Etching liquor and mask plate forming method

An etching solution and mask technology, applied in the processing of photosensitive materials, etc., can solve the problems of increased process cost, plate scratches, slow response time, etc., and achieve the effect of fewer defects, lower cost, and better linearity.
CN104375394AInactive Publication Date: 2015-02-25SHENZHEN NEWWAY PHOTOMASK MAKING
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Patent Information

Authority / Receiving Office
CN Β· China
Patent Type
Applications(China)
Current Assignee / Owner
SHENZHEN NEWWAY PHOTOMASK MAKING
Publication Date
2015-02-25
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The invention relates to an etching liquor and a mask plate forming method. The etching liquor comprises perchloric acid, ceric ammonium nitrate and water in a proportion of 500mL to (2Kg-3Kg) to (12L-16L). The mask forming method comprises photoetching, developing, etching and demolding, wherein the etching is performed by using the etching liquor. The etching liquor adopts the perchloric acid with the relatively low concentration, and the content of the ceric ammonium nitrate is reduced, the amount of volatile gas is reduced from the source, and the relatively heavy odor is avoided; the etching liquor is relatively safe and relatively environmentally-friendly, and the cost is relatively reduced; by adopting the etching liquor with the proportion for etching, etching lines of a plate are good in quality, good in linearity and relatively small in defect number.
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Description

technical field

[0001] The invention relates to the technical field of etching technology, in particular to an etching solution and a method for forming a mask. Background technique

[0002] In the manufacture of semiconductor devices, photomasks are one of the commonly used tools. The photomask is usually engraved with a designed geometric circuit diagram on a high-purity quartz or soda glass substrate. Photolithography is applied to photosensitive adhesives, which are coated on metal substrates or glass surfaces as a polymeric soluble substance, then the photoresist is baked to remove the solvent, exposed to electron beams or laser beams, and then chemically Process processing, such as developing, etching and other processes.

[0003] The early etching solution was synthesized by mixing ammonia cerium nitrate, glacial acetic acid and water. Now most of them use imported stock solution with catalytic elements added. Due to the reaction time between the etching solution sy...

Claims

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