth

Inactive Publication Date: 2013-01-30
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, rare earths are expensive and difficult to process

Method used

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  • Shell and producing method thereof
  • Shell and producing method thereof

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preparation example Construction

[0022] A method for preparing the casing 10 according to a preferred embodiment of the present invention includes the following steps:

[0023] A substrate 11 is provided.

[0024] The substrate is aluminum, aluminum alloy or magnesium alloy.

[0025] The substrate 11 is put into absolute ethanol for ultrasonic cleaning to remove stains on the surface of the aluminum, aluminum alloy or magnesium alloy substrate 11, and the cleaning time may be 5-10 minutes.

[0026] Argon plasma cleaning is performed on the surface of the aluminum, aluminum alloy or magnesium alloy substrate 11 after the above treatment, so as to improve the bonding force between the surface of the aluminum, aluminum alloy or magnesium alloy substrate 11 and the subsequent coating.

[0027] combined reference figure 2 , provide a vacuum coating machine 20, the vacuum coating machine 20 includes a coating chamber 21 and a vacuum pump 30 connected to the coating chamber 21, the vacuum pump 30 is used to evacu...

Embodiment 1

[0038] The vacuum coating machine 20 used in this embodiment is an intermediate frequency magnetron sputtering coating machine produced by Shenzhen Nanfang Innovation Vacuum Technology Co., Ltd., and the model is SM-1100H.

[0039] The material of the substrate 11 used in this embodiment is aluminum, aluminum alloy or magnesium alloy.

[0040] Plasma cleaning: the argon flow rate is 300 sccm, the bias voltage of the substrate 11 is -80V, and the plasma cleaning time is 15 minutes.

[0041] The aluminum layer 13 was prepared: the argon gas flow rate was 150 sccm, the power of the aluminum target 22 was 3 kw, the bias voltage of the substrate 11 was -80 V, the sputtering temperature was 100° C., and the coating time was 10 min. The aluminum layer 13 has a thickness of 0.3 μm.

[0042] Preparation of Al-Cerium alloy target 23: Mix 70% aluminum and 30% cerium powders uniformly, hot press to form a green body, and sinter at 1200°C for 3 hours.

[0043] Prepare the anti-corrosion ...

Embodiment 2

[0045] The vacuum coating machine 20 used in this embodiment is the same as that in Embodiment 1.

[0046] The material of the substrate 11 used in this embodiment is aluminum-magnesium alloy.

[0047] Plasma cleaning: the argon flow rate is 300 sccm, the bias voltage of the substrate 11 is -80V, and the plasma cleaning time is 15 minutes.

[0048] The aluminum layer 13 was prepared: the argon gas flow rate was 150 sccm, the power of the aluminum target 22 was 3 kw, the bias voltage of the substrate 11 was -80 V, the sputtering temperature was 100° C., and the coating time was 30 min. The aluminum layer 13 has a thickness of 0.4 μm.

[0049] Preparation of alloy target 23: Mix 70% aluminum, 30% cerium, and powder uniformly, hot press to form a green body, and sinter at 1000°C for 4 hours.

[0050] Prepare the anti-corrosion layer 15, the anti-corrosion layer 15 is an Al-Ce-O layer: the power of the alloy target 23 is 12kw, the flow rate of oxygen is 100 sccm, the flow rate o...

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Abstract

The invention provides a shell. The shell comprises a substrate, an Al (aluminum) layer and an anti-corrosion layer, wherein the A1 layer and the anti-corrosion layer are sequentially formed on the surface of the substrate which is made of aluminum or aluminum alloy or magnesium alloy, and the anti-corrosion layer is an Al-Ce (aluminum-cerium) layer or an Al-Ce-O (aluminum-cerium- oxygen) layer. The invention further provides a producing method of the shell. The method includes the step of sequentially forming the Al layer and the anti-corrosion layer on the aluminum substrate or the aluminum alloy substrate or the magnesium alloy substrate. Corrosion resistance of the shell is improved.

Description

technical field [0001] The invention relates to a casing and a preparation method thereof, in particular to a casing with corrosion resistance and a preparation method thereof. Background technique [0002] Vacuum coating technology (PVD) is a very environmentally friendly film-forming technology. The film layer formed by vacuum coating has the advantages of high hardness, high wear resistance, good chemical stability, firm combination with the substrate, and bright metal appearance. Therefore, vacuum coating is used on aluminum, aluminum alloy, magnesium, and magnesium alloys And stainless steel and other metal substrate surface decorative treatment field is more and more widely used. [0003] However, since the standard electrode potential of the aluminum, aluminum alloy or magnesium alloy substrate is very low, and the magnetron sputtering decorative coating itself inevitably has tiny pores, the aluminum, aluminum alloy or magnesium alloy substrate will form a micro-batt...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05K5/04C23C14/16C23C14/08C23C14/35
Inventor 陈文荣陈正士张娟
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
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