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Method for preparing organic field effect transistor dielectric layer by using plasma crosslinking technology

A plasma and dielectric layer technology, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc., can solve the problems that cannot meet the needs of flexible devices, large leakage current of devices, etc., to overcome inflexibility and improve the surface The effect of simple features and equipment

Inactive Publication Date: 2016-01-27
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, thermally grown silica is not sufficient for flexible devices
On the other hand, the chemical vapor deposition method is widely used in the deposition of organic dielectric films. The polymer monomer is introduced into the reaction chamber, and the catalyst is used to realize the polymerization reaction on the substrate to form a film, and an insulating film with superior properties can also be obtained. , but the polymerization reaction is often accompanied by more pinholes in the process of realizing ultra-thin films, resulting in a large leakage current in the device

Method used

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  • Method for preparing organic field effect transistor dielectric layer by using plasma crosslinking technology
  • Method for preparing organic field effect transistor dielectric layer by using plasma crosslinking technology

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Experimental program
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Embodiment 1

[0024] A preparation of an organic field effect transistor, the organic field effect transistor includes a substrate, a gate electrode, a dielectric layer (PECVD), an organic semiconductor layer, and source and drain electrodes;

[0025] Specific steps:

[0026] Step 1: Cleaning the Silicon Substrate

[0027] The n-type heavily doped silicon substrate without silicon dioxide was cleaned sequentially with detergent, tap water, deionized water, acetone, and absolute ethanol for 10 minutes, and then dried with nitrogen.

[0028] The second step, plasma-enhanced chemical vapor deposition to prepare the cross-linked dielectric layer

[0029] The semi-finished product prepared above is placed in a vacuum chamber, and a mixed gas of argon and acetylene is introduced at a ratio of 5:3, and the pressure is maintained at 10Pa. The plasma is generated by inductively coupled discharge, the power is 100W, and the processing time is 30 minutes. An ultra-thin dielectric layer is formed to ...

Embodiment 2

[0035] A preparation of an organic field effect transistor, the organic field effect transistor includes a substrate, a gate electrode, an insulating layer, a dielectric layer (PECVD), an organic semiconductor layer, and source and drain electrodes, such as figure 1 shown.

[0036] Specific steps:

[0037] Step 1: Cleaning the Silicon Substrate

[0038] The n-type heavily doped silicon substrate without silicon dioxide was cleaned sequentially with detergent, tap water, deionized water, acetone, and absolute ethanol for 10 minutes, and then dried with nitrogen.

[0039] Step 2: Preparation of insulating layer by solution method

[0040] A polyvinyl alcohol solution with a mass fraction of 8wt% was prepared, the solution was coated on a silicon substrate, and a dielectric layer was prepared by spin coating at a rotational speed of about 2000rpm, and then dried to a thickness of about 800nm.

[0041] The third step, plasma-enhanced chemical vapor deposition to prepare the cro...

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Abstract

The invention belongs to the technical field of organic electronic devices, and particularly relates to a method for preparing an organic field effect transistor dielectric layer by using a plasma crosslinking technology. Firstly a gate or a gate and an insulating layer are prepared on a substrate. And then monomer which can be polymerized is activated by the plasma through a plasma enhanced chemical vapor deposition (PECVD) method, and a compact, ultrathin and crosslinking organic matter dielectric layer grows on the gate or the dielectric layer. A semiconductor layer is then prepared on a thin film. Finally a source electrode and a drain electrode are made. The PECVD method is used to achieve mutual crosslinking of organic materials and further the compact and ultrathin dielectric layer with high insulation is prepared. The method is simple and convenient. Flexible electronic devices made of the full organic materials can be realized, and the problem that inorganic materials can not bend is overcome. The thin film with high crosslinking has good insulating property. The preparation of the ultrathin dielectric layer required by the flexible electronic devices can be achieved. Meanwhile the organic materials are not dissolved in general organic solvents, and a full solution method for preparing an organic field effect transistor can be realized.

Description

technical field [0001] The invention belongs to the technical field of organic electronic devices, and in particular relates to a method for preparing a field-effect transistor dielectric layer by using plasma crosslinking technology. Background technique [0002] In recent years, organic electronic devices have developed rapidly, new materials, new processes, and new devices have emerged one after another, and scientific research and industrial applications have also advanced hand in hand. Organic electronic devices mainly include organic photovoltaic cells, organic light-emitting diodes, organic field-effect transistors, etc. In the field effect transistor, since its turn-on and turn-off is mainly realized by the mechanism that the gate voltage generates polarized charges in the semiconductor layer to connect the source and drain, the dielectric properties of the device dielectric layer and the The magnitude of the loaded gate voltage plays a decisive role in the manufact...

Claims

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Application Information

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IPC IPC(8): H01L51/05H01L51/40
CPCH10K10/474H10K10/471
Inventor 何孔多曾盼杨晓森区琼荣梁荣庆
Owner FUDAN UNIV
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