Local aluminum back surface field solar battery with two diaphanous faces and preparation method thereof
A solar cell, aluminum back field technology, applied in photovoltaic power generation, circuits, electrical components, etc., can solve problems such as affecting photoelectric conversion efficiency, and achieve the effect of improving photoelectric conversion efficiency, reducing dosage, and promoting photoelectric performance.
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[0040] Example 1
[0041] This embodiment illustrates the structure of a double-sided light-transmitting partial aluminum back field crystalline silicon solar cell and its preparation method (see the cell cross-sectional view figure 1 ),Specific steps are as follows:
[0042] A. Select lightly doped p-type monocrystalline silicon wafers with a resistivity of 0.1-10 Ω·cm, and place them in the texturing tank, in a sodium hydroxide deionized water solution with a weight percentage of 0.5-5% In the process, the surface is textured at a temperature of 75~90℃ to form a suede structure;
[0043] B. Clean the surface of the silicon wafer. The cleaning uses a chemical solution for cleaning. The chemical solution can be one or more mixed aqueous solutions of hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid and other additives. The cleaning time can be 0.5 to 60 minutes. The temperature can be 5~90℃;
[0044] C. After cleaning the above texturing sheet, place it in a furnace t...
Example Embodiment
[0057] Example 2
[0058] This embodiment illustrates the structure of a double-sided light-transmitting partial aluminum back field crystalline silicon solar cell and its preparation method (see attached for the cross-sectional view of the cell) figure 1 ),Specific steps are as follows:
[0059] A. Select lightly doped p-type polycrystalline silicon wafers with a resistivity of 0.1-10 Ω·cm, and place them in the texturing tank, in a sodium hydroxide deionized water solution with a weight percentage of 0.5 to 5%, Under the condition of temperature of 75~90℃, the surface is textured to form suede structure;
[0060] B. Clean the surface of the silicon wafer with a chemical solution. The chemical solution is one or more mixed aqueous solutions of hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid and other additives. The cleaning time is 0.5 to 60 minutes and the temperature is 5 ~90℃;
[0061] C. After cleaning the above texturing sheet, place it in a furnace tube at 70...
Example Embodiment
[0069] Example 3
[0070] This embodiment illustrates the structure of a double-sided light-transmitting partial aluminum back field crystalline silicon solar cell and its preparation method (see the cell cross-sectional view figure 1 ),Specific steps are as follows:
[0071] A. Select lightly doped p-type monocrystalline silicon wafers with a resistivity of 0.1-10 Ω·cm, and place them in the texturing tank, in a sodium hydroxide deionized water solution with a weight percentage of 0.5-5% In the process, the surface is textured at a temperature of 75~90℃ to form a suede structure;
[0072] B. Clean the surface of the silicon wafer. The cleaning uses a chemical solution for cleaning. The chemical solution can be one or more mixed aqueous solutions of hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid and other additives. The cleaning time can be 0.5 to 60 minutes. The temperature can be 5~90℃;
[0073] C. After cleaning the above texturing sheet, place it in a furnace t...
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