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A kind of activation-free cyanide-free chemical copper plating solution and its copper plating process

An electroless copper plating and solution technology, which is applied in the field of metal material surface treatment, can solve the problems of complex electroless plating process and increased cost, and achieve the effect of no dendrite growth on the surface of the coating, low processing cost and stable system

Active Publication Date: 2017-10-27
TAIYUAN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, most of the activation process uses precious metal solution and colloidal catalytic solution, which not only makes the electroless plating process complicated, but also increases the cost.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] In this embodiment, the metal material matrix is ​​an aluminum sheet.

[0030] The production process of the non-activation-free cyanide-free chemical copper plating of the present invention comprises the steps of preparation of chemical copper plating solution, pretreatment of aluminum flakes, and chemical plating of aluminum flakes. The specific operation process is as follows:

[0031] Step (1) Preparation of electroless copper plating solution

[0032] The cyanide-free electroless copper plating solution provided by the present invention is: 30.0g / L copper sulfate, 50.0g / L potassium sodium tartrate, 30.0g / L citric acid, 30.0g / L sodium silicate, 5.0g / L nickel nitrate, The additives include 0.05mg / L 2-aminopyridine. The pH value of the electroless copper plating solution was adjusted with NaOH to make the pH value 8.0.

[0033] Step (2) Aluminum sheet pretreatment

[0034] The aluminum sheet was polished with 320 mesh, 600 mesh, and 1000 mesh sandpaper in sequence...

Embodiment 2

[0039] In this embodiment, the metal material matrix is ​​stainless steel wire (diameter 10 mm).

[0040] The production process of the non-activation cyanide-free electroless copper plating of the present invention comprises the steps of preparation of electroless copper plating solution, pretreatment of stainless steel wire, and electroless plating of stainless steel wire. The specific operation process is as follows:

[0041] Step (1) Preparation of electroless copper plating solution

[0042] The cyanide-free electroless copper plating solution provided by the present invention is: 10.0g / L copper sulfate, 30.0g / L potassium sodium tartrate, 25.0g / L citric acid, 20.0g / L sodium silicate, 2g / L cerium chloride, The additives include 30.0mg / L 2,2'-bipyridine and 8.0mg / L methyl orange. The pH value of the electroless copper plating solution was adjusted with NaOH to make it a pH value of 9.0.

[0043] Step (2) Pretreatment of stainless steel wire

[0044] The stainless steel ...

Embodiment 3

[0049] In this embodiment, the metallic material matrix is ​​a zinc sheet with holes.

[0050] The production process of the non-activation-free cyanide-free chemical copper plating of the present invention comprises the steps of preparation of chemical copper plating solution, pretreatment of zinc flakes with holes, and electroless plating of zinc flakes with holes. The specific operation process is as follows:

[0051] Step (1) Preparation of electroless copper plating solution

[0052] The cyanide-free electroless copper plating solution provided by the invention is: 5.0g / L copper sulfate, 20.0g / L potassium sodium tartrate, 10.0g / L citric acid, 10.0g / L sodium silicate, 0.2g / L neodymium sulfate, The additives include 40.0mg / L 2,3'-bipyridine and 10.0mg / L sodium benzenesulfonate. The pH value of the electroless copper plating solution was adjusted with NaOH to make the pH value 11.5.

[0053] Step (2) Pretreatment of perforated zinc sheet

[0054] Polish the zinc sheet wi...

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PUM

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Abstract

The invention provides an environment-friendly activation-free cyanide-free chemical copper plating solution. Its special feature is that it contains copper sulfate pentahydrate, sodium hypophosphite, sodium citrate, boric acid, nickel sulfate, additives. The additive is one kind of pyridine substance and benzenesulfonic acid substance or a mixture of two kinds in any ratio. The invention also discloses a process for producing copper plating by adopting the environment-friendly activation-free cyanide-free chemical copper plating solution. The cyanide-free electroless copper plating solution of the invention does not contain formaldehyde, cyanide and other components that are harmful to the environment and human body, reduces environmental pollution, and belongs to the environment-friendly plating solution. The cyanide-free chemical copper plating production process eliminates the activation treatment step, and the cyanide-free chemical copper plating production process is simple. The cyanide-free electroless copper plating system is stable, and the processing cost of cyanide-free electroless copper plating is low. The manufactured chemical copper layer has good bonding force with the substrate, the surface of the plating layer is smooth without dendrite growth, and the crystallization is fine and bright.

Description

technical field [0001] The invention relates to a chemical copper plating solution in an activation-free cyanide-free chemical plating system and a copper plating method thereof, and relates to the technical field of metal material surface treatment. Background technique [0002] Electroless copper plating has many good advantages and can be widely used in fields such as printed circuit boards, electromagnetic shielding, radar reflectors, and decorative surface protection of materials. Electroless copper plating technology is mainly used to form conductive coatings on non-metallic surfaces, especially in printed circuit boards, where electroless copper plating plays an important role. Electroless copper plating is a process in which copper ions are reduced and precipitated on the surface of catalytically active substances through the action of a reducing agent. It is an autocatalytic redox reaction. First, the substrate is pretreated in the early stage, and the substrate is...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/40
Inventor 丁莉峰李敏姚英武鹏杨魏戌宋寒寒焦汝任亮亮吴春张锐
Owner TAIYUAN INST OF TECH
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