Preparation method of photoelectric thin film material based on biobr/cds heterojunction
A technology of photoelectric thin film and thin film material, which is applied in the manufacture of circuits, electrical components, final products, etc., can solve the problems of low photoelectric efficiency of composite thin film solar cells, and achieve improved life, transmission and separation efficiency, low energy consumption, photoelectric Effect of conversion efficiency improvement
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[0024] The preparation method of BiOBr / CdS ordered heterojunction photoelectric thin film material includes the following steps:
[0025] 1) The aqueous solution of bismuth nitrate and potassium bromide is used as the reaction solution, and the dry and clean FTO glass is used as the substrate, and the BiOBr nanosheet array film with 20-90 cycles is prepared by continuous ion layer adsorption;
[0026] 2) Prepare a mixed aqueous solution of 0.9-1.1M ammonia water, 0.9-1.1mM cadmium chloride and 4-6mM thiourea, then place the prepared BiOBr nanosheet array film vertically, and react at 60-80 °C to obtain BiOBr / CdS heterojunction thin film material.
[0027]The invention successfully prepares the network BiOBr thin film material composed of nano flakes (15-20nm thick) on the FTO base material by a simple, fast, mild and green sequential ion deposition method, and then obtains the material by chemical bath deposition method. The ordered BiOBr / CdS nano-network heterostructure pho...
Embodiment 1
[0030] (1) Preparations: Cut the FTO glass into 1.5×2.5cm 2 The rectangle is sonicated with a mixed solution of distilled water and dish soap for 20 minutes, washed with distilled water for 2 to 3 times and then sonicated for 15 minutes, and then put in NH 3 .H 2 O, H 2 O 2 and H 2 O(NH 3 .H 2 O:H 2 O 2 :H 2 (0=1:2:5) in a mixed solution of 80°C for ultrasonic cleaning for 20 minutes, washed with distilled water for 2 to 3 times and then ultrasonicated with absolute ethanol for 15 minutes. Finally, the cleaned FTO glass was placed in a vacuum drying oven to dry. A large amount of 5 mM aqueous bismuth nitrate, 5 mM aqueous potassium bromide was prepared.
[0031] (2) Reaction step: Take two 50ml beakers, add 40ml aqueous solution of bismuth nitrate and 40ml aqueous potassium bromide solution respectively. Use a multimeter to measure the conductivity of the dry and clean FTO, stick the reverse side with tape, and then immerse it in potassium bromide and bismuth nitrate...
Embodiment 2
[0035] (1) Preparations: Cut the FTO glass into 1.5×2.5cm 2 The small squares were sonicated with a mixed solution of distilled water and dish soap for 20 minutes, washed 2 to 3 times with distilled water and then sonicated for 15 minutes, and then put in NH 3 .H 2 O, H 2 O 2 and H 2 O(NH 3 .H 2 O:H 2 O 2 :H 2 (0=1:2:5) in a mixed solution of 80°C for ultrasonic cleaning for 20 minutes, washed with distilled water for 2 to 3 times and then ultrasonicated with absolute ethanol for 15 minutes. Finally, the cleaned FTO glass was placed in a vacuum drying oven to dry. A large amount of 5 mM aqueous bismuth nitrate, 5 mM aqueous potassium bromide was prepared. 40ml of cadmium sulfide precursor solution was prepared, containing a mixed aqueous solution of 1M ammonia, 1mM cadmium chloride and 5mM thiourea.
[0036] (2) Reaction step: Take two 50ml beakers, add 40ml aqueous solution of bismuth nitrate and 40ml aqueous potassium bromide solution respectively. Use a multimete...
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