Ferroelectric local field enhanced two-dimensional semiconductor photoelectric detector and preparation method
A two-dimensional semiconductor and local field technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc. Issues such as device life or performance, to achieve the effect of improving signal-to-noise ratio and detection ability, reducing dark current, and good stability
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[0039] The specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing:
[0040] The invention develops a ferroelectric local field-enhanced two-dimensional semiconductor high-sensitivity photodetector. The ultra-strong local electric field generated by the negative polarization of the P(VDF-TrFE) ferroelectric polymer material completely depletes the intrinsic carriers in the transition metal chalcogenide two-dimensional semiconductor channel, thereby significantly reducing the detection The dark current of the device under no gate voltage improves the detection performance of the device.
[0041] Specific steps are as follows:
[0042] 1. Substrate selection
[0043] A heavily doped p-type silicon with a thickness of 0.5 mm is selected as the substrate.
[0044] 2. Preparation of oxide dielectric layer
[0045] Oxidize silicon dioxide with a thickness of 285 nm on the surface of the silicon substrate by thermal oxida...
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