A kind of tisinin nanocomposite coating and preparation method thereof
A nano-composite coating and nano-grain technology, which is applied in the field of materials science, can solve the problems of not meeting the requirements of high-speed cutting performance, super-high hardness of composite coating, deposition conditions of anti-oxidation performance, and deposition efficiency. The effects of variable stress field enhancement, improved surface performance and service life, and low energy consumption
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[0024] Preparation, characterization and measuring instruments used in the present invention:
[0025] JGP-450 Magnetron Sputtering System, Shenyang Scientific Instrument Development Center Co., Ltd., Chinese Academy of Sciences
[0026] D8 Advance X-ray diffractometer, Bruker, Germany
[0027] NANO Indenter G200 nanoindenter, Agilent Technologies, USA
[0028] Tecnai G 2 Model 20 high-resolution transmission electron microscope, FEI, USA
[0029] Quanta FEG450 scanning electron microscope (with Oxford energy spectrometer), American FEI company
Embodiment 1
[0031] A preparation method for a TiSiNiN nanocomposite coating, comprising the steps of:
[0032] 1) A step of cleaning the substrate, sending the polished substrate into an ultrasonic cleaning machine, and using 15-30 kHz ultrasonic waves in absolute alcohol and acetone to clean it for 5-10 minutes; then perform ion cleaning; the ion cleaning Put the substrate into the vacuum chamber and evacuate to 4×10 -4 Pa~10×10 -4 Ar gas is introduced after Pa, the vacuum is maintained at 2-4Pa, and the substrate is bombarded with ions at 13.56Hz (intermediate frequency) for 20-40min, with a power of 80-100W; the substrate is single crystal Si;
[0033] 2) Using a multi-target magnetron sputtering apparatus, the step of performing magnetron sputtering reaction deposition on the substrate by the TiSiNi composite target; putting the cleaned substrate into the multi-target magnetron sputtering apparatus and staying in front of the TiSiNi composite target ; using Ti 20 Si 5 Ni 0 (80ato...
Embodiment 2
[0036] A preparation method for a TiSiNiN nanocomposite coating, comprising the steps of:
[0037] 1) A step of cleaning the substrate, sending the polished substrate into an ultrasonic cleaning machine, and using 15-30 kHz ultrasonic waves in absolute alcohol and acetone to clean it for 5-10 minutes; then perform ion cleaning; the ion cleaning Put the substrate into the vacuum chamber and evacuate to 4×10 -4 Pa~10×10 -4 Ar gas is introduced after Pa, the vacuum degree is maintained at 2-4Pa, and the substrate is bombarded with ions for 20-40min with a medium frequency, and the power is 80-100W; the substrate is single crystal Si;
[0038] 2) Using a multi-target magnetron sputtering apparatus, the step of performing magnetron sputtering reaction deposition on the substrate by the TiSiNi composite target; putting the cleaned substrate into the multi-target magnetron sputtering apparatus and staying in front of the TiSiNi composite target ; using Ti 20 Si 4 Ni 1 (80atom%:1...
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Abstract
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Application Information

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