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Preparation method capable of continuously adjusting particle size of silver nanospheres

A silver nanometer and pellet technology, applied in nanotechnology and other directions, can solve the problems of inability to large-scale production, complicated procedures, and yield control, and achieve the effects of convenient particle size, stable chemical properties, and easy implementation.

Inactive Publication Date: 2016-01-13
UNIV OF SHANGHAI FOR SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The physical methods for preparing silver nanoparticles include physical pulverization and mechanical particle grinding, and the chemical methods include chemical reduction, electrochemical reduction, photochemical reduction, hydrothermal synthesis, precipitation, microemulsion, ultrasonic membrane diffusion, Sol-gel method, etc., but the preparation process of these methods is cumbersome, complicated procedures, time-consuming and demanding experimental conditions, not only that, the above-mentioned method can only obtain silver nanoparticles with a single diameter and the particle size is difficult to control
[0004] YN.Xia's research group prepared various silver nanoparticles with particle sizes ranging from 30nm to 100nm using polyvinylpyrrolidone (PVP) as a surface modifier and polyalcohol as a reducing agent by a liquid phase method. Although a variety of silver nanoparticles were prepared Nanoparticles, but the process is complicated, the yield is controlled by the process, and the particle size is difficult to control, so it cannot be put into large-scale production

Method used

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  • Preparation method capable of continuously adjusting particle size of silver nanospheres
  • Preparation method capable of continuously adjusting particle size of silver nanospheres
  • Preparation method capable of continuously adjusting particle size of silver nanospheres

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] In the first embodiment, the incident method adopts the magnetron sputtering method.

[0029] i) Install the ultrasonically cleaned quartz substrate on the substrate fixture with an inclination of 5°, and place the movable baffle between the substrate fixture and the sputtering target;

[0030] ii) vacuumize the vacuum chamber, the vacuum degree of the vacuum chamber reaches 5×10 -4 Above Pa, then pass argon into the vacuum chamber (you can choose argon, or a mixed gas of argon and oxygen, etc. according to the needs), so that the air pressure in the vacuum chamber reaches the working pressure, and the working pressure is 0.8Pa;

[0031] iii) Heating the quartz substrate, reaching the set temperature of 50° and injecting metallic silver particles;

[0032] iv) After the metal silver particles are evenly incident, rotate the substrate fixture, and then remove the movable baffle, and the metal silver particles (the purity of the metal silver particles is above 99.99%, th...

Embodiment 2

[0037] The incident method in the second embodiment adopts the magnetron sputtering method.

[0038] i) Install the ultrasonically cleaned K9 substrate on the substrate fixture with an inclination of 30°, and place the movable baffle between the substrate fixture and the sputtering target;

[0039] ii) vacuumize the vacuum chamber, the vacuum degree of the vacuum chamber reaches 4.5×10 -4 Above Pa, then pass argon into the vacuum chamber (you can choose argon, or a mixed gas of argon and oxygen, etc. according to the needs), so that the air pressure in the vacuum chamber reaches the working pressure, and the working pressure is 0.8Pa;

[0040] iii) Heating the K9 substrate, reaching the set temperature of 300°, injecting metallic silver particles;

[0041] iv) After the metal silver particles are uniformly incident, the substrate fixture is rotated, and then the movable baffle is removed, and the metal silver particles are deposited on the K9 substrate;

[0042] v) After 20 ...

Embodiment 3

[0046] In this embodiment, the incident mode adopts thermal evaporation mode.

[0047] i) Install the ultrasonically cleaned silicon wafer substrate on the substrate fixture at an angle of 85°, and place the movable baffle between the substrate fixture and the sputtering target;

[0048] ii) vacuumize the vacuum chamber, the vacuum degree of the vacuum chamber reaches 4.5×10 -4 Above Pa, then pass argon into the vacuum chamber (you can choose argon, or a mixed gas of argon and oxygen, etc. according to the needs), so that the air pressure in the vacuum chamber reaches the working pressure, and the working pressure is 0.8Pa;

[0049] iii) Heating the silicon wafer substrate to inject metallic silver particles after reaching the set temperature of 400°;

[0050] iv) After the metal silver particles are uniformly incident, the substrate fixture is rotated, and then the movable baffle is removed, and the metal silver particles are deposited on the silicon wafer substrate;

[0051]...

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Abstract

The invention provides a method for preparing corresponding silver nanospheres continuously adjustable in particle size. According to the method, the silver nanosphere particles different in particle size can be obtained just by selecting an appropriate angle of oblique incidence deposition, and the particle sizes can be accurately controlled so that the desired particle sizes can be intercepted; in short, the method is simple to operate, and can be widely applied to the fields of Raman enhancement, solar batteries, infrared-band biological detection and the like. Besides, the process is simple; silver nanoparticles different in size are obtained once through oblique heating deposition, and a thin film formed by the silver nanoparticles can be relatively stable and also has the characteristics of high speed, low temperature, low damage, strong adhesion and the like. Additionally, deposition techniques in the method are not specially limited and the method can be implemented through a plurality of deposition techniques. Furthermore, a substrate material is also not specially limited, and therefore, the range of application is expanded.

Description

technical field [0001] The invention relates to a preparation method of silver nano particles, in particular to a preparation method of continuously adjustable particle diameters of silver nano spheres. Background technique [0002] Since the discovery of Raman enhancement on the surface of currency metal electrodes after modification, the research on silver nanoparticles has attracted extensive attention. Studies have found that the optical, electrical, catalytic activity and other physical and chemical properties of silver nanoparticles will show different characteristics due to the different particle size, morphology and structure of the particles. Computational and experimental results show that in localized surface plasmon resonance (LSPR) and surface-enhanced Raman spectroscopy (SERS), the nanostructure of Ag determines the number, location, intensity, and spectral region and polarization of LSPR modes for efficient detection of molecules . Therefore, it is particula...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/14B22F9/12B82Y40/00
Inventor 洪瑞金姬佳林邓操陶春先张大伟
Owner UNIV OF SHANGHAI FOR SCI & TECH
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