A ceria-based electrolyte separator for solid oxide fuel cells and its preparation
A solid oxide, fuel cell technology, used in solid electrolyte fuel cells, fuel cells, battery pack components, etc., can solve the problems of poor chemical and thermal compatibility, poor contact performance, etc., to improve long-term stability and reliability. performance, improved contact performance, improved matching effect
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Embodiment 1
[0025] In nickel oxide with Y 2 o 3 Stable ZrO 2 Composite anode / Y 2 o 3 Stable ZrO 2 Sputtering Dense Gd on Membrane Electrode (NiO-YSZ / YSZ) 2 o 3 Doped CeO 2 (Gd 0.1 Ce 0.9 o 1.95 ) Electrolyte interlayer, ultrasonically clean the anode-supported membrane electrode with acetone, ethanol, and distilled water in sequence and dry it, then put it into the vacuum chamber of the magnetron sputtering instrument, adjust the target base distance to about 6cm, and use cerium / Gadolinium alloy material is used as the target material, the purity of the target material is above 99.99%, the cerium / gadolinium molar ratio is 9 / 1, and the vacuum is 8*10 -4 Pa, and then heated the substrate stage, the temperature was raised to 400°C, the argon flow was 30.0sccm, the oxygen flow was 3.0sccm, and the sputtering power was 10W / cm 2 , the sputtering pressure is 0.5Pa, the rotation speed of the substrate stage is set at 5 revolutions / min, the thickness is about 350nm, and the dense and d...
Embodiment 2
[0027] In nickel oxide with Y 2 o 3 Stable ZrO 2 Composite anode / Sc 2 o 3 Stable ZrO 2 Sputtering dense Sm on the membrane electrode (NiO-YSZ / ScSZ) 2 o 3 Doped CeO 2 (Sm 0.2 Ce 0.8 o 1.9 ) Electrolyte interlayer, adjust the target base distance to about 7cm, use cerium / samarium alloy material as the target material, the purity is above 99.9%, the molar ratio of cerium / samarium is 8 / 2, and vacuumize to 8*10 -4 Pa, then heat the substrate stage, the temperature rises to 300°C, the flow rate of argon gas is 40.0 sccm, the flow rate of oxygen gas is 3.0 sccm, and the sputtering power is 8W / cm 2 , the sputtering pressure is 1.0Pa, the thickness is about 600nm, the rotation speed of the substrate table is set at 10 cycles / min, and the dense Sm 0.2 Ce 0.8 o 1.9 After the sputtering of the interlayer, the temperature is lowered to 30°C, the flow rate of argon gas is 20.0 sccm, the flow rate of oxygen gas is 2.0 sccm, and the sputtering power is 3W / cm 2 , the sputtering p...
Embodiment 3
[0029] In nickel oxide with Y 2 o 3 Stable ZrO 2 Composite anode / Y 2 o 3 Stable ZrO 2 Sputtering dense Y on membrane electrode (NiO-YSZ / YSZ) 2 o 3 Doped CeO 2 (Y 0.11 Ce 0.89 o 1.95 ) Electrolyte interlayer, the target base distance is about 9cm, the target material is cerium-yttrium alloy material, the purity is above 99.9%, the molar ratio of cerium / yttrium is 88 / 12, and the vacuum is 8*10 -4 Pa, then heat the substrate table, the temperature rises to 650°C, the argon flow rate is 40 sccm, the oxygen flow rate is 3 sccm, and the sputtering power is 12W / cm 2 , the sputtering pressure is 1.2Pa, the rotation speed of the substrate stage is set at 6 cycles / min, the thickness is about 800nm, and the dense Y 0.11 Ce 0.89 o 1.95 After the sputtering of the interlayer, the temperature of the substrate table is lowered to room temperature, and the sputtering of the loose layer is performed, the oxygen flow rate is 2 sccm, the argon gas flow rate is 30 sccm, and the sputt...
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