A kind of preparation method of the graphene nano-wall electrode doped with nano co(oh)2/co3o4
A graphene nano-wall and manufacturing method technology, which is applied to the manufacture of hybrid/electric double-layer capacitors, hybrid capacitor electrodes, etc., can solve the problems of poor graphene wall structure, limited surface area improvement, small effective surface area, etc. Good dispersion, avoid the effect of agglomeration
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Embodiment 1
[0038] Copper sheet is used as substrate 1, and graphene nanowall 2 is prepared by PECVD; cobalt acetate is used as precursor to prepare doped Co(OH) 2 Graphene nanowall supercapacitor electrode of nanoparticles, see for specific structure figure 1 .
[0039] in CH 4 The plasma was used as a precursor, and Cu was heated to 800 °C in a PECVD reactor by passing argon and hydrogen at the same time. The graphene nanowall 2 is grown on the substrate 1 by the PECVD method, the growth time is controlled to 30 minutes, the gas flow of the precursor is 10 sccm, and the air pressure is 10Pa, and the graphene nanowall 2 with a height of 1 micron can be obtained. to N 2 The plasma was bombarded at 50W for 100s. Dissolve 2 parts by mass of glacial acetic acid and 2 parts by mass of citric acid in water and ethanol, and adjust the pH value to 3 with concentrated hydrochloric acid. Add 1 part by mass of cobalt acetate to the solution prepared above, and stir thoroughly at 60°C to obtain...
Embodiment 2
[0042] Using metal nickel as the substrate, using PECVD to prepare graphene nano-walls; using cobalt carbonate as a precursor to prepare doped nano-Co(OH) 2 Graphene nanowall supercapacitor electrodes.
[0043] in CH 4 The plasma of Ni was used as a precursor, and Ni was heated to 800 °C in a PECVD reactor. Graphene nanowalls were grown on the substrate by PECVD method, the precursor gas flow was 20sccm, and the gas pressure was 20Pa. The growth time is controlled to be 60 minutes, and a graphene nanowall with a height of 3 microns can be obtained. with O 2 The plasma was bombarded for 210s at 60W power. Dissolve 6 parts by mass of tartaric acid in water and ethanol, and adjust the pH value to 3 with concentrated hydrochloric acid. Add 1 part by mass of cobalt acetate to the solution prepared above, and stir thoroughly at 60° C. to obtain a 0.1 mol / L cobalt acetate solution. 4 parts by mass of polyvinylpyrrolidone was added to the obtained cobalt acetate solution as a su...
Embodiment 3
[0045] Using silicon wafers as substrates, PECVD was used to prepare graphene nanowalls; cobalt acetate was used as a precursor to prepare doped nano-Co 3 o 4 Graphene nanowall supercapacitor electrodes.
[0046] in CH 4 Plasma is used as a precursor, and the Si wafer is heated to 1000°C in a PECVD reactor. Graphene nanowalls were grown on the substrate by PECVD method, the precursor gas flow was 20sccm, and the gas pressure was 20Pa. The growth time is controlled to be 150 minutes, and a graphene nanowall with a height of 5 microns can be obtained. in NH 3 The plasma was bombarded at 100W for 165s.
[0047] Dissolve 3 parts by mass of glacial acetic acid and 3 parts by mass of tartaric acid in water and ethanol, and adjust the pH value to 3 with concentrated hydrochloric acid. Add 2 parts by mass of cobalt acetate to the solution prepared above, and stir thoroughly at 60° C. to obtain a 0.2 mol / L cobalt acetate solution. To the obtained cobalt acetate solution was adde...
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