A kind of activation-free cyanide-free chemical copper plating solution and its copper plating process
An electroless copper plating and solution technology, which is applied in the field of metal material surface treatment, can solve the problems of complex electroless plating process and increased cost, and achieve the effect of no dendrite growth on the surface of the coating, low processing cost and stable system
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Embodiment 1
[0029] In this embodiment, the metal material matrix is an aluminum sheet.
[0030] The production process of the non-activation-free cyanide-free chemical copper plating of the present invention comprises the steps of preparation of chemical copper plating solution, pretreatment of aluminum flakes, and chemical plating of aluminum flakes. The specific operation process is as follows:
[0031] Step (1) Preparation of electroless copper plating solution
[0032] The cyanide-free electroless copper plating solution provided by the present invention is: 30.0g / L copper sulfate, 50.0g / L potassium sodium tartrate, 30.0g / L citric acid, 30.0g / L sodium silicate, 5.0g / L nickel nitrate, The additives include 0.05mg / L 2-aminopyridine. The pH value of the electroless copper plating solution was adjusted with NaOH to make the pH value 8.0.
[0033] Step (2) Aluminum sheet pretreatment
[0034] The aluminum sheet was polished with 320 mesh, 600 mesh, and 1000 mesh sandpaper in sequence...
Embodiment 2
[0039] In this embodiment, the metal material matrix is stainless steel wire (diameter 10 mm).
[0040] The production process of the non-activation cyanide-free electroless copper plating of the present invention comprises the steps of preparation of electroless copper plating solution, pretreatment of stainless steel wire, and electroless plating of stainless steel wire. The specific operation process is as follows:
[0041] Step (1) Preparation of electroless copper plating solution
[0042] The cyanide-free electroless copper plating solution provided by the present invention is: 10.0g / L copper sulfate, 30.0g / L potassium sodium tartrate, 25.0g / L citric acid, 20.0g / L sodium silicate, 2g / L cerium chloride, The additives include 30.0mg / L 2,2'-bipyridine and 8.0mg / L methyl orange. The pH value of the electroless copper plating solution was adjusted with NaOH to make it a pH value of 9.0.
[0043] Step (2) Pretreatment of stainless steel wire
[0044] The stainless steel ...
Embodiment 3
[0049] In this embodiment, the metallic material matrix is a zinc sheet with holes.
[0050] The production process of the non-activation-free cyanide-free chemical copper plating of the present invention comprises the steps of preparation of chemical copper plating solution, pretreatment of zinc flakes with holes, and electroless plating of zinc flakes with holes. The specific operation process is as follows:
[0051] Step (1) Preparation of electroless copper plating solution
[0052] The cyanide-free electroless copper plating solution provided by the invention is: 5.0g / L copper sulfate, 20.0g / L potassium sodium tartrate, 10.0g / L citric acid, 10.0g / L sodium silicate, 0.2g / L neodymium sulfate, The additives include 40.0mg / L 2,3'-bipyridine and 10.0mg / L sodium benzenesulfonate. The pH value of the electroless copper plating solution was adjusted with NaOH to make the pH value 11.5.
[0053] Step (2) Pretreatment of perforated zinc sheet
[0054] Polish the zinc sheet wi...
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