Preparation method of TiSi-GrAl-N nanometer coating
A nano-coating and workpiece technology, applied in the field of nano-coating production, can solve the problems of high vapor deposition deposition temperature, limited types of substrate materials, and intergranular corrosion of substrates, and achieve low cost, high production efficiency, and improved durability. The effect of high temperature
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[0016] Example 1:
[0017] 1. Pretreatment, first grind, polish and degreasing the surface of the workpiece that needs to be coated;
[0018] 2. Cleaning, put the pretreated workpiece into the reaction furnace, and vacuumize until the vacuum degree is 1×10 -3 Pa and argon gas is introduced to ensure that the argon gas pressure is 3Pa, the workpiece is connected to a negative bias voltage of 600V, and the electric field action time is 30min;
[0019] 3. Ion nitriding, feeding nitrogen, adjusting the flow ratio of nitrogen and argon to 3, controlling the total pressure in the reaction furnace to 0.3Pa, the temperature to 400℃, the negative bias of the workpiece to 600V, and the nitriding time to 4 hours;
[0020] 4. Prepare the transition layer, carry out Ti bombardment cleaning on the nitrided workpiece for 8 minutes, then turn on the Ti target, the Ti target current is 60A, and deposit the gradient TiN transition layer. The process of depositing the gradient TiN transition la...
Example Embodiment
[0022] Embodiment 2:
[0023] 1. Pretreatment, first grind, polish and degreasing the surface of the workpiece that needs to be coated;
[0024] 2. Cleaning, put the pretreated workpiece into the reaction furnace, and vacuumize until the vacuum degree is 1×10 -3 Pa and pass argon gas to ensure that the argon gas pressure is 4Pa, the workpiece is connected to a negative bias voltage of 700V, and the electric field action time is 30min;
[0025] 3. Ion nitriding, feeding nitrogen, adjusting the flow ratio of nitrogen and argon to 4, controlling the total pressure in the reaction furnace to 0.4Pa, the temperature to 500℃, the negative bias of the workpiece to 700V, and the nitriding time to 4.5 hours;
[0026] 4. Prepare the transition layer, carry out Ti bombardment cleaning on the nitrided workpiece for 9 minutes, then turn on the Ti target, the current of the Ti target is 80A, and deposit the gradient TiN transition layer. The process of depositing the gradient TiN transition...
Example Embodiment
[0028] Embodiment three:
[0029] 1. Pretreatment, first grind, polish and degreasing the surface of the workpiece that needs to be coated;
[0030] 2. Cleaning, put the pretreated workpiece into the reaction furnace, and vacuumize until the vacuum degree is 1×10 -3 Pa and argon gas is introduced to ensure that the argon gas pressure is 5Pa, the workpiece is connected to a negative bias voltage of 900V, and the electric field action time is 30min;
[0031] 3. Ion nitriding, feeding nitrogen, adjusting the flow ratio of nitrogen and argon to 4:1, controlling the total pressure in the reaction furnace to 0.5Pa, the temperature to 500℃, the negative bias of the workpiece to 900V, and the nitriding time to 5 hours ;
[0032] 4. Prepare the transition layer, carry out Ti bombardment cleaning on the nitrided workpiece for 10 minutes, then turn on the Ti target, the Ti target current is 100A, deposit the gradient TiN transition layer, and the process of depositing the gradient TiN ...
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