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A kind of photoresist composition prepared based on pcdl type polyurethane acrylate

A technology of urethane acrylate and composition, applied in urethane acrylate and its application in the field of photoresist and photoresist, can solve the problems of small molecular weight, low viscosity and high viscosity, and achieve increased etching resistance, High resolution and good comprehensive performance

Active Publication Date: 2018-11-13
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Polycarbonate diol (PCDL) is the main raw material for the synthesis of new PCDL-based polyurethane acrylate resins. The PCDL-based polyurethane synthesized from it has excellent mechanical properties, heat resistance, friction resistance, oxidation resistance, and water resistance. However, when the molecular weight of PCDL-based urethane acrylate is large, it has the disadvantages of high viscosity, low activity, and the need for a large amount of diluent, which limits its application in the field of photoresist; therefore, the design Synthesizing PCDL-based urethane acrylate with small molecular weight, low viscosity and reasonable acid value is the key to solving the problem
[0004] At present, there are few reports on the application of PCDL-based urethane acrylate in the field of photoresist

Method used

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  • A kind of photoresist composition prepared based on pcdl type polyurethane acrylate
  • A kind of photoresist composition prepared based on pcdl type polyurethane acrylate
  • A kind of photoresist composition prepared based on pcdl type polyurethane acrylate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] (1) Preparation of PCDL-based polyurethane acrylate:

[0034] Add 47.40 g of isophorone diisocyanate (IPDI) and 0.23 g of dibutyltin dilaurate (DBTDL) in a 250 ml four-neck round bottom flask equipped with a thermometer, a reflux condenser, and a stirrer, and drop polycarbonate into it. Dihydric alcohol (PCDL) 32.70g, heat preservation reaction at 45°C for 2h, add 28.04g of N,N-dimethylformamide to adjust the viscosity of the system, then add 13.40g of 2,2-dimethylolpropionic acid (DMPA) , keep the reaction at 75°C for 4h, finally add 0.23g of polymerization inhibitor 2,6-di-tert-butyl-p-cresol, and then add 18.65g of hydroxyethyl methacrylate (HEMA) until no NCO is detected by infrared spectroscopy. 2265cm -1 During the absorption peak at place, stop reaction, the required time is 5h, finally obtain the urethane acrylate based on PCDL. The structural parameters of the obtained polyurethane acrylate are shown in Table 1. The whole process measures the NCO group conte...

Embodiment 2

[0039] (1) Preparation of PCDL-based polyurethane acrylate:

[0040]Add isophorone diisocyanate (IPDI) 47.40 and dibutyltin dilaurate (DBTDL) 0.23g in a 250ml four-neck round bottom flask equipped with a thermometer, a reflux condenser, and a stirrer, and drop polycarbonate di Polyhydric alcohol (PCDL) 32.70g, heat preservation reaction at 45°C for 2h, add 34.77g of N,N-dimethylformamide to adjust the viscosity of the system, then add 13.40g of 2,2-dimethylolpropionic acid (DMPA), Insulate and react at 75°C for 4 hours, finally add 0.27g of polymerization inhibitor 2,6-di-tert-butyl-p-cresol, and then add 45.58g of pentaerythritol triacrylate (PETA), until NCO can not be detected by infrared spectroscopy at 2265cm -1 During the absorption peak at place, stop reaction, the required time is 5h, finally obtain the urethane acrylate based on PCDL. The structural parameters of the obtained polyurethane acrylate are shown in Table 1.

[0041] The whole process measures the NCO gro...

Embodiment 3

[0046] (1) Preparation of PCDL-based polyurethane acrylate:

[0047] Add 42.54 g of isophorone diisocyanate (IPDI) and 0.21 g of dibutyltin dilaurate (DBTDL) in a 250 ml four-necked round bottom flask equipped with a thermometer, a reflux condenser, and a stirrer, and drop polycarbonate into it Dihydric alcohol (PCDL) 20.86g, heat preservation reaction at 45°C for 2h, add 23.78g of N,N-dimethylformamide to adjust the viscosity of the system, then add 14.52g of 2,2-dimethylolpropionic acid (DMPA) , keep the reaction at 75°C for 4h, finally add 0.19g of polymerization inhibitor 2,6-di-tert-butyl-p-cresol, and then add 15.36g of hydroxyethyl acrylate (HEA) until NCO cannot be detected by infrared spectroscopy at 2265cm -1 During the absorption peak at place, stop reaction, the required time is 5h, finally obtain the urethane acrylate based on PCDL. The structural parameters of the obtained polyurethane acrylate are shown in Table 1.

[0048] The whole process measures the NCO g...

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Abstract

The invention discloses a photoresist composition prepared on the basis of PCDL type urethane acrylate. The composition comprises, by mass, 45-60% of urethane acrylate, 10-15% of reactive diluent, 4-6% of pigment, 3-5% of photoinitiator and 20-37% of solvent; on the dark condition, the urethane acrylate is mixed with the photoinitiator, the solvent, the reactive diluent and the pigment according to the proportion and stirred magnetically at room temperature so as to be fully dissolved to obtain photoresist. In the composition, the glass transition temperature and the rigidity of the PCDL type urethane acrylate are high, an acid value is adjustable, the molecular weight is low, viscosity is low, photoresist membrane sig water prepared by a low polymer can be developed, time for developing is short, and the image resolution ratio is low.

Description

technical field [0001] The invention relates to the field of photoresist, in particular to a polyurethane acrylate prepared from PCDL and its application in the field of photoresist. Background technique [0002] Polyurethane acrylate (PUA) is a photosensitive resin that has been studied more at present. It combines the excellent properties of polyurethane and acrylate resins, has a high light curing speed, good adhesion, flexibility, wear resistance, high hardness, Chemical resistance, etc., have been widely used in various fields such as coatings, inks and adhesives. Polyurethane generally has a large molecular weight, high viscosity, and a large proportion of soft segments. These properties make it have low glass transition temperature, hardness and acid value, and good toughness. These properties are not suitable for application in the field of photoresist. [0003] Polycarbonate diol (PCDL) is the main raw material for the synthesis of new PCDL-based polyurethane acry...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004C08G18/67C08G18/66C08G18/44C08G18/34
Inventor 刘敬成刘秋华郑祥飞刘仁李虎刘晓亚
Owner JIANGNAN UNIV