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Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition

A technology for coating compositions and polymers, applied to photosensitive materials for opto-mechanical equipment, photo-engraving processes for patterned surfaces, coatings, etc. problem, to achieve the effect of excellent oxygen barrier film and excellent image strength

Inactive Publication Date: 2013-03-27
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this modification causes a decrease in oxygen barrier properties, so that a decrease in sensitivity and printing durability may sometimes occur

Method used

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  • Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition
  • Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition
  • Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition

Examples

Experimental program
Comparison scheme
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preparation example Construction

[0118] Existing radically polymerizable monomers can be preferably used in the production of the polymer (A) according to the present invention, and can be used by being appropriately selected depending on the intended use. Examples of existing monomers include vinyl acetate, acrylic acid, methacrylic acid, acrylates, methacrylates, acrylonitrile, methacrylonitrile, acrylamide, methacrylamide, styrene, itaconic acid, itaconic acid, Conate esters, itaconamides, fumaric acid, fumarate esters, fumaramides, maleic acid, maleate esters, and maleamides. Specific examples of esters include methyl esters, ethyl esters, butyl esters, isobutyl esters, t-butyl esters, benzyl esters, hexyl esters, cyclohexyl esters, 2-ethylhexyl esters, and dodecyl esters. Specific examples of amides include acetamide, formamide, isopropanamide, diformamide, morpholinoamide and 1-sulfo-2-methyl-2-propylamide.

[0119] Specific examples of the polymer A for use in the present invention are given below, bu...

Embodiment 1 and 2 and comparative example 1

[0309] [Preparation of carrier]

[0310] A JISA 1050 aluminum plate having a thickness of 0.30 mm and a width of 1,030 mm was continuously subjected to surface treatment as shown below.

[0311] (a) The etching treatment of the aluminum plate is carried out by spraying an aqueous solution having a sodium hydroxide concentration of 2.6% by weight, an aluminum ion concentration of 6.5% by weight, and a temperature of 70° C. 2 amount to dissolve the aluminum plate. Subsequently, the plate is washed by spraying with water.

[0312] (b) Desmutting of the aluminum plate was carried out by spraying a 1% by weight aqueous solution of nitric acid (containing 0.5% by weight of aluminum ions) at a temperature of 30°C. Subsequently, the plate is washed by spraying with water.

[0313](c) The electrochemical surface roughening treatment of the aluminum plate was continuously performed by using an alternating voltage of 60 Hz. The electrolytic solution used was a 1% by weight aqueous so...

Embodiment 3 to 5 and comparative example 2 and 3

[0356] [Preparation of carrier]

[0357] The surface of an aluminum plate of 1S material having a thickness of 0.30 mm was grained using a No. 8 nylon brush and an aqueous suspension containing 800 mesh pumice, and then thoroughly washed with water. The plate was etched by dipping in a 10% by weight aqueous sodium hydroxide solution at 70°C for 60 seconds, washed with running water, then washed with a 20% by weight nitric acid aqueous solution for neutralization, and washed with water. Then use the AC waveform current of the sine wave in 1% by weight of nitric acid aqueous solution at 300C / dm under the condition of VA=12.7V 2 Electrolytic surface roughening treatment is performed on the plate during anodic oxidation. The surface roughness of the plate was measured and found to be 0.45 μm (in Ra). Subsequently, the board was dipped in a 30% by weight sulfuric acid aqueous solution at 55° C. for 2 minutes for desmutting. Afterwards, while placing the cathode on the grained su...

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Abstract

The invention is directed to a coating composition containing a polymer having a structural unit represented by the following formula (1), an image-forming material including, in the following order: a support; a photosensitive layer containing a radical polymerizable compound and a photo initiator; and a protective layer containing the coating composition, a lithographic printing plate precursor including, in the following order: a support; a photosensitive layer containing a radical polymerizable compound and a photo initiator; and a protective layer containing the coating composition, and an oxygen-blocking film including a layer containing the coating composition: wherein M n+ represents a cation having an n-valent positive charge and n represents an integer of from 1 to 4.

Description

technical field [0001] The present invention relates to a coating composition containing a polymer having a specific repeating unit, and an oxygen barrier film, an image forming material, and a lithographic printing plate precursor using the coating composition. Background technique [0002] Polyvinyl alcohol (PVA) has high oxygen barrier properties and is used as a protective layer for preventing oxygen inhibition of an image forming material having a radically polymerizable photosensitive layer. In particular, in the field of lithographic printing plate precursors, PVA-containing plates that provide the function of an oxygen barrier for preventing oxygen inhibition of a radically polymerizable photosensitive layer and a protective function for preventing occurrence of scratches during transportation or handling are used. The protective layer. [0003] As for a lithographic printing precursor capable of on-press development, for example, US2003 / 0064318A1 describes a lithog...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D133/14C09D7/12G03F7/11G03F7/09
CPCG03F7/092
Inventor 大桥秀和
Owner FUJIFILM CORP