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Preparation method of aluminium-doped cerium-zirconium solid-solution polishing powder

A cerium-zirconium solid solution and polishing powder technology, which is applied in the manufacture of semiconductor/solid-state devices, electrical components, circuits, etc., can solve the problems of surface scratches, increased surface roughness, and difficulty in forming solid solutions for polished workpieces with doped amounts, and achieve raw materials Inexpensive, uniform particle size, significant synergistic polishing effect

Active Publication Date: 2014-11-26
HUNAN HAOZHI TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, CeO 2 with Al 2 o 3 It is difficult to form a solid solution, and Al 2 o 3 and ZrO 2 Abrasive particle size and hardness are larger, in CeO 2 The increase of the amount of doping in the medium is likely to cause scratches on the surface of the polished workpiece and increase the surface roughness
Therefore, the existing Zr or Al-doped CeO 2 Polishing powder is rarely used in the field of high-grade optical processing

Method used

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  • Preparation method of aluminium-doped cerium-zirconium solid-solution polishing powder

Examples

Experimental program
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Effect test

Embodiment 1

[0025] The specific preparation steps of this implementation are as follows:

[0026] (1) Preparation of colloidal solution:

[0027] ①. Disperse 9 g of pseudo-boehmite into 80 ml of pure water under high-speed stirring to obtain a solid-liquid mixed slurry for subsequent use;

[0028] 2. Slowly add 3 ml of hydrochloric acid with a mass fraction of 38% dropwise to the standby solid-liquid mixed slurry, and carry out peptization to obtain an aluminum hydroxide colloidal solution for subsequent use;

[0029] ③. Disperse 13.5 g of citric acid in the aluminum hydroxide colloidal solution, and mix well to obtain the colloidal solution A;

[0030] 2. Preparation of mixed system:

[0031] 1. 250 g of cerium carbonate and 11.2 g of zirconium carbonate are dissolved in hydrochloric acid with a mass fraction of 38% respectively, and the pH value of the solution is controlled between 1-1.5. After the dissolution is complete, cerium chloride solution and zirconium chloride solution are ...

Embodiment 2

[0041] This embodiment is basically the same as Embodiment 1, except that the content of zirconium is 4%, and the content of aluminum is 1%.

Embodiment 3

[0043] This embodiment is basically the same as Embodiment 1, except that the content of zirconium is 2%, and the content of aluminum is 1%.

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Abstract

The invention discloses a preparation method of aluminium-doped cerium-zirconium solid-solution polishing powder and relates to the technical field of preparation of the polishing powder materials. The preparation method disclosed by the invention comprises the following steps of (1) preparation of colloidal solution; (2) preparation of a mixed system; (3) coprecipitation; and (4) roasting and aftertreatment. The preparation method disclosed by the invention has the characteristics of simple preparation process, cheap and easily available materials and suitability for industrial production and the like, is applicable to the field of processing of high-grade optical instruments and can be especially used for precise optical-glass polishing.

Description

Technical field: [0001] The invention relates to the technical field of preparation of polishing powder materials, in particular to a preparation method of aluminum-doped cerium-zirconium solid solution polishing powder. Background technique: [0002] Due to CeO 2 -ZrO 2 Composite oxide solid solutions have a wide range of applications in the fields of catalysis, fuel cells, ceramics, etc. Therefore, they have received widespread attention from scholars at home and abroad. The research on its synthesis method and application performance has also been quite extensive, but most of them are carried out for the application targets such as catalysis and ceramics, CeO 2 -ZrO 2 The application of composite oxide solid solution as abrasive in the field of chemical mechanical polishing is rare. In fact, CeO 2 and ZrO 2 Both oxides can be used in the polishing of optical glass, especially CeO 2 The application of base polishing powder in cold processing of glass surface, flat g...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/304
Inventor 杨广乾巩强
Owner HUNAN HAOZHI TECH
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