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A kind of sapphire wafer polishing waste liquid sewage treatment method

A sewage treatment method and sapphire wafer technology, which are applied in the fields of energy wastewater treatment, water/sewage multi-stage treatment, water/sludge/sewage treatment, etc., which can solve the problem of slow natural water removal, secondary environmental pollution, and acid pollution. and other problems, to achieve the effect of prolonging the period of sludge cleaning, obvious direct economic benefits, and reducing organic matter components

Active Publication Date: 2015-08-19
YANGZHOU MAOYUAN ENVIRONMENTAL PROTECTION TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This treatment method has the following defects: (1) adding hydrochloric acid for neutralization has the hidden danger of causing acid pollution; (2) the natural water removal rate in the storage tank is slow, the settling effect is poor, and a large amount of waste residue cannot be effectively precipitated and separated, and The content of suspended solids in the sapphire wafer polishing waste liquid is higher than 3000mg / L, and there is a white polluted surface in the discharge; (3) the water content of the discharged sludge is more than 90%, which increases the transportation cost, and because the sludge water contains pollutants, after burial caused secondary pollution to the environment;
[0005] Method 2: The sapphire wafer polishing waste liquid enters the collection pool first, and after being neutralized by adding hydrochloric acid, it is then diluted with sewage and discharged to the pipeline network or central sewage treatment station for treatment. This treatment method has the following defects: (1) No flocculant is used, The settlement effect is poor; (2) Use hydrochloric acid to neutralize, there is a hidden danger of acid pollution; (3) It has a great impact on the pipeline network or the central sewage treatment station

Method used

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  • A kind of sapphire wafer polishing waste liquid sewage treatment method

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Effect test

Embodiment 1

[0028] Collect the flushing sewage from washing the machine tool and the ground and introduce it into the adjustment pool, adjust the ratio of sapphire wafer polishing waste water to flushing sewage in the adjustment pool at a ratio of 1:15, until the pH is 8-9, and the flocculant 1 is selectively polymerized Aluminum chloride is configured as a 0.5% aqueous solution and stored in a flocculant tank. The average treatment water volume of sapphire wafer polishing waste water is 5t / h, SS is 6800mg / L, and the addition amount of flocculant 1 aqueous solution is 5Kg / h, ( The amount of flocculant 1 added is about 10mg / Kg sewage), after mixing in the mixer, it enters the mechanical acceleration clarifier, and the flocculant 2 selects polyacrylamide, which is configured as a 0.5% aqueous solution and stored in the flocculant tank. The addition amount of the agent 2 aqueous solution is 10Kg / h, (the addition amount of the flocculant 2 is about 20mg / Kg sewage), and the flocculant reacts wi...

Embodiment 2

[0032]Collect the washing water from washing the machine tool and the ground and introduce it into the adjustment pool, and adjust it according to the ratio of sapphire wafer polishing waste water to washing water at a ratio of 1:20 in the adjustment pool until the pH is 8-9, and the flocculant 1 is selectively polymerized Aluminum chloride is configured as a 0.5% aqueous solution and stored in a flocculant tank. The average treatment water volume of sapphire wafer polishing waste water is 5t / h, SS is 6800mg / L, and the addition amount of flocculant 1 aqueous solution is 5Kg / h, ( The amount of flocculant 1 added is about 10mg / Kg sewage), after mixing in the mixer, it enters the mechanical acceleration clarifier, flocculant 2 selects polyacrylamide with a solid molecular weight of 14 million, configures it into a 0.2% aqueous solution, and stores In the flocculant tank, the addition amount of the flocculant 2 aqueous solution is 7.5Kg / h, (the addition amount of the flocculant 2 i...

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Abstract

The invention discloses a sewage treatment method for a sapphire crystal polishing liquid waste. The method comprises the following steps: adjusting the pH value of the sapphire crystal polishing liquid waste by using a rinse wastewater for rinsing a machine tool and ground, and forming an electric flocculation body by using a flocculant and suspended solids in the sapphire crystal polishing liquid waste; accelerating clarification by using a machine, and finely filtering the wastewater as rinse water to reuse through a continuous sand filter; separating sludge and liquid in mud sewage by using a folded screw sludge dewater, returning filtration liquid to the machine to accelerate clarification; outwardly transporting a dry mud cake to process, so as to efficiently, economically and safely process the sapphire crystal polishing liquid waste.

Description

technical field [0001] The invention belongs to the technical field of waste water treatment, and in particular relates to a method for treating sapphire wafer polishing waste liquid sewage. Background technique [0002] The sapphire wafer polishing liquid is a water-soluble colloidal slurry, which is mainly used for ultra-fine polishing of the surface of sapphire substrate materials and sapphire window materials. The sapphire wafer polishing waste liquid is a polishing agent added during the sapphire wafer polishing process, which is discarded after use. discharged waste. Sapphire wafer polishing waste water mainly contains: nano-scale SiO 2 Hydrosol, sodium hydroxide, potassium hydroxide, complexing agent, ethylenediamine, triethanolamine, heavy metal impurities, the solid content measured by gravimetric method is about 40%, and the particle size measured by laser particle size analyzer is: 60-110 (nm), the viscosity (25°C) is 1-9cP, the density (20°C) is 1.1-1.30g / mL, t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C02F9/04C02F11/12
CPCY02W10/37
Inventor 王锡忠
Owner YANGZHOU MAOYUAN ENVIRONMENTAL PROTECTION TECH CO LTD
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