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Sintering method for preparing silica glass and silica glass

A technology of quartz glass and sintering method, which is applied in glass forming, glass manufacturing equipment, manufacturing tools, etc. It can solve the problems of difficult gas discharge, high cost, and low efficiency, so as to improve product quality, improve sintering efficiency, and reduce costs. Effect

Inactive Publication Date: 2017-02-15
CHINA BUILDING MATERIALS ACAD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] For the larger silica soot body, during sintering, the gas in the pores inside the silica soot body is not easy to be discharged, and the gas discharge effect is poor through the method of introducing helium in the prior art, and the obtained quartz There are still many pores in the glass, and the product quality cannot meet the requirements of aerospace, laser nuclear technology, precision optics and instruments, semiconductors, liquid crystal display and other fields; the existing zone melting step by step sintering method has low efficiency and high cost

Method used

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  • Sintering method for preparing silica glass and silica glass
  • Sintering method for preparing silica glass and silica glass
  • Sintering method for preparing silica glass and silica glass

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Embodiment 1

[0055] Such as figure 1 As shown, one embodiment of the present invention proposes a sintering method for preparing quartz glass and quartz glass, which are used to sinter a silica loose body in a sintering space to obtain a finished quartz glass, wherein the silica There are pores in the loose body, the porosity of the silicon dioxide loose body can be 20-90%, preferably more than 50%; the diameter of the silicon dioxide loose body can be more than 300mm; such as φ350mm, φ550mm, φ750mm, φ850mm, φ950mm. The above method can be realized by the device provided in the second embodiment below.

[0056] The silicon dioxide loose body can be synthesized from silicon-containing raw materials through low-temperature chemical vapor deposition. The silicon dioxide loose body is a high-purity silicon dioxide loose body, and the silicon dioxide in the high-purity silicon dioxide loose body is The content is above 99.99%. Or the silica soot body is a doped silica soot body, and the dopin...

Embodiment 2

[0108] Embodiment 2 of the present invention provides a sintering device for preparing quartz glass, which is used for sintering a soot silica body to obtain a finished quartz glass product, wherein the soot silica body has pores; the soot silica body has a diameter of Can be more than 300mm; such as φ350mm, φ550mm, φ750mm, φ850mm, φ950mm.

[0109] The silicon dioxide loose body can be synthesized from silicon-containing raw materials through low-temperature chemical vapor deposition. The silicon dioxide loose body is a high-purity silicon dioxide loose body, and the silicon dioxide in the high-purity silicon dioxide loose body is The content is above 99.99%. Or the silica soot body is a doped silica soot body, and the doping elements are boron (B), aluminum (Al), fluorine (F), iron (Fe), titanium (Ti), cerium (Ce), At least one of calcium (Ca), magnesium (Mg), sodium (Na), potassium (K), barium (Ba), yttrium (Y), lanthanum (La), zirconium (Zr), and germanium (Ge).

[0110] ...

Embodiment 3

[0140] Such as Figure 6 As shown, a system for preparing quartz glass provided by Embodiment 3 of the present invention includes:

[0141] A low-temperature chemical vapor deposition device (not shown in the figure) is used for synthesizing silicon-containing raw materials through low-temperature chemical vapor deposition to obtain a silicon dioxide loose body, and the silicon dioxide loose body is a high-purity silicon dioxide loose body or a doped silicon dioxide Heterosilica soot body, wherein the content of silicon dioxide in the high-purity silica soot body is above 99.99%;

[0142] A sintering device 100 for preparing quartz glass, the sintering device for preparing quartz glass includes:

[0143] a furnace body, the furnace body has a sintering space for accommodating the silica loose body;

[0144] The furnace body also has a heater for heating the sintering space;

[0145] The furnace body is also equipped with a vacuum passage connecting the sintering space, whic...

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Abstract

The invention relates to a sintering method for preparing silica glass and the silica glass, relates to the field of silica glass preparation and mainly aims to avoid or reduce the generation of bubbles during silica glass preparation through an indirect synthesis method, increase the sintering efficiency of the silica glass and reduce the cost. The method is used for sintering a silica loose body in sintering space. The method comprises the following steps: vacuumizing the sintering space into a negative pressure environment, sintering the silica loose body in the sintering space, discharging air holes in the silica loose body under the negative pressure environment, and sintering the silica loose body into transparent silica glass; cooling the transparent silica glass, thus obtaining a silica glass finished product. In the silica glass finished product obtained after sintering, the content of the bubbles in the silica glass finished product can be reduced, so that the product quality of the silica glass is increased; through integral and simultaneous heating and sintering, the sintering efficiency of the silica loose body is increased, and the cost is reduced.

Description

technical field [0001] The invention relates to the field of quartz glass preparation, in particular to a sintering method for preparing quartz glass and the quartz glass. Background technique [0002] Quartz glass has good properties, such as high temperature resistance, low expansion coefficient, thermal shock resistance, high chemical stability and good electrical insulation performance. It is a special industrial technical glass mainly composed of silicon dioxide. It is classified according to its purity. There are three types: high-purity, common and doped. [0003] At present, the preparation process of quartz glass is mainly divided into direct method and indirect method. In the direct method, quartz glass is made of crystal, silica, and silicon-containing compounds as raw materials, which are melted at high temperature or chemical vapor deposition. Melting methods include electric melting, gas refining, chemical vapor deposition CVD and plasma chemical vapor deposit...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03B20/00
CPCC03B19/066C03B2201/02C03B2201/10C03B2201/12C03B2201/14C03B2201/31C03B2201/32C03B2201/34C03B2201/36C03B2201/40C03B2201/42C03B2201/50C03B2201/54
Inventor 聂兰舰向在奎饶传东王蕾刘飞翔邵竹锋王慧王宏杰贾亚男符博张辰阳王玉芬
Owner CHINA BUILDING MATERIALS ACAD
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