Monocrystalline silicon wafer alcohol-free texturing process and texturing additive
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- JIANGSU SHUNFENG PHOTOVOLTAIC TECH CO LTD
- Publication Date
- 2015-04-29
Abstract
Description
technical field
[0001] The invention relates to the field of solar cells, in particular to an alcohol-free texturing process for monocrystalline silicon wafers and a texturing additive thereof. Background technique
[0002] In the process of solar cell preparation, in order to improve the efficiency of solar cells, it is necessary to make a textured surface on the surface of the single crystal silicon wafer. The effective textured structure can make the incident sunlight form secondary reflection or multiple reflections on the surface of the silicon wafer, increasing the light intensity. The utilization rate makes more photons be absorbed in the area near the pn junction to generate photo-generated carriers, and these photo-generated carriers are easier to be collected, thus increasing the collection efficiency of photo-generated carriers.
[0003] Conventional texturing process generally uses sodium hydroxide or potassium hydroxide, adding appropriate mixed solution of isop...