Preparation technique of graphite core-shell structure
A core-shell structure and preparation process technology, applied in the field of graphite, can solve problems such as restricting applications
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[0007] The preparation process of this graphite core-shell structure is characterized in that: the preparation of copper thin film: the aluminum thin film with a thickness of 100nm is prepared by using the DPS-Ⅲ type ultra-high vacuum magnetron sputtering coating setting on the target, and the substrate used is For single crystal Si100, the target material is a high-purity aluminum target with a diameter of 5 cm. The Si100 substrate is ultrasonically cleaned with acetone, alcohol, and deionized water for 15 minutes, and then placed on the sample stage of the coating equipment. When the background pressure of the vacuum chamber is lower than 3×10 4 After Pa, start to deposit aluminum film on Si100, during the deposition process, the Ar gas flow rate is 50 sccm, and the sputtering pressure is 0.3Pa.
[0008] The preparation of the graphite core-shell structure material: put the aluminum film prepared by magnetron sputtering on the target into the reaction chamber of radio freque...
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