Magnesium-based metallic glass film and its preparation method and application
A magnesium-based metallic glass and thin film technology, which is applied in the coating process of metal materials, vacuum evaporation coating, coating, etc., can solve the problems such as difficult adjustment, and achieve easy plastic forming, high thermal stability, and wide annealing temperature range Effect
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Embodiment 1
[0045] The general chemical formula of the magnesium-based metallic glass film of the present embodiment is Mg 58.01 Cu 28.81 Y 13.18 , the thickness of the film is 221nm, and the film substrate is a single crystal silicon wafer or an ordinary glass wafer.
[0046] The magnesium-based metallic glass film described in this embodiment is prepared by the following steps:
[0047] 1) The alloy target is prepared by using Mg, Cu and Y with a purity of 99.98% as the raw material according to the atomic ratio of 65:25:10. The preparation method of the alloy target is melting and smelting. The target is placed in the target position of the sputtering table as a target for sputtering. The ratio of Mg, Cu, and Y is not limited to 65:25:10, and other ratios may also be adopted.
[0048] 2) Put monocrystalline silicon wafers and ordinary glass wafers into ethanol for ultrasonic cleaning for a certain period of time (for example, 10 minutes), then put them in acetone for ultrasonic cle...
Embodiment 2
[0059] The average chemical composition of the magnesium-based nanocrystalline film of the present embodiment is Mg 58.01 Cu 28.81 Y 13.18 , the thickness of the film is 221nm, and the film substrate is a single crystal silicon wafer or an ordinary glass wafer.
[0060] The magnesium-based nanocrystalline film in the present embodiment is prepared by the following steps: the Mg in the embodiment 1 58.01 Cu 28.81 Y 13.18 The amorphous film was annealed in high vacuum with a vacuum degree of 1.1×10 -4 Pa, the annealing temperature is 623K, and the annealing time is 30min.
[0061] The above-mentioned magnesium-based nanocrystalline film was tested using the same method and equipment as in Example 1.
[0062] The test results are as follows:
[0063] (1) Figure 7 It is a scanning electron microscope on the surface of the sample, and the figure shows that uniformly distributed nanocrystal grains appear on the surface of the sample, and the roughness increases.
[0064] (...
Embodiment 3~6
[0069] The preparation method of the magnesium-based metallic glass films in Examples 3 to 6 is basically the same as in Example 1, except that the sputtering parameters are changed, and the sputtering parameters and the general chemical formula of the prepared films are shown in Table 1. :
[0070] Table 1: Composition and sputtering parameter list of magnesium-based metallic glass films in Examples 3-6
[0071] Example
Sputtering power
target base distance
Sputtering argon pressure
3
Mg 46.30 Cu 28.96 Y 24.74
60W
120mm
0.3Pa
4
Mg 54.96 Cu 24.61 Y 20.43
60W
120mm
0.4Pa
5
Mg 51.73 Cu 25.87 Y 22.46
60W
120mm
0.6Pa
6
Mg 48.36 Cu 28.52 Y 23.06
60W
120mm
0.7Pa
[0072] Using the same annealing process as in Example 2, Examples 1 and 3-6 were respectively annealed to crystallize.
[0073] Carry out four-probe resi...
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