Method for plating metal surface with diamond-like carbon (DLC) film

Abstract

The invention discloses a method for plating a metal surface with a diamond-like carbon (DLC) film. The method comprises the following main steps: (1) performing ultrasonic cleaning and vacuumizing; (2) performing ion cleaning, introducing argon gas, and opening an ion cleaning source to generate a large amount of argon ions to bombard the surface of a workpiece; (3) loading negative bias voltage between the metal workpiece and a vacuum chamber and opening a titanium electric-arc source to deposit a titanium transition layer on the surface of the metal workpiece; (4) introducing nitrogen gas and depositing a titanium nitride transition layer on the surface of the metal workpiece; (5) starting pulsed arc discharge, introducing hydrocarbon gas into a film plating chamber, and allowing carbon ions generated by pulse discharge and high-energetic neutral atoms of carbon to collide with hydrocarbon gas molecules so as to generate new carbon ions flying to the surface of the workpiece, thereby forming the diamond-like carbon film. The matching performance of the diamond-like carbon film and metal materials is well enhanced by means of depositing the transition layers, so that the diamond-like carbon film can be well adhered to the metal surface and the thickness of the film can achieve 1 micron meter.

Description

technical field [0001] The invention relates to a method for preparing a diamond-like film, in particular to a method for plating a diamond-like film on a metal surface. Background technique [0002] As a new type of hard film material, diamond like carbon-DLC (DLC film) has a series of properties such as high hardness, high wear resistance, high thermal conductivity, high resistivity, good optical transparency, and chemical inertness. Excellent performance, can be widely used in mechanical, electronic, optical, thermal, acoustic, medical and other fields. Its preparation mainly includes physical vapor deposition (PVD) and chemical vapor deposition (CVD) methods, which use evaporating ionized graphite targets and decomposing ionized hydrocarbon gases respectively to obtain carbon ions with considerable energy hitting the surface of the substrate to form a diamond structure. film. [0003] Non-equilibrium magnetron sputtering, multi-arc ion plating, magnetic filter cathodic...

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved in the present invention is to overcome the respective defects of the existing physical vapor deposition method and chemical vapor deposition method, especially for the shortcomings of poor adhesion and small film thickness of the diamond-like film on the metal base material, and provide a method that can effectively improve The diamond-like carbon film is compatible with the metal material, and the method for coating the metal surface of the film with a diamond-like carbon film can increase the adhesion and thickness of the film