AZO/Si heterojunction solar battery and manufacturing method thereof
A solar cell and heterojunction technology, applied in the field of solar cells, can solve problems such as complex cell process, increased equipment demand, and cost reduction, and achieve the effects of enhancing collection capacity, reducing recombination centers, and improving conversion efficiency
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Embodiment 1
[0042] The structure of the AZO / Si heterojunction solar cell of the present embodiment is as follows figure 1 As shown, from top to bottom, it includes: metal gate electrode 1, window layer 2, passivation layer 3, crystal silicon layer 4 and metal back electrode 5,
[0043] Wherein, the window layer 2 is a low hydrogen-doped HAZO thin film with a thickness of 60nm.
[0044] The passivation layer 3 is a highly hydrogen-doped HAZO thin film with a thickness of 2nm.
[0045] The crystalline silicon layer 4 is p-type single crystal silicon.
[0046] The AZO / Si heterojunction solar cell of this embodiment is prepared by the following method:
[0047] (1) On the back of the crystalline silicon layer (one side can be selected as the back), a layer of Al with a thickness of 1 μm is plated by screen printing, and annealed in a rapid annealing furnace at 600 ° C for 1 min to achieve ohmic contact between the metal Al and the crystalline silicon layer.
[0048] (2) With the crystallin...
Embodiment 2
[0054] The structure of the AZO / Si heterojunction solar cell in this embodiment is as follows figure 1 As shown, it includes from top to bottom: metal gate electrode 1 , window layer 2 , passivation layer 3 , crystal silicon layer 4 and metal back electrode 5 .
[0055] Wherein, the window layer 2 is a low hydrogen-doped HAZO thin film with a thickness of 500nm.
[0056] The passivation layer 3 is a highly hydrogen-doped HAZO thin film with a thickness of 20nm.
[0057] The crystalline silicon layer 4 is n-type single crystal silicon.
[0058] The AZO / Si heterojunction solar cell of this embodiment is prepared by the following method:
[0059] (1) Evaporate 20nm-thick Ni and 500nm-thick Au on the back of the crystalline silicon layer, and anneal in a rapid annealing furnace at 600°C for 5min to achieve ohmic contact between the back electrode metal and the crystalline silicon.
[0060] (2) With the crystalline silicon layer as the substrate, a highly hydrogen-doped HAZO fil...
Embodiment 3
[0066] The structure of the AZO / Si heterojunction solar cell of the present embodiment is as follows figure 1 As shown, it includes from top to bottom: metal gate electrode 1 , window layer 2 , passivation layer 3 , crystal silicon layer 4 and metal back electrode 5 .
[0067] Wherein, the window layer 2 is an AZO thin film with a thickness of 300nm.
[0068] The passivation layer 3 is a highly hydrogen-doped HAZO film with a thickness of 10 nm.
[0069] The crystalline silicon layer 4 is p-type polysilicon.
[0070] The AZO / Si heterojunction solar cell of this embodiment is prepared by the following method:
[0071] (1) A layer of Al with a thickness of 2 μm was plated on one side of the crystalline silicon layer by screen printing, and annealed in a rapid annealing furnace at 600 ° C for 1 min to achieve ohmic contact between the metal Al and the crystalline silicon layer.
[0072] (2) Using the crystalline silicon layer as the substrate, prepare a highly hydrogen-doped H...
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Abstract
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