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Device for removing harmful impurities in chrome plating solution

A technology of harmful impurities and equipment, applied in the field of electroplating, can solve the problems of increased operating cost, complicated operation, low acid resistance, etc., and achieves the effects of fast processing speed, simple operation and low cost

Active Publication Date: 2013-07-31
太原特益达科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The combination of perfluorosulfonic acid type homogeneous ionic membrane and diatomite, for example: CN102206849A, has a high speed of processing harmful metal impurities, but due to the use of diatomite, the acid resistance is low, the service life is short, and the operating cost is increased
[0007] Also, another method is to use cation exchange resin, but this method occupies a large area, the resin is easy to age, the operation is complicated, and the operating cost is very high

Method used

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  • Device for removing harmful impurities in chrome plating solution
  • Device for removing harmful impurities in chrome plating solution
  • Device for removing harmful impurities in chrome plating solution

Examples

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Embodiment 1

[0060] Such as Figure 1-3 As shown, the equipment for removing harmful impurities in the chrome-plating solution of the present invention includes several electrolysis units, and the electrolysis units include: anode 2, cathode 4, and an electrolytic diaphragm (porous electrolysis membrane) between the anode 2 and cathode 4. diaphragm or composite porous electrolytic diaphragm) 1.

[0061] The anode 2 is a metal anode with a six-sided honeycomb structure. The six sides of the honeycomb structure are a mesh structure. The cross-section of the honeycomb structure is a regular hexagon. The diagonal distance of the regular hexagon is defined as the diameter of the honeycomb structure. Within the range of 50mm-500mm, the interior of the six-sided honeycomb structure of the anode 2 is an electrolytic diaphragm 1; the anode 2 uses titanium or titanium alloys and titanium-based oxides, and it is recommended to use titanium-based lead dioxide or yttrium oxide (IrO) or lead dioxide (P...

Embodiment 2

[0070] Figure 5 with Image 6 , is a bird's-eye view and a three-dimensional schematic diagram of a square open electrolytic diaphragm and a plate-shaped lead or lead alloy anode.

[0071] The conductive anode 2' is plate-shaped, and the material is made of lead or lead alloy plate or titanium or titanium alloy or titanium-based oxide plate. The surface of the plate shape can be made into corrugated shape or porous shape to realize area increase. big. It is recommended to use titanium-based lead dioxide or yttrium oxide (IrO) or lead dioxide (PbO 2 ) or lead-tin alloy (containing tin 6-15%). The honeycomb structure of the anode 2 enhances the effective area of ​​the surface anode electrode, and the electrode reaction is sufficient to generate a series of strong oxidants such as ozone, hydrogen peroxide, hydroxyl radicals, peroxyl radicals, and oxygen free radicals to oxidize trivalent chromium to hexavalent chromium faster and more thoroughly. The reduction of hexavalent...

Embodiment 3

[0078] Such as Figure 7 As shown, the liquid flow direction of the pipeline is determined to have two sets of circulation systems, including one is the circulation system of the "chromic acid-sulfuric acid" type solution to be treated, and the other is the circulation system of the electrolytic impurity precipitation electrolyte.

[0079] This embodiment is a diaphragm electrolyzer device for quickly removing harmful impurities in a "chromic acid-sulfuric acid" type solution, including an electrolytic cell 8, two circulation systems, and a chromium mist purification device 11 placed above the electrolytic cell 8 , the two ends of the first circulation system are respectively located near the anode 2 at the two ends of the electrolytic cell 8, and are sequentially connected with a liquid level controller 14, a self-priming pump 10, a container 15 containing the solution to be treated, and a filter through pipelines 9. Flow controller 17, the chromium plating solution to be tre...

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Abstract

The invention discloses a device for removing harmful impurities in a chrome plating solution. The device comprises multiple electrolysis units. Each one of the multiple electrolysis units comprises an anode, a cathode, and a porous electrolysis diaphragm or a composite porous electrolysis diaphragm between the anode and the cathode. The porous electrolysis diaphragm comprises 50 to 80 parts of aggregate, 5 to 15 parts of a dispersant, 0.2 to 1 part of a binder, 0.1 to 0.5 parts of a nonionic surfactant and 5 to 15 parts of a pore forming agent. The porous electrolysis diaphragm has porosity of 30 to 85% and a pore size of 0.001 to 1 micrometer. The composite porous electrolysis diaphragm is prepared by sandwiching a perfluorinated sulfonic acid-type homogeneous-phase cation exchange diaphragm between the two porous electrolysis diaphragms. The device can fast remove harmful metal ions in a chrome plating solution, can reduce trivalent chromium ion content of a plastic electroplating roughing solution, has a small volume, is convenient for operation, and has a fast treatment rate and a low cost.

Description

technical field [0001] The invention relates to a device for quickly removing impurities (harmful metal ions) in a chromium plating solution and a device for quickly reducing the content of trivalent chromium ions in a chromic anhydride sulfuric acid solution for plastic electroplating, and relates to the technical field of electroplating. Background technique [0002] In the chrome plating process, it includes decorative chromium plating solution and functional chromium plating solution (hard chromium plating solution). Harmful impurities in the chromium plating solution include iron ions, copper ions, calcium ions, nickel ions, zinc ions, sodium ions, potassium ions, chloride ions, nitrate ions and excessive trivalent chromium ions. When the total content of harmful metal ions exceeds 15 g / L, the plating solution cannot be electroplated normally, the bright range becomes narrower, the depth capability decreases, the throwing ability becomes worse, and the current efficienc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25D21/18C25D3/04C25B9/17C25B9/19
Inventor 闫瑞景
Owner 太原特益达科技有限公司