Unlock instant, AI-driven research and patent intelligence for your innovation.

Preparation method of planar lobster-eye focusing lens based on semiconductor technology

A technology of focusing lens and lobster eye, which is applied in the fields of aerospace, optical technology and microelectronics, can solve problems such as the difficult structure of Angel's lobster eye, and achieve the effect of fast cycle, low cost and simple method.

Inactive Publication Date: 2015-09-09
NO 513 INST THE FIFTH INST OF CHINA AEROSPACE SCI & TECH
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this process has mutual constraints between fiber thermal drawing, hydrogen reduction process, and sheath-core material selection, as well as process technology limitations. It is very difficult to manufacture Angel lobster eye structures with high aspect ratio and large-area square micropore arrays.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of planar lobster-eye focusing lens based on semiconductor technology
  • Preparation method of planar lobster-eye focusing lens based on semiconductor technology
  • Preparation method of planar lobster-eye focusing lens based on semiconductor technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] (1), the technological process of this method is such as figure 1 shown:

[0029] The first step is to use an n-type Si substrate with a diameter of 3cm crystal orientation and a resistivity of 5Ω·cm. First, grind and clean;

[0030] The second step is to use thermal oxidation process (mixed atmosphere of oxygen and HCl gas at 1030 ° C) to form SiO on the surface of the Si wafer 2 hard mask.

[0031] The third step is to use localized ultraviolet exposure with photoresist (KPR) on SiO 2 A square micro-hole array mask layer with a side length of 5 μm and a wall thickness of 2 μm is formed on the hard mask. The formed planar square micro-hole array mask layer is as follows figure 2 shown.

[0032] The fourth step, the SiO of the unprotected area 2 After being etched away, the etching induced pit can be fabricated after cleaning and drying. Dry etching, such as plasma dry etching technology, has nothing to do with the crystal structure of the silicon wafer, so it i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method of a planar lobster-eye focusing lens based on semiconductor technology. The preparation method comprises the following steps that an n type Si wafer is polished and ground; a hard mask layer is formed at the upper surface of the Si wafer via an oxidation technology or vapor deposition; a mask layer with a square micro-hole array is formed in the hard mask layer via exposure by utilizing a photoresist technology; the Si wafer is etched by utilizing square micro-holes in the mask layer, and etching induction pits are formed; the hard mask layer is removed, the backside of the Si wafer is plated with a metal electrode layer, and the metal electrode layer is connected with the anode of a power supply; a metal plate electrode is placed at the front side of the Si wafer in certain distance and connected with the cathode of the power supply, an electrolyte exists between the plate electrode and the front side of the Si wafer, the power supply is switched on, and the backside of the Si wafer is illuminated to carry out photoelectric chemical etching; the metal electrode at the backside of the Si wafer is removed to form an initial model of the lobster eyes; and different surfaces of the initial module is plated with metallic reflection layers via vapor. The method is used to prepare the lobster-eye lens.

Description

technical field [0001] The invention relates to a preparation method of a flat lobster eye focusing lens, belonging to the fields of aerospace, optical technology and microelectronics technology. Background technique [0002] Compared with the collimation detection technology, the focusing detection technology has the advantages of large light collecting area, high sensitivity, low background noise, and imaging capability. However, due to the extremely short wavelength of X-rays, the refractive index of almost all media is close to 1, so it is difficult to achieve focusing by traditional means of refraction. At present, X-rays are mostly focused by grazing incidence, and typical grazing incidence optical systems include K-B optical systems, Wolter optical systems, and the like. Although these optical systems have high spatial resolution, they have serious off-axis aberrations, small fields of view, and large weights. The lobster-eye is an optical system that imitates the v...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/06
CPCG21K1/06
Inventor 金东东胡慧君邵飞史钰峰李文彬徐延庭
Owner NO 513 INST THE FIFTH INST OF CHINA AEROSPACE SCI & TECH