Organic electroluminescence device and manufacturing method for organic electroluminescence device
An electroluminescent device and electroluminescent technology, applied in the direction of electric solid device, semiconductor/solid state device manufacturing, electrical components, etc., can solve the problems of total reflection loss, refractive index difference, low light output performance, etc. Light Efficiency, Barrier Reduction Effect
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[0036] The preparation method of the organic electroluminescence device 100 of an embodiment, it comprises the following steps:
[0037] Step S110 , preparing the scattering layer 20 on the surface of the glass substrate 10 by electron beam evaporation.
[0038] The scattering layer 20 is formed on one side surface of the glass substrate 10 . The scattering layer 20 includes luminescent materials, zinc powder and rhenium compound materials, and the scattering layer 20 is prepared by electron beam evaporation on the surface of the glass substrate. The material of the luminescent material layer is selected from 4-(dinitrile methyl)-2 -Butyl-6-(1,1,7,7-tetramethyljulodine-9-vinyl)-4H-pyran (DCJTB), 9,10-di-β-naphthylene anthracene ( ADN), 4,4′-bis(9-ethyl-3-carbazolevinyl)-1,1′-biphenyl (BCzVBi), 8-hydroxyquinoline aluminum (Alq 3 ), the compound material of rhenium is selected from rhenium heptoxide (Re 2 o 7 ), rhenium dioxide (ReO 2 ) Rhenium trioxide (ReO 3 ) and rheniu...
Embodiment 1
[0058] The structure prepared in this example is glass substrate / Alq 3 :Zn:Re 2 o 7 / ITO / MoO 3 / NPB / Alq 3 / TAZ / CsF / Ag organic electroluminescent device, in this embodiment and the following embodiments, " / " indicates a layer, and ":" indicates doping.
[0059] The glass substrate is N-LASF44. After rinsing the glass substrate with distilled water and ethanol, soak it in isopropanol for one night. Prepare the scattering layer on the glass substrate. The scattering layer includes luminescent materials, zinc powder and rhenium compound materials. The scattering layer is prepared by electron beam evaporation on the surface of the glass substrate. The material is Alq 3 :Zn:Re 2 o 7 , Alq 3 , Zn and Re 2 o 7 The mass ratio is 25:1:5, and the thickness is 180nm. Then ITO is prepared on the scattering layer with a thickness of 100nm, which is prepared by magnetron sputtering; the hole injection layer is prepared by evaporation: the material is MoO 3 , with a thickness of 40...
Embodiment 2
[0066] The structure prepared in this example is glass substrate / ADN:Zn:ReO 2 / IZO / MoO 3 / TAPC / ADN / Bphen / CsN 3 / Al organic electroluminescent devices.
[0067] The glass substrate is N-LAF36. After rinsing the glass substrate with distilled water and ethanol, soak it in isopropanol for one night to prepare a scattering layer on the glass substrate. The scattering layer is prepared by electron beam evaporation on the surface of the substrate, and the material is ADN:Zn:ReO 2 , ADN, Zn and ReO 2 The mass ratio is 4:0.1:1, and the thickness is 400nm. Then IZO is prepared on the scattering layer with a thickness of 80nm, which is prepared by magnetron sputtering; the hole injection layer is evaporated, and the material is MoO 3 , with a thickness of 40nm; evaporated hole transport layer: the material is TAPC, with a thickness of 45nm; evaporated luminescent layer: the selected material is ADN, with a thickness of 8nm; evaporated electron transport layer, the material is Bphen...
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