Method for purification of off-gas and device for the same
A waste gas purification and waste gas technology, applied in chemical instruments and methods, separation methods, gas treatment, etc., can solve the problems of expensive equipment and treatment costs, influence of polysilicon purity, low molecular weight, etc., and achieve the effect of reducing equipment and process operating costs
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Embodiment 1
[0103] Based on activated carbon, 5% by weight of platinum (Pt) catalyst was mixed with methanol containing a small amount of water, the mixture was coated on activated carbon, and then heated in a drying oven at 80°C to remove methanol and moisture, thereby preparing Carbon support (5% by weight of Pt / C) on which a transition metal catalyst is supported.
[0104] The carbon support that is loaded with transition metal catalyst on it is packed in the catalytic reactor, then, at temperature 150 ℃, under pressure 3 bars, activate 1 hour 30 minutes, to remove the organic substance of active carbon and moisture (H 2 O).
[0105] In the catalytic reactor, exhaust gas produced by a polysilicon deposition process by chemical vapor deposition (CVD) is introduced. Based on gas chromatography (GC) peak areas, the off-gas contains about 99 mole percent hydrogen (H 2 ), about 0.5 mole percent hydrogen chloride (HCl), about 0.03 mole percent trichlorosilane, and about 0.07 mole percent s...
experiment Embodiment 1
[0111] use as figure 1 The purification device shown purifies the exhaust gas. In order to confirm its performance, the process was simulated using the process simulation software ASPENPlus.
[0112] The reaction temperature and pressure of the catalytic reactor 3 were set at 170° C. and 5 barG, respectively, and the composition of the stream introduced into the catalytic reactor 3 was set to consist of 1 mol% of hydrogen chloride, 2 mol% of dichlorosilane, 10 mol% Trichlorosilane, 7 mol% silicon tetrachloride, and 80 mol% hydrogen. As for the catalytic reactor 3, the R-Gibbs and R-Stoic models are used.
[0113]As a result of the simulation under the above conditions, the mixed gas 5 passing through the catalytic reactor 3 is composed of 1 mol% of dichlorosilane, 12 mol% of trichlorosilane, 7 mol% of silicon tetrachloride, and 80 mol% of hydrogen composition, and it can be confirmed that hydrogen chloride and dichlorosilane are reacted under given reaction conditions to be...
experiment Embodiment 2
[0115] use as figure 2 The purification device shown purifies the exhaust gas. In order to confirm its performance, the process was simulated using the process simulation software ASPENPlus.
[0116] The reaction temperature and pressure of the catalytic reactor 30 were set at 170° C. and 5 barG, respectively, and the composition of the stream introduced into the catalytic reactor 30 was set to consist of 1 mol% of hydrogen chloride, 2 mol% of dichlorosilane, 10 mol% Trichlorosilane, 7 mol% silicon tetrachloride, and 80 mol% hydrogen. As for the catalytic reactor 30, the R-Gibbs and R-Stoic models are used.
[0117] The purification temperature in the first distillation column 60 is set at -5 to -60° C., and the pressure is set at 23 barG. The composition of the mixed gas 50 stream introduced into the first distillation tower 60 is set to be the same as the composition obtained as a result of the simulation of the catalytic reactor 30, which consists of 1 mol% of dichloros...
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