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Treatment method of sapphire crystal polishing waste liquid

A technology of sapphire crystal and treatment method, which is applied in the field of treatment of sapphire crystal polishing waste liquid, can solve the problems of high treatment cost and long operation period, and achieve the effects of reducing pollution, high removal rate and realizing zero discharge

Active Publication Date: 2019-04-12
HEBEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved by the present invention is: provide the processing method of sapphire crystal polishing waste liquid, be to adopt electrochemical method to process sapphire crystal polishing waste liquid, in the anode of electrochemical treatment tank, precipitate silicon dioxide, the waste water that has processed can be Returning to the grinding process for use, the precipitated silica can be used as a silicate material after drying, which overcomes the disadvantages of secondary pollution, long operation period, and high processing cost in the prior art.

Method used

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  • Treatment method of sapphire crystal polishing waste liquid
  • Treatment method of sapphire crystal polishing waste liquid

Examples

Experimental program
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Effect test

Embodiment 1

[0034] A. Set up the electrochemical treatment device:

[0035] The electrochemical treatment device used mainly includes a chemical treatment tank 1, an anode 2, a cathode 3 and a DC power supply 4, the anode 2 and the cathode 3 are fixedly placed in the chemical treatment tank 1, the anode 2 is connected to the positive pole of the DC power supply 4, and the cathode 3 It is connected with the negative electrode 4 of the DC power supply, wherein the material of the anode 2 is a thin iron sheet with a thickness of 1 mm, and the material of the cathode 3 is a thin iron sheet with a thickness of 1 mm;

[0036] B. Carry out electrochemical treatment to sapphire crystal polishing waste liquid:

[0037] The first step is to adjust the pH value of the sapphire crystal polishing waste liquid:

[0038] The sapphire crystal polishing waste liquid that the weight percentage concentration that contains silicon dioxide that needs to handle is 5% is put into the chemical treatment tank 1 ...

Embodiment 2

[0044] Except that the material of the anode 2 is a thin iron sheet with a thickness of 0.5 mm, and the material of the cathode 3 is a thin iron sheet with a thickness of 0.5 mm, the precipitate generated by the surface reaction of the anode 2 materials is removed every 25 minutes and collected, and carried out in a total After the electrochemical reaction for 4 hours to the completion of the reaction, the precipitates generated on the surface of the anode 2 material were generally removed and the removed precipitates were collected. Others were the same as in Example 1.

Embodiment 3

[0046] Except that the material of the anode 2 is a thin iron sheet with a thickness of 2 mm, and the material of the cathode 3 is a thin iron sheet with a thickness of 2 mm, the precipitate generated by the surface reaction of the anode 2 material is removed every 45 minutes and collected, and carried out in a total After the electrochemical reaction for 7 hours to the completion of the reaction, the precipitates generated on the surface of the anode 2 material were generally removed and the removed precipitates were collected. Others were the same as in Example 1.

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Abstract

The invention provides a treatment method for waste sapphire crystal polishing liquid, belonging to the field of treatment of waste water. The treatment method comprises the following steps: arranging an electrochemical treatment apparatus which mainly comprises a chemical treatment tank, a positive electrode, a negative electrode and a DC source; adjusting the initial pH value of the waste sapphire crystal polishing liquid to be 6 to 12; carrying out electrochemical treatment and controlling the voltage and current of the DC source to be 10 to 40 V and 0.5 A or above, respectively; and carrying out aftertreatment, collecting a precipitate for preparation of a silicate material and recycling liquid for reuse in a sapphire crystal polishing process. The treatment method provided by the invention overcomes the disadvantages of secondary pollution, long operation period, high treatment cost, etc. in the prior art.

Description

technical field [0001] The technical scheme of the invention relates to the treatment of waste water, in particular to the treatment method of sapphire crystal polishing waste liquid. Background technique [0002] Sapphire crystal has very stable chemical properties, high hardness, good light transmission, thermal conductivity and electrical insulation, good mechanical and mechanical properties, and has the characteristics of wear resistance and wind erosion resistance. The melting point of sapphire crystal is 2050 °C , The boiling point is 3500°C, and the maximum working temperature can reach 1900°C. As an important technical crystal, sapphire crystal has been widely used in various technical fields, and is mostly used as infrared-transmitting window materials, substrates in the field of microelectronics, laser substrates and optical components. In the application of the sapphire crystal, it is required to reduce the surface roughness of the wafer as much as possible, whic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C02F1/46C01B33/12
CPCC01B33/12C02F1/46
Inventor 张保国潘柏臣赵帅王如周朝旭
Owner HEBEI UNIV OF TECH
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