Preparation method of planar lobster-eye focusing lens based on semiconductor technology
A technology of focusing lens and lobster eye, which is applied in the fields of aerospace, optical technology and microelectronics, can solve problems such as the difficult structure of Angel's lobster eye, and achieve the effect of fast cycle, low cost and simple method.
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[0028] (1), the technological process of this method is such as figure 1 shown:
[0029] The first step is to use an n-type Si substrate with a diameter of 3cm crystal orientation and a resistivity of 5Ω·cm. First, grind and clean;
[0030] The second step is to use thermal oxidation process (mixed atmosphere of oxygen and HCl gas at 1030 ° C) to form SiO on the surface of the Si wafer 2 hard mask.
[0031] The third step is to use localized ultraviolet exposure with photoresist (KPR) on SiO 2 A square micro-hole array mask layer with a side length of 5 μm and a wall thickness of 2 μm is formed on the hard mask. The formed planar square micro-hole array mask layer is as follows figure 2 shown.
[0032] The fourth step, the SiO of the unprotected area 2 After being etched away, the etching induced pit can be fabricated after cleaning and drying. Dry etching, such as plasma dry etching technology, has nothing to do with the crystal structure of the silicon wafer, so it i...
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