Highly-matched crystal orientation stacked structure of graphene and hexagonal boron nitride and preparation method of highly-matched crystal orientation stacked structure
A technology of hexagonal boron nitride and stacked structure, which is applied in the nanometer field, can solve the problems that the crystal orientation is difficult to change, uneven, difficult to control the relative angle and crystal orientation matching, etc., and achieves the advantages of convenient annealing and mature manipulation technology Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0028] In order to solve the problem that the stacking structure of graphene / hexagonal boron nitride obtained by the preparation method in the prior art has a low degree of crystal orientation matching, or there are defects in the stacking structure, the present invention provides a graphene / hexagonal boron nitride A method for preparing stacked structures with highly crystalline orientation matching. The preparation method comprises: forming a preliminary stacked structure of graphene / hexagonal boron nitride; and performing heat treatment on the preliminary stacked structure to obtain a stacked structure of graphene / hexagonal boron nitride with a high degree of crystal direction matching.
[0029] Graphene will rotate on the hexagonal boron nitride crystal during heat treatment, which is conducive to the crystal orientation matching of the two. Based on this phenomenon, the inventors proposed a highly crystal orientation matching stack for preparing graphene / hexagonal boron ni...
Embodiment 1
[0046] 1) Take a hexagonal boron nitride crystal with a thickness of 20nm, and mechanically peel it off on a silicon dioxide / silicon substrate with a thickness of 300nm. Then use the mechanical transfer method to transfer the single-layer graphene with a size of 5 μm onto the hexagonal boron nitride to form a figure 1 The stacked structure shown in .
[0047] 2) Using electron beam lithography and reactive ion oxygen etching to prepare circular holes with a diameter of 300 nm on the graphene layer, such as figure 2 shown. Hydrogen plasma etching was used to enlarge the circular hole defects, thereby obtaining a preliminary stacked structure of graphene / hBN with isolated graphene small pieces, as image 3 shown. The reaction conditions are as follows: the temperature is 400° C., the hydrogen pressure is 0.4 torr, the power is 10 W, and the etching rate is 3 nm / min.
[0048] 3) Manipulating the graphene in the preliminary stack structure using a scanning probe-based manipul...
Embodiment 2
[0051] 1) Take a hexagonal boron nitride crystal with a thickness of 20nm, and mechanically peel it off on a silicon dioxide / silicon substrate with a thickness of 300nm. Then use the mechanical transfer method to transfer the single-layer graphene with a size of 5 μm onto the hexagonal boron nitride to form a figure 1 The stacked structure shown in .
[0052] 2) Using electron beam lithography technology and reactive ion oxygen etching technology to prepare circular holes with a diameter of 100nm on the graphene layer, such as figure 2 shown. Hydrogen plasma etching was used to enlarge the circular hole defects, thereby obtaining a preliminary stacked structure of graphene / hBN with isolated graphene small pieces, as image 3 shown. The reaction conditions are as follows: the temperature is 400° C., the hydrogen pressure is 0.4 torr, the power is 10 W, and the etching rate is 3 nm / min.
[0053] 3) Manipulating the graphene in the preliminary stack structure using a scannin...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Elastic constant | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com
