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Preparation method for polishing powder used for high performance devices such as liquid crystal display

A liquid crystal display, polishing powder technology, applied in the direction of polishing compositions containing abrasives, etc., to achieve the effect of bright and clean polishing surface, uniform particle size distribution, good dispersion and suspension.

Inactive Publication Date: 2014-09-10
TIANJIN UNIVERSITY OF SCIENCE AND TECHNOLOGY +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a polishing powder preparation method suitable for high-performance devices such as liquid crystal displays, to solve the increasing demand for high-performance rare earth polishing powder for advanced devices such as LCDs and optical lenses

Method used

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  • Preparation method for polishing powder used for high performance devices such as liquid crystal display
  • Preparation method for polishing powder used for high performance devices such as liquid crystal display
  • Preparation method for polishing powder used for high performance devices such as liquid crystal display

Examples

Experimental program
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Effect test

Embodiment 1

[0029] (1) Raw material preparation: weigh 1 kg of lanthanum cerium carbonate and add hydrochloric acid to prepare a 0.5 mol / L cerium chloride solution, and adjust the pH of the solution to 4-4.5 with hydrochloric acid and rare earth carbonate. Weigh 0.305 kg of ammonium bicarbonate to prepare a saturated ammonium bicarbonate solution as a precipitant, and adjust the pH to 8-9 with ammonia water. Prepare 2mol / L potassium chloride solution, weigh the content to account for 30% of the mass percentage of the rare earth oxide powder, prepare 30% polyethylene glycol 20000 solution, weigh the content to account for 2% of the mass percentage of the rare earth oxide powder, Add to the lanthanum cerium chloride solution simultaneously and stir evenly;

[0030] (2) Fluorination: Weigh fluosilicic acid with a weight concentration of 30%, add it into the lanthanum cerium chloride solution at a constant speed under normal temperature stirring conditions, the mass ratio of fluosilicic acid ...

Embodiment 2

[0035] (1) Raw material preparation: Weigh 0.6 kg of cerium carbonate and add hydrochloric acid to prepare a 0.4 mol / L cerium chloride solution, and adjust the pH of the solution to 4-4.5 with hydrochloric acid and rare earth carbonate. Weigh 0.184g of ammonium bicarbonate to prepare a saturated ammonium bicarbonate solution as a precipitant, and adjust the pH to 8-9 with ammonia water. Prepare 2mol / L sodium chloride solution, weigh 18% of the mass percentage of the rare earth oxide powder, prepare 30% sodium polyacrylate solution, weigh 1% of the rare earth oxide powder, and add Into the cerium chloride solution, stir evenly;

[0036] (2) Fluorination: Weigh fluosilicic acid with a weight concentration of 30%, add it to the cerium chloride solution at a constant speed under stirring at room temperature, the mass ratio of fluosilicic acid to cerium oxide is 7%, and continue stirring for 10 minutes;

[0037] (3) Precipitation: Warm up the fluorinated cerium chloride solution t...

Embodiment 3

[0041] (1) Preparation of raw materials: Weigh 0.8 kg of cerium carbonate and add hydrochloric acid to prepare a 0.8 mol / L cerium chloride solution, and adjust the pH of the solution to 4-4.5 with hydrochloric acid and rare earth carbonate. Weigh 0.245 g of ammonium bicarbonate to prepare a saturated ammonium bicarbonate solution as a precipitant, and adjust the pH to 8-9 with ammonia water. Prepare 2mol / L magnesium chloride solution, weigh the content to account for 25% of the mass percentage of rare earth oxide powder, prepare 30% dispersant LBD-1 solution, weigh the content to account for 5% of the mass percentage of rare earth oxide powder, and add Into the cerium chloride solution, stir evenly;

[0042] (2) Fluorination: Weigh fluosilicic acid with a weight concentration of 30%, add it to the cerium chloride solution at a constant speed under stirring at room temperature, the mass ratio of fluosilicic acid to cerium oxide is 8%, and continue stirring for 15 minutes;

[0...

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Abstract

The invention discloses a preparation method for polishing powder used for high performance devices such as liquid crystal display, which is characterized in that polishing powder microscopic morphology is polyhedral spherical shape, the corner angle of the particle with the above morphology is standard and uniform, scratch is not generated during a polishing process, the polyhedral structural powder has controllable morphology; the particle size distribution is uniform, average volume particle size D50 by a laser diffraction method is 0.7-2.0mum, specific surface area is 1.0-3.5m<2> / g; the dispersibility and suspensibility are good, potential of Zeta is -47mV, the polished surface is shine and neat, no scratch is generated on the surface; the cleaning performance and grinding speed of the product are better than that of certain product on market; the method comprises the following steps: adding cerous carbonate, lanthanum cerium carbonate or lanthanum cerium carbonate praseodymium in a hydrochloric acid solution for dissolving, adjusting pH value to 4-4.5, generating a cerium chloride, lanthanum chloride cerium or lanthanum chloride cerium praseodymium solution, taking the solution as a stock solution, adding a saturated ammonium bicarbonate precipitant with pH value at 8-9 to prepare the rare earth oxide polishing powder, and adding a chemical auxiliary agent in a chlorination rare earth solution or a precipitating agent solution for improving the powder performance before a precipitation reaction process.

Description

technical field [0001] The invention relates to a polishing powder preparation process suitable for liquid crystal displays and other high-performance devices. The polishing powder prepared by the method has narrow and uniform particle size distribution, controllable powder shape and good dispersibility. Background technique [0002] At present, cerium-based polishing powder is the most widely used polishing powder. It has good crystal shape, small and uniform particle size, high chemical activity, high polishing efficiency, less dosage and long service life, high qualified rate of polished workpieces, easy cleaning, no pollution and many other advantages. It is widely used in lenses, optical glass, Polishing of aviation glass, integrated circuit substrate, liquid crystal display, photomask substrate and various gemstones and other products. [0003] In recent years, due to the rapid growth of demand for LCD TVs and computers, the demand for high-performance rare earth poli...

Claims

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Application Information

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IPC IPC(8): C09G1/02
Inventor 衣守志王喜龙梁恩武任立华杨文浩方中心李虎平于月琴韩志涛姜霁涛马相琴蒋春虎
Owner TIANJIN UNIVERSITY OF SCIENCE AND TECHNOLOGY
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