N-type nanometer black silicon manufacturing method and solar cell manufacturing method

A solar cell, N-type technology, applied in the direction of nanotechnology, nanotechnology, nanotechnology for materials and surface science, etc., can solve the problems of industrial application obstacles and high cost, and achieve the purpose of reducing corrosion depth, increasing lifespan, Effect of increasing short-circuit current and open-circuit voltage
CN104409564AActive Publication Date: 2015-03-11ZHEJIANG JINKO SOLAR CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
ZHEJIANG JINKO SOLAR CO LTD
Publication Date
2015-03-11

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Abstract

The invention discloses an N-type nanometer black silicon manufacturing method and a solar cell manufacturing method. The N-type nanometer black silicon manufacturing method comprises steps that: (1), silicon chips after cleaning react in mixed solution of KOH and isopropanol for 0.5-2 hours, and the reaction temperature is 60-100 DEG C; and (2), the N-type silicon chips treated in the step (1) are put in a silver nanometer particle solution for 20-30 minutes in a standing mode, after drying, corrosion treatment on the treated N-type silicon chips is carried out to acquire the N-type nanometer black silicon. For manufacturing a solar cell, an N+ layer, a silicon nitride layer and an electrode layer are sequentially formed at the front surface of the manufactured N-type nanometer black silicon, after sintering, the N-type nanometer black silicon solar cell is manufactured. The manufactured N-type nanometer black silicon solar cell has properties of low reflectivity and high carrier service life and has the conversion efficiency 2.2% higher than that of a cell manufactured through a routine method.
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Description

technical field

[0001] The invention relates to the field of photovoltaic technology, in particular to a method for preparing N-type nano black silicon and a method for preparing solar cells. Background technique

[0002] Optical loss is a major factor hindering the improvement of solar cell efficiency, and reducing the optical loss of solar cells is an important and effective way to improve cell efficiency. At present, crystalline silicon mainly adopts "pyramid" texture anti-reflection structure on the surface of silicon wafer to reduce the reflectivity, but its average reflectivity in the visible light band is above 10%, and the reflection loss of light is still relatively large, which restricts the efficiency of solar cells. Further improve.

[0003] The nanoporous black silicon structure can effectively reduce the reflectivity of the anti-reflection structure. It can be prepared by electrochemical methods and metal-assisted catalysis. Metal-assisted catalysis has rece...

Claims

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