Preparation process method for 6LiF/BC4 composite neutron conversion film for 4H-SiC-matrix neutron detector
A neutron detector and conversion film technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of film layer peeling and interface bonding performance deterioration.
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Embodiment 1
[0028] The 4H-SiC based neutron detector of the present embodiment is used 6 LiF / BC 4 The preparation process of composite conversion film is as follows:
[0029] a. Put the substrate material 4H-SiC matrix into acetone and absolute ethanol in sequence for 20 minutes of ultrasonic cleaning, take out and dry after fully cleaning;
[0030] b. The single crystal 4H-SiC substrate cleaned in step a, 6 Li concentration of 90% 6 LiF target and 10 BC with B concentration of 96% 4 The target is placed in the vacuum chamber of the reactive magnetron sputtering coating vacuum furnace, and then vacuumed to 5.0×10 -4 Pa, the impurities in the single crystal 4H-SiC substrate were removed by biased reverse sputtering cleaning, the power of reverse sputtering cleaning was 120 W, and the bias voltage was -500 V; the impurities were removed by pre-sputtering cleaning 6 LiF target and BC 4 The impurity of the target material, the power of pre-sputtering cleaning is 120 W, the bias volta...
Embodiment 2
[0036] The 4H-SiC based neutron detector of the present embodiment is used 6 LiF / BC 4 The preparation process of the composite conversion film is basically the same as in Example 1, except that the reactive magnetron sputtering coating vacuum furnace is evacuated to 4.0×10 -4 Pa, the power of reverse sputter cleaning is 100 W, the bias voltage is -400 V; the power of pre-sputter cleaning is 100 W, the bias voltage is -100 V, the flow rate of argon gas is 160 Sccm, the reverse sputter cleaning and pre-sputter cleaning The vacuum degree of sputter cleaning operation is 1.5 Pa absolute pressure. The power of sputtering deposition is 100 W, the flow rate of argon gas is 150 Sccm, and the vacuum degree of sputtering deposition operation is an absolute pressure of 0.43 Pa; BC 4 The coating sputter deposition operation process is a continuous operation process. sputter deposition 6 LiF / BC 4 The coating thicknesses were 1.5 μm and 0.5 μm, respectively, and the vacuum degree in t...
Embodiment 3
[0038] in deposition 6 LiF / BC 4 Composite conversion film process, deposition 6 LiF and BC 4 Coating thickness also affects the detection efficiency of the detector. This embodiment 6 LiF / BC 4 The coating equipment and other process conditions used for the conversion film preparation are all the same as in Example 1, and keep 6 LiF / BC 4 The total thickness of the composite conversion film is controllable at 2.0 μm, which is selected during deposition 6 LiF coating thickness 1.0 μm, BC 4The thickness of the coating is 1.0 μm, and the prepared conversion film layer can also pass 6 Li(n,α) 3 H and 10 B(n, α) 3 α produced by the H reaction, 7 Li and T particle energy spectrum test the incident neutron signal to improve the detection efficiency.
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