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Preparation method of solar cell with electroplated silver electrodes

A solar cell and electroplating silver technology, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of poor passivation effect on the front surface and back surface of the battery, low conversion efficiency of long-wave and short-wave bands, and large battery series resistance, etc., to achieve high Good aspect ratio, improved reflectivity, enhanced absorption effect

Inactive Publication Date: 2014-03-26
SHANGHAI WELNEW MICRO ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In view of the shortcomings of the above-mentioned existing production technology that solar cells cannot be printed very thin on the grid line of the battery, the series resistance of the battery is too large, the passivation effect of the front surface and the back surface of the battery is poor, and the conversion efficiency of long-wave and short-wave bands is low, the applicant provides electroplating silver. Electrode solar cell preparation method, thereby reducing production costs and achieving manufacturing conditions for large-scale mass production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0029] The preparation method of the electroplated silver electrode solar cell of the present embodiment comprises the following steps:

[0030] Step 1: Carry out back polishing treatment on the silicon wafer and perform chemical cleaning;

[0031] The second step: use HF / HON3 etching method to make suede on the surface of the silicon wafer, and perform chemical cleaning and drying;

[0032] The third step: Phosphorus doping is carried out on the front and back of the battery at the same time to complete the preparation of the PN junction;

[0033] Step 4: Use In-line acid etching equipment to complete the isolation of the edge PN junction and remove the phosphosilicate glass on the surface;

[0034] Step 5: Use a tubular diffusion furnace to perform thermal oxidation on the front and back of the battery at the same time to prepare the SIO2 film;

[0035] Step 6: Prepare SIN film on the front and back of the battery by PECVD;

[0036] Step 7: Use screen printing equipment t...

Embodiment 1

[0049] Step 1: Use RENA’s PSG equipment to polish the back of the silicon wafer, and perform chemical cleaning, use spray cleaning, and use HF / HAC / additive to synthesize the mixed acid to clean the surface of the silicon wafer. The cleaning temperature is 25 ° C. The time is: 1min;

[0050] The second step: use HF / HON3 etching method to make suede on the surface of the silicon wafer, and perform chemical cleaning and drying;

[0051] The third step: Phosphorus doping is carried out on the front and back of the battery at the same time to complete the preparation of the PN junction;

[0052] Step 4: Use In-line acid etching equipment to complete the isolation of the edge PN junction and remove the phosphosilicate glass on the surface;

[0053] Step 5: Use a tubular diffusion furnace to perform thermal oxidation on the front and back of the battery at the same time. The temperature of thermal oxidation is 600 ° C, and prepare the SiO2 film;

[0054] Step 6: Prepare SiN film on...

Embodiment 2

[0062] After the monocrystalline silicon wafer is subjected to alkali texturing, use RENA's PSG equipment for rough polishing, and complete the diffusion of 70ohm, and then complete the preparation of 20nm SiO2 film on the front and back of the battery, and then prepare the preparation of 60nm SiN film, and use screen printing The technology produces the first layer of 30um grid lines with a height of about 5um, and then uses electroplating technology to expand to a grid line width of 40um, and the height is superimposed to about 10um, and finally achieves a battery conversion efficiency of 19.6%, compared with 1.0% for conventional batteries The gain, but thanks to the reduction of silver paste and the gain of efficiency, the final cost per unit watt value has not increased.

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Abstract

A preparation method of a solar cell with electroplated silver electrodes includes the steps: firstly, polishing a silicon slice; secondly, manufacturing, chemically cleaning and spin-drying suede on the surface of the silicon slice by an HF / HON3 corrosion method; thirdly, simultaneously doping phosphor on the front surface and the back surface of the cell to complete PN junction; fourthly, isolating edge PN junction and removing phosphosilicate glass on the surface by an In-line acid corrosion device; fifthly, simultaneously performing heat oxidation on the front surface and the back surface of the cell to prepare a SiO2 film; sixthly, preparing SiN films on the front surface and the back surface of the cell by PECVD (plasma enhanced chemical vapor deposition); seventhly, manufacturing a front silver electrode and a back silver electrode on the front surface and the back surface of the cell; eighthly, alloying silver-silicon alloys; ninthly, completing preliminary test including power test, conductivity test and strength test on the cell; tenthly, simultaneously electroplating silver on the silver electrodes on the front surface and the back surface of the cell and heightening grid lines; eleventhly, drying the electroplated slice; twelfthly, performing second efficiency test on the cell and packaging the cell in a grading manner. The solar cell is low in cost and convenient and reliable to prepare.

Description

technical field [0001] The invention relates to the technical field of solar cell manufacturing, in particular to a high-efficiency, low-cost and mass-producible method for preparing an electroplated silver electrode solar cell. Background technique [0002] Due to the structural and technological problems of traditional solar cells, the contradiction between the short-wave response of the solar spectrum and the series resistance restricts the photoelectric conversion efficiency of the cell, in order to solve the contradiction between the two. In recent years, people have applied a lot of advanced technologies to improve these problems, and the technologies that can be mass-produced and mass-produced have attracted much attention, and the representative ones are: 1) Selective emitter cells (SE solar cells), in metallization A highly phosphorus-doped deep diffusion region is formed under the electrode grid line to form a good ohmic contact; a low phosphorus-doped shallow diff...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0224
CPCH01L31/022425H01L31/1804Y02E10/547Y02P70/50
Inventor 谭伟肖笛
Owner SHANGHAI WELNEW MICRO ELECTRONICS