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Preparation method of low-cost high-sensitivity NaCl doped mesoporous silica resistor type humidity-sensitive material

A mesoporous silicon oxide, high-sensitivity technology, applied in the directions of silicon oxide, silicon dioxide, material resistance, etc., can solve the problems of narrow measurement range, short service life, complex process, etc., and achieve high humidity sensitivity and response recovery time. Fast, simple doping process

Active Publication Date: 2015-03-25
NORTHWESTERN POLYTECHNICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Ceramic humidity-sensitive materials have the advantages of good stability, long life, and low price, but their accuracy is low and difficult to integrate; polymer compound-based moisture-sensitive materials are suitable for mass production and have a wide range of sources, but they can be used in high-temperature and high-humidity conditions. poor performance, poor stability, poor anti-corrosion and anti-contamination capabilities; electrolyte moisture-sensitive materials have high sensitivity, but narrow measurement range, poor repeatability, and short service life; mesoporous molecular sieve moisture-sensitive materials not only have humidity-sensitive properties Good, fast response, good stability and long life
However, at present, the mesoporous molecular sieve moisture-sensitive materials are mostly doped with inorganic salts by heat treatment, the process is complex and the utilization rate of raw materials is low.

Method used

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  • Preparation method of low-cost high-sensitivity NaCl doped mesoporous silica resistor type humidity-sensitive material
  • Preparation method of low-cost high-sensitivity NaCl doped mesoporous silica resistor type humidity-sensitive material
  • Preparation method of low-cost high-sensitivity NaCl doped mesoporous silica resistor type humidity-sensitive material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Dissolve 1 g of surfactant P123 in proportion to 34.1 g of distilled water, add 1.9 g of 36% concentrated hydrochloric acid and stir to form a uniform solution. Add 1 g of n-butanol and stir at 35 °C for 1 h. Then add 2.15g tetraethyl orthosilicate (TEOS) solution and stir for 24h. The mixed solution was transferred to a reaction kettle and subjected to hydrothermal treatment at 100° C. for 24 hours. The resulting product was suction filtered, washed with distilled water and absolute ethanol, and dried in an oven at 100°C for 12 hours. Then the product was calcined at 550° C. in air for 6 hours to obtain the three-dimensional cubic mesoporous silica material KIT-6. Take 0.1024g KIT-6 in a mortar, add 1ml of absolute ethanol dropwise to completely soak it, then add 0.0051g NaCl, grind for 0.5h, and dry at 100°C for 0.5h to obtain a mesoporous silicon oxide resistance type wet sensitive material.

[0028] The microscopic morphology of KIT-6 was prepared as figure 1 s...

Embodiment 2

[0030] At 45° C., 0.067 g of CTAB was dissolved in 32 ml of ammonia solution (2% by mass, pH 11.35), and then 0.9 ml of n-butanol was added. 0.312g TEOS was added dropwise under static conditions. The mixture was placed in a water bath at 45°C for 24h, and then the mixture was transferred into a reaction kettle and reacted at 100°C for 24h. The resulting product was suction filtered, washed with distilled water, and dried in an oven at 100°C for 12 hours. The product was calcined at 550° C. for 6 h in air to remove the template, and a two-dimensional hexagonal mesoporous silica material SBA-15 was obtained. Take 0.1344g of SBA-15 in a mortar, add 1ml of absolute ethanol dropwise to completely soak it, then add 0.0134g of NaCl, grind for 0.5h, and dry at 100°C for 0.5h to obtain a mesoporous silicon oxide resistance type wet sensitive material.

[0031] From Figure 4 It can be concluded that the impedance of the doped humidity-sensitive material varies by nearly five order...

Embodiment 3

[0033] Dissolve 1 g of surfactant P123 in proportion to 34.1 g of distilled water, add 1.9 g of 36% concentrated hydrochloric acid and stir to form a uniform solution. Add 1 g of n-butanol and stir at 35 °C for 1 h. Then add 2.15g TEOS solution and stir for 24h. The mixed solution was transferred to a reaction kettle and subjected to hydrothermal treatment at 100° C. for 24 hours. The resulting product was suction filtered, washed with distilled water and absolute ethanol, and dried in an oven at 100°C for 12 hours. Then the product was calcined at 550° C. in air for 6 hours to obtain the three-dimensional cubic mesoporous silica material KIT-6. Take 0.1276g KIT-6 in a mortar, drop an appropriate amount of ethanol to completely soak it, then add 0.0176g NaCl, grind for 0.5h, and dry at 100°C for 0.5h to obtain a mesoporous silicon oxide resistance type wet sensitive material.

[0034] From Figure 5 It can be concluded that the doped moisture-sensitive material has an imp...

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Abstract

The invention relates to a preparation method of a low-cost high-sensitivity NaCl doped mesoporous silica resistor type humidity-sensitive material. The preparation method comprises the following steps of synthesizing a mesoporous silicon dioxide molecular sieve by adopting a hydrothermal method, forging the obtained mesoporous material at 550 DEG C so as to remove a surfactant, mixing the forged mesoporous material with a proper amount of sodium chloride, grinding again by taking absolute ethyl alcohol as a solvent, and doping. The preparation method has the characteristics of simple doping process, no need of thermal treatment and simplified preparation technology. According to the low-cost high-sensitivity NaCl doped mesoporous silica resistor type humidity-sensitive material, the humidity-sensitive sensitivity is high; within the full-humidity range ability of 11%RH-95%RH, the impedance change order of magnitude is greater than four orders of magnitude and approaches five orders of magnitude, and the ideal doping proportion is obtained by testing for multiple times; the humidity-sensitive performance of the material is improved effectively; within the full-humidity range ability of 11%RH-95%RH, the impedance change order of magnitude is greater than four orders of magnitude and approaches five orders of magnitude, and meanwhile, the preparation technology of the type of materials is simplified.

Description

technical field [0001] The invention belongs to a method for preparing a mesoporous silicon oxide resistance-type humidity-sensitive material, in particular to a method for preparing a low-cost and high-sensitivity NaCl-doped mesoporous silicon oxide resistance-type humidity-sensitive material. Background technique [0002] At present, humidity sensors have been widely used in industrial and agricultural production, meteorological and environmental monitoring, medical and health care, household appliances and other fields. With the development of science and technology, people also put forward many requirements for humidity sensors, such as more accurate, cheaper, smaller and so on. The current moisture-sensitive materials can be mainly divided into: ceramics, organic polymers, electrolytes, and mesoporous molecular sieves. Ceramic humidity-sensitive materials have the advantages of good stability, long life, and low price, but their accuracy is low and difficult to integra...

Claims

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Application Information

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IPC IPC(8): G01N27/04C01B33/12
Inventor 耿旺昌何小伟郑志林张宝亮张秋禹
Owner NORTHWESTERN POLYTECHNICAL UNIV
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