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A kind of preparation method of rolling processing tungsten-titanium alloy target material

A technology of tungsten-titanium alloy and target material, which is applied in metal material coating process, vacuum evaporation coating, coating, etc., can solve problems such as easy oxidation, rolling deformation processing, and easy cracks in sheet metal, so as to avoid Heating oxidation, the effect of controllable thickness and size

Active Publication Date: 2018-11-23
安泰天龙钨钼科技有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a method for preparing a rolling-processing tungsten-titanium alloy target, which solves the problem that the tungsten-titanium alloy containing active metals cannot be rolled and deformed (that is, the tungsten-titanium alloy containing active metals is easy to roll). Oxidation occurs, the sheet is prone to cracks), and high-density, large-size tungsten-titanium alloy targets can be prepared

Method used

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  • A kind of preparation method of rolling processing tungsten-titanium alloy target material
  • A kind of preparation method of rolling processing tungsten-titanium alloy target material
  • A kind of preparation method of rolling processing tungsten-titanium alloy target material

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Experimental program
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Effect test

Embodiment 1

[0035] (1) Mixing step: select W powder with a purity of 99.95% and a Fischer particle size of 3.5 μm and TiH with a purity of 99.9% and a particle size of -325 mesh (less than about 45 μm) 2 Flour is used as raw material for batching, batching ratio: TiH 2 The mass percent of W powder is 11%, and the mass percent of W powder is 89%. Put the two raw materials into the tank of the mixing machine, vacuumize and fill the tank with argon to protect the mixing tank, and then mix them for 16 hours to obtain W-TiH 2 mixed powder;

[0036] (2) Compacting step: the uniformly mixed W-TiH 2 Put the powder into the mold and form it by cold isostatic pressing with a pressure of 150MPa and a holding time of 15min to obtain W-TiH 2 Blank;

[0037] (3) Pre-burning step: W-TiH 2 The billet is pre-fired and reduced in a flowing hydrogen atmosphere sintering furnace, the pre-fired temperature is 1100 ° C, and the heat preservation is 4 hours to obtain the pre-fired billet;

[0038] (4) Sin...

Embodiment 2

[0045] (1) Mixing step: select W powder with a purity of 99.95% and a Fischer particle size of 3 μm and TiH with a purity of 99.9% and a particle size of -400 mesh (below about 38 μm) 2 Flour is used as raw material for batching, batching ratio: TiH 2 The mass percent of W powder is 20%, and the mass percent of W powder is 80%. Put the two raw materials into the tank of the mixing machine, make the mixing tank in a vacuum state by vacuuming, and then mix them for 24 hours to obtain W-TiH 2 mixed powder;

[0046] (2) Compacting step: the uniformly mixed W-TiH 2 Put the powder into the mold and form it by cold isostatic pressing with a pressure of 200MPa and a holding time of 10min to obtain W-TiH 2 Blank;

[0047] (3) Pre-burning step: W-TiH 2 The billet is pre-fired and reduced in a flowing hydrogen atmosphere sintering furnace, the pre-fired temperature is 1200 ° C, and the heat preservation is 2 hours to obtain the pre-fired billet;

[0048] (4) Sintering step: sinter ...

Embodiment 3

[0055] (1) Mixing step: select W powder with a purity of 99.95% and a Fischer particle size of 5 μm and TiH with a purity of 99.9% and a particle size of -300 mesh (less than about 48 μm) 2 Flour is used as raw material for batching, batching ratio: TiH 2 The mass percent of W powder is 15%, and the mass percent of W powder is 85%. Put the two raw materials into the tank of the mixing machine, make the mixing tank in a vacuum state by vacuuming, and then mix them for 24 hours to obtain W-TiH 2 mixed powder;

[0056] (2) Compacting step: the uniformly mixed W-TiH 2 The powder is put into the mold, and molded by a hydraulic press with a pressure of 100MPa and a holding time of 1min to obtain W-TiH 2 Blank;

[0057] (3) Pre-burning step: W-TiH 2 The billet is pre-fired and reduced in a flowing hydrogen atmosphere sintering furnace, the pre-fired temperature is 1000°C, and it is kept for 4 hours to obtain a pre-fired billet;

[0058] (4) Sintering step: Sinter the pre-fired ...

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Abstract

The invention belongs to the technical field of preparation of nonferrous metal target materials and particularly relates to a preparation method for rolling processing of a tungsten-titanium alloy target material. The method comprises the following steps of taking W powder and TiH2 powder as raw materials; sequentially performing mixing, green compacting, presintering, sintering, sheathing, rolling and heat treatment, and finally obtaining the tungsten-titanium alloy target material. According to the preparation method disclosed by the invention, a process of mixing the W powder with the TiH2 powder, and then pressing and forming; performing presintering reduction and high-temperature vacuum sintering on a compact green, and sheathing and rolling a billet tape is adopted; the compact green is subjected to the presintering reduction, and the impurity content and the oxygen content in billets can be effectively reduced; the compact green is subjected to the high-temperature vacuum sintering, thus obtaining a high-purity tungsten-titanium alloy billet; the billet tape is sheathed, and then can be heated in an atmospheric heating furnace, so that the phenomenon of oxidation of Ti element in the billet due to heating is avoided, and smooth operation of rolling processing is guaranteed; finally, the density of the obtained target material can reach 99.6 percent or above; and the target material is controllable in thickness dimension and simple in process, and is suitable for large-batch industrial production.

Description

technical field [0001] The invention belongs to the technical field of non-ferrous metal target material preparation, and in particular relates to a method for preparing a rolling-processing tungsten-titanium alloy target material. Background technique [0002] Tungsten has a high atomic weight and titanium has high corrosion resistance and excellent surface adhesion, making tungsten-titanium (W-Ti) an ideal solution for dense layers that prevent the diffusion of foreign atoms. In the metallization process of semiconductor chip manufacturing, tungsten-titanium alloy containing 10wt% titanium is often used as a diffusion barrier and bonding layer to separate semiconductor and metallization layers, such as aluminum and silicon or copper and silicon. In flexible thin-film solar cells (CIGS), the tungsten-titanium barrier layer can prevent the diffusion of iron atoms in the steel matrix to the CIGS semiconductor through the molybdenum back contact, and significantly reduce the e...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/34B22F3/18B22F3/02B22F3/10
CPCB22F3/02B22F3/1007B22F3/18B22F2003/185B22F2998/10B22F2999/00C23C14/3414B22F2201/20
Inventor 王广达姚惠龙刘国辉刘桂荣熊宁弓艳飞
Owner 安泰天龙钨钼科技有限公司