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Cobalt-containing doped silicon dioxide nano-composite abrasive grain sol and preparation method thereof, and polishing solution and preparation method thereof

A silicon dioxide and nanocomposite technology, applied in the direction of polishing compositions containing abrasives, chemical instruments and methods, and other chemical processes, can solve the problem of increasing the surface roughness of polished substrates, sapphire polishing rate and surface roughness It can not meet the industrial needs and other problems well, and achieve the effect of reducing roughness, reducing wear and reducing surface roughness

Active Publication Date: 2015-06-10
JIANGSU HAIXUN IND GROUP SHARE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, in the practical application of sapphire polishing, traditional inorganic abrasive grains such as silica and alumina are usually used, and their polishing rate and surface roughness for sapphire can no longer meet the needs of the industry.
Most of the reported composite abrasive grains are obtained through high-temperature calcination and redissolution to obtain composite oxide abrasive grains, and the agglomeration of particles during the calcination process will increase the surface roughness of the polished substrate.

Method used

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  • Cobalt-containing doped silicon dioxide nano-composite abrasive grain sol and preparation method thereof, and polishing solution and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0030] The cobalt-doped silica nanocomposite abrasive sol in this example is prepared by co-precipitation method. The preparation process is as follows: first use the cation exchange method to prepare a pH value of 2.5, and then prepare 2.5 wt% silicic acid and 0.43 wt% Co(NO3)2·6H2O solution in an equal mass ratio under stirring conditions at 100 ℃, and 1 wt % NaOH were added to the silica seed crystals separately. Sodium hydroxide controls the pH value of the whole sol system to remain at 10, and controls the drop rate of the mixture of cobalt nitrate and silicic acid to keep the evaporation rate and drop rate in the sol system in balance. Add dropwise for 140 minutes, 280 minutes, and 420 minutes respectively to prepare cobalt-doped silica nanocomposite abrasive sols with cobalt hydroxide doping amounts of 0.5 wt%, 1.0 wt%, and 1.5 wt%.

Embodiment 2

[0032] The sol with cobalt hydroxide doping amount of 0.5 wt% was diluted to 3 L with deionized water, and the solid content was 10%. The particle size of the composite abrasive particle of cobalt-doped silica is 106 nm, and the final pH value of the sol is 10. After filtering with a 350-mesh sieve, add 1% sodium pyrophosphate as a dispersant and 0.5% lauryl polyoxyethylene ether as a surfactant to obtain a polishing solution.

Embodiment 3

[0034] The sol doped with 1.0 wt% cobalt hydroxide was diluted to 3 L with deionized water, and the solid content was 10%. The composite abrasive particle size of cobalt-doped silica is 110 nanometers, and the final pH value of the sol is 10. After filtering with a 350-mesh sieve, add 1% sodium pyrophosphate as a dispersant and 0.5% lauryl polyoxyethylene ether as a surfactant to obtain a polishing solution.

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Abstract

The invention provides cobalt-containing doped silicon dioxide nano-composite abrasive grain sol. The cobalt-containing doped silicon dioxide nano-composite abrasive grain sol is formed by making a mixture of a cobalt nitrate solution of 0.43wt%, a silicic acid solution of 2.5wt% and sodium hydroxide of 1wt% precipitated on a silicon dioxide seed crystal for reaction according to a coprecipitation method, wherein the mass ratio of the cobalt nitrate solution to the silicic acid solution is 1:1. Nano-composite abrasive grains in the sol are uniform spheres. The doping content of cobalt hydroxide in the cobalt-containing doped silicon dioxide nano-composite abrasive grain sol is 0.1wt%-5wt%. When a polishing solution is adopted for polishing sapphire substrates, the sapphire surface removal rate can be increased effectively, and the sapphire surface roughness is reduced.

Description

technical field [0001] The invention relates to a cobalt-doped silica nanocomposite abrasive sol, a polishing liquid and a preparation method thereof. Background technique [0002] Sapphire single crystal is Al2O3 single crystal, which combines excellent mechanical, optical, chemical, electrical and radiation resistance properties, and has been widely used in high temperature and high pressure devices, optical systems, special windows, wear-resistant devices, infrared guidance, Missile fairing and other high-tech fields such as civil, military and scientific research. It is particularly important that the c(0001) plane of single crystal sapphire has become the main substrate material of light-emitting diodes because of its advantages such as small lattice coefficient mismatch rate with semiconductor GaN, high mechanical strength, and good stability. The rapid development of the LED industry puts forward new requirements for the smoothness of the sapphire substrate surface,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K3/14C09G1/02
Inventor 李家荣马盼
Owner JIANGSU HAIXUN IND GROUP SHARE