Inorganic sol-gel preparation method of vanadium dioxide film
A technology of vanadium dioxide and inorganic sol, which is applied in the field of material chemistry, can solve the problems of high equipment requirements and temperature exceeding the heat resistance limit of ordinary glass, and achieve the effects of low cost investment, excellent optical control performance, and reduced energy consumption
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0044] (1) Preparation of vanadium sol: take 0.3g vanadium pentoxide, dissolve in 30ml mass fraction of 30% hydrogen peroxide, fully stir and react for 40min, let stand for 1h, then seal with plastic wrap and store at room temperature for 24h. That is, a stable pentavalent vanadium sol is obtained.
[0045] (2) Substrate cleaning: Quartz glass was selected as the substrate, and deionized water, acetone and ethanol were used to ultrasonically clean for 20 minutes in sequence, and then placed in an oven at 80°C to dry in order to prepare for coating.
[0046] (3) Spin coating film formation: select the sol obtained in the above step (1), and use a spin coater to coat the film. First low speed 500r / min, keep 9s, then high speed 3000r / min, keep 30s. The spin-coated film was dried in an oven at 80°C for 10 min, and spin-coated only once.
[0047] (4) Annealing: put the dried film into a tube furnace, and first evacuate to 2.0×10 3 pa, and then feed ammonia and argon respectively...
Embodiment 2
[0056] (1) The preparation of vanadium sol: take by weighing 0.6g metal vanadium powder, be dissolved in 30ml mass fraction and be 15% hydrogen peroxide, after fully stirring and reacting for 60min, let stand for 2h, then seal with plastic wrap and store at room temperature for 20h, namely A stable pentavalent vanadium sol was obtained.
[0057] (2) Substrate cleaning: select soda-lime-silica glass as the substrate, ultrasonically clean it with deionized water, acetone and ethanol in sequence for 20 minutes, and put it in an oven at 80°C to dry in order to prepare for coating.
[0058] (3) Spin coating film formation: select the sol obtained in the above step (1), and use a spin coater to coat the film. First low speed 500r / min, keep 9s, then high speed 3000r / min, keep 30s. The spin-coated film was dried in an oven at 60°C for 20 min, and spin-coated only once.
[0059] (4) Annealing: put the dried film into a tube furnace, and first evacuate to 1.0×10 2 pa, and then feed a...
Embodiment 3
[0062] (1) The preparation of vanadium sol: take by weighing 0.5g vanadium pentoxide, be dissolved in 30ml mass fraction and be 6% hydrogen peroxide, after fully stirring and reacting for 50min, leave standstill for 1h, then seal with plastic wrap and store at room temperature for 12h, That is, a stable pentavalent vanadium sol is obtained.
[0063] (2) Substrate cleaning: Quartz glass was selected as the substrate, and deionized water, acetone and ethanol were used to ultrasonically clean for 20 minutes in sequence, and then placed in an oven at 80°C to dry in order to prepare for coating.
[0064] (3) Spin coating film formation: select the sol obtained in the above step (1), and use a spin coater to coat the film. First low speed 500r / min, keep 9s, then high speed 3000r / min, keep 30s. The spin-coated film was dried in an oven at 70°C for 15 minutes, and spin-coated only once.
[0065] (4) Annealing: put the dried film into the tube furnace, first vacuum to 3.0×10 3 pa, a...
PUM
Property | Measurement | Unit |
---|---|---|
Thickness | aaaaa | aaaaa |
Phase transition temperature | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com