Preparation method of TiSi-GrAl-N nanometer coating
A nano-coating and workpiece technology, applied in the field of nano-coating production, can solve the problems of high vapor deposition deposition temperature, limited types of substrate materials, and intergranular corrosion of substrates, and achieve low cost, high production efficiency, and improved durability. The effect of high temperature
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Embodiment 1
[0017] 1. Pretreatment, firstly, grind, polish and degrease the surface of the workpiece to be coated;
[0018] 2. Cleaning, put the pretreated workpiece into the reaction furnace, and evacuate to a vacuum degree of 1×10 -3 Pa and pass argon gas to ensure that the pressure of argon gas is 3Pa, and the negative bias voltage of 600V is connected to the workpiece, and the electric field action time is 30min;
[0019] 3. Ion nitriding, feed nitrogen, adjust the flow ratio of nitrogen and argon to 3, control the total pressure in the reaction furnace to 0.3Pa and temperature to 400°C, the negative bias voltage of the workpiece to 600V, and the nitriding time to 4 hours;
[0020] 4. Prepare the transition layer, perform Ti bombardment cleaning on the workpiece after nitriding treatment, the time is 8min, then turn on the Ti target, the Ti target current is 60A, deposit the gradient TiN transition layer, and the process of depositing the gradient TiN transition layer is: first, nitro...
Embodiment 2
[0023] 1. Pretreatment, firstly, grind, polish and degrease the surface of the workpiece to be coated;
[0024] 2. Cleaning, put the pretreated workpiece into the reaction furnace, and evacuate to a vacuum degree of 1×10 -3 Pa and pass argon gas to ensure that the pressure of argon gas is 4Pa, and the negative bias voltage of 700V is connected to the workpiece, and the electric field action time is 30min;
[0025] 3. Ion nitriding, feed nitrogen, adjust the flow ratio of nitrogen and argon to 4, control the total pressure in the reaction furnace to 0.4Pa, temperature to 500°C, workpiece negative bias to 700V, and nitriding time to 4.5 hours;
[0026] 4. Prepare the transition layer, perform Ti bombardment cleaning on the workpiece after nitriding treatment, the time is 9min, then turn on the Ti target, the Ti target current is 80A, and deposit the gradient TiN transition layer. The process of depositing the gradient TiN transition layer is: first, nitrogen The flow ratio of n...
Embodiment 3
[0029] 1. Pretreatment, firstly, grind, polish and degrease the surface of the workpiece to be coated;
[0030] 2. Cleaning, put the pretreated workpiece into the reaction furnace, and evacuate to a vacuum degree of 1×10 -3 Pa and pass argon gas to ensure that the pressure of argon gas is 5Pa, and the negative bias voltage of 900V is connected to the workpiece, and the electric field action time is 30min;
[0031] 3. Ion nitriding, feed nitrogen, adjust the flow ratio of nitrogen and argon to 4:1, control the total pressure in the reaction furnace to 0.5Pa and temperature to 500°C, the negative bias voltage of the workpiece to 900V, and the nitriding time to 5 hours ;
[0032] 4. Prepare the transition layer, perform Ti bombardment cleaning on the workpiece after nitriding treatment, the time is 10min, then turn on the Ti target, the Ti target current is 100A, deposit the gradient TiN transition layer, the process of depositing the gradient TiN transition layer is: first, nit...
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