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Highly-matched crystal orientation stacked structure of graphene and hexagonal boron nitride and preparation method of highly-matched crystal orientation stacked structure

A technology of hexagonal boron nitride and stacked structure, which is applied in the nanometer field, can solve the problems that the crystal orientation is difficult to change, uneven, difficult to control the relative angle and crystal orientation matching, etc., and achieves the advantages of convenient annealing and mature manipulation technology Effect

Active Publication Date: 2015-11-04
INST OF PHYSICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0004] The graphene / hexagonal boron nitride stack structure obtained by the mechanical transfer method usually has a random crystal orientation, and it is difficult to control the relative angle of the transfer to achieve crystal orientation matching
The method of controlling the relative angle during transfer is limited to graphene and boron nitride with regular boundaries, but cannot be used for graphene and boron nitride with irregular boundaries. Therefore, the mechanical transfer method has great limitations , especially for graphene that has been mechanically transferred to the surface of boron nitride, due to contamination and wrinkles, it is difficult to change the crystal orientation after transfer
[0005] The epitaxial growth method is to grow graphene epitaxially on the surface of boron nitride, generally by plasma chemical vapor deposition, although the graphene / hexagonal boron nitride stack structure obtained by this method has perfect crystal orientation matching, but in deposition and nucleation It is easy to cause unevenness in the process, and the grown graphene has many defects, which will inevitably have an adverse effect on the performance of the material.

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  • Highly-matched crystal orientation stacked structure of graphene and hexagonal boron nitride and preparation method of highly-matched crystal orientation stacked structure
  • Highly-matched crystal orientation stacked structure of graphene and hexagonal boron nitride and preparation method of highly-matched crystal orientation stacked structure
  • Highly-matched crystal orientation stacked structure of graphene and hexagonal boron nitride and preparation method of highly-matched crystal orientation stacked structure

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[0028] In order to solve the problem that the stacking structure of graphene / hexagonal boron nitride obtained by the preparation method in the prior art has a low degree of crystal orientation matching, or there are defects in the stacking structure, the present invention provides a graphene / hexagonal boron nitride A method for preparing stacked structures with highly crystalline orientation matching. The preparation method comprises: forming a preliminary stacked structure of graphene / hexagonal boron nitride; and performing heat treatment on the preliminary stacked structure to obtain a stacked structure of graphene / hexagonal boron nitride with a high degree of crystal direction matching.

[0029] Graphene will rotate on the hexagonal boron nitride crystal during heat treatment, which is conducive to the crystal orientation matching of the two. Based on this phenomenon, the inventors proposed a highly crystal orientation matching stack for preparing graphene / hexagonal boron ni...

Embodiment 1

[0046] 1) Take a hexagonal boron nitride crystal with a thickness of 20nm, and mechanically peel it off on a silicon dioxide / silicon substrate with a thickness of 300nm. Then use the mechanical transfer method to transfer the single-layer graphene with a size of 5 μm onto the hexagonal boron nitride to form a figure 1 The stacked structure shown in .

[0047] 2) Using electron beam lithography and reactive ion oxygen etching to prepare circular holes with a diameter of 300 nm on the graphene layer, such as figure 2 shown. Hydrogen plasma etching was used to enlarge the circular hole defects, thereby obtaining a preliminary stacked structure of graphene / hBN with isolated graphene small pieces, as image 3 shown. The reaction conditions are as follows: the temperature is 400° C., the hydrogen pressure is 0.4 torr, the power is 10 W, and the etching rate is 3 nm / min.

[0048] 3) Manipulating the graphene in the preliminary stack structure using a scanning probe-based manipul...

Embodiment 2

[0051] 1) Take a hexagonal boron nitride crystal with a thickness of 20nm, and mechanically peel it off on a silicon dioxide / silicon substrate with a thickness of 300nm. Then use the mechanical transfer method to transfer the single-layer graphene with a size of 5 μm onto the hexagonal boron nitride to form a figure 1 The stacked structure shown in .

[0052] 2) Using electron beam lithography technology and reactive ion oxygen etching technology to prepare circular holes with a diameter of 100nm on the graphene layer, such as figure 2 shown. Hydrogen plasma etching was used to enlarge the circular hole defects, thereby obtaining a preliminary stacked structure of graphene / hBN with isolated graphene small pieces, as image 3 shown. The reaction conditions are as follows: the temperature is 400° C., the hydrogen pressure is 0.4 torr, the power is 10 W, and the etching rate is 3 nm / min.

[0053] 3) Manipulating the graphene in the preliminary stack structure using a scannin...

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Abstract

The invention provides a highly-matched crystal orientation stacked structure of graphene and hexagonal boron nitride and a preparation method of the highly-matched crystal orientation stacked structure. The method includes the steps that a primary stacked structure of the graphene and the hexagonal boron nitride is formed; the primary stacked structure is subjected to heat treatment to obtain the highly-matched crystal orientation stacked structure of the graphene and the hexagonal boron nitride. On the basis that the graphene rotates on a hexagonal boron nitride crystal during heat treatment, crystal orientation match of the graphene and the hexagonal boron nitride is facilitated, and a graphene and boron nitride stacked structure with perfectly-matched crystal orientation is obtained. The method avoids the uncertainty existing in a mechanical alignment mode in the prior art; besides, boundary crystal orientation of the graphene and boundary crystal orientation of the hexagonal boron nitride are unrelated, and even if graphene and hexagonal boron nitride with irregular boundary can achieve high match. Besides, according to the method, the machining and control technology is mature, and the method is suitable for the stacked structure of the grapheme and the hexagonal boron nitride and can extend to preparation of other similar structures, such as a graphene and graphite system.

Description

technical field [0001] The invention relates to the field of nanotechnology, in particular to a stacked structure of graphene / hexagonal boron nitride with high crystal direction matching and a preparation method thereof. Background technique [0002] Graphene has many excellent properties as a two-dimensional carbon material. Since it was prepared by scientists from the University of Manchester in 2004 (Science 306, 666 (2004)), many properties of graphene have gradually been understood. Graphene can be suspended or attached to the substrate by van der Waals forces, and the properties of graphene on various substrates show significant differences, illustrating the importance of the substrate for this atomically thin material . [0003] Hexagonal boron nitride has an atomically flat surface with almost no dangling valence bonds and extremely low doping charge density, showing its great potential as a graphene substrate. Up to 60,0000 cm 2 V -1 the s -1 mobility and the q...

Claims

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Application Information

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IPC IPC(8): C30B33/02C30B29/02C30B29/38
Inventor 王多明张广宇时东霞
Owner INST OF PHYSICS - CHINESE ACAD OF SCI
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