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Preparation method of high-purity dense magnesium oxide target material based on rapid surface heat treatment

A rapid heat treatment and magnesium oxide technology, applied in the field of magnesium oxide targets, can solve the problems of complex process, high cost, and rare hardened layer on the surface of magnesium oxide targets, and achieve good surface finish, low production cost, and high density. Good results

Inactive Publication Date: 2017-05-31
DONGGUAN JIAQIAN NEW MATERIAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The magnesium oxide target prepared by this method has high purity and high density, but the cost is high and the process is relatively complicated
Moreover, there are not many studies on the treatment of the surface hardening layer of magnesium oxide targets.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] (1) Using magnesia powder as the raw material, the raw material is subjected to planetary ball milling, the ball milling medium is zirconia balls, balls in the ball grade difference: small balls are 1:1, the ball milling speed is 200r / min, the ball milling time is 16h, and the ball-to-material ratio The ratio is 2:1, and the ground powder is sieved with 200 meshes. The purity of magnesium oxide powder is not less than 99.99%, the total content of impurity elements is less than 100ppm, and the average particle size is 100nm.

[0028] (2) The sieved powder was subjected to cold isostatic pressing at a pressure of 200 MPa and a holding time of 8 minutes to obtain a magnesium oxide compact, wherein the relative density of the magnesium oxide compact was 59.7%, and the relative density deviation was less than 2%.

[0029] (3) Vacuum sinter the magnesia compact, heat it at room temperature to 500°C, keep it warm for 4h, heat up to 1000°C at a heating rate of 5°C / min, and then ...

Embodiment 2

[0032] (1) Using magnesia powder as the raw material, the raw material is subjected to planetary ball milling, the ball milling medium is zirconia balls, balls in the ball grade difference: small balls are 1:1, the ball milling speed is 200r / min, the ball milling time is 16h, and the ball-to-material ratio The ratio is 2:1, and the ground powder is sieved with 200 meshes. The purity of magnesium oxide powder is not less than 99.99%, the total content of impurity elements is less than 100ppm, and the average particle size is 100nm.

[0033](2) The sieved powder is subjected to cold isostatic pressing at a pressure of 200 MPa and a holding time of 8 minutes to obtain a magnesium oxide compact, wherein the relative density of the magnesium oxide compact is 59.8%, and the relative density deviation is less than 2%.

[0034] (3) Vacuum sinter the magnesia compact, heat it at room temperature to 500°C, keep it warm for 4h, heat up to 1000°C at a heating rate of 5°C / min, and then star...

Embodiment 3

[0037] (1) Using magnesia powder as the raw material, the raw material is subjected to planetary ball milling. The ball milling medium is zirconia balls. The ratio is 1.5:1, and the ground powder is sieved with 200 meshes. The purity of magnesium oxide powder is not less than 99.99%, the total content of impurity elements is less than 100ppm, and the average particle size is 300nm.

[0038] (2) The sieved powder is subjected to cold isostatic pressing at a pressure of 350 MPa and a holding time of 20 minutes to obtain a magnesium oxide compact, wherein the relative density of the magnesium oxide compact is 62%, and the relative density deviation is less than 2%.

[0039] (3) Vacuum sinter the magnesia compact, heat it at room temperature to 1000°C, keep it warm for 4 hours, heat it up to 1000°C at a heating rate of no more than 5°C / min, and then start vacuuming. The sintering vacuum within 10 minutes is 1.0 Pa, then heat up from 1000°C to sintering temperature 1550°C at a heat...

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Abstract

The invention provides a preparation method of a high-purity dense magnesium oxide target material based on rapid surface heat treatment. The method comprises the following steps: taking magnesium oxide powder as the raw material, taking zirconium oxide spheres as media, carrying out planetary ball milling of the raw material, and sieving the milled powder via a 200-mesh sieve; carrying out cold isostatic pressing of the sieved powder to obtain a magnesium oxide pressed blank; sintering the magnesium oxide pressed blank in vacuum, carrying out surface precision machining of the target material according to the needed target material size till the surface roughness of the target material is less than or equal to 0.8 micron after vacuum sintering is ended to obtain a magnesium oxide target material; and grinding the surface of the magnesium oxide target material, then washing and finally carrying out rapid surface heat treatment under the vacuum condition by using a continuous wave laser heat treatment method, a scanning electron beam method or a non-coherent wideband frequency light source method to obtain the high-purity dense magnesium oxide target material based on rapid surface heat treatment. The magnesium oxide target material prepared by the method is high in purity, high in density and consistent in surface layer structures and inner layer structures; and the preparation method is simple, green, environmentally-friendly and energy-saving, and is short in preparation time.

Description

technical field [0001] The invention belongs to the technical field of magnesium oxide targets, and in particular relates to a method for preparing high-purity dense magnesium oxide targets based on surface rapid heat treatment. Background technique [0002] Magnesium oxide has the advantages of high temperature thermal stability, high dielectricity, low dielectric loss, and good lattice matching of various substrates. Magnesium oxide thin films are usually magnetron sputtering. The purity, density, and grain size of the target material The size and size distribution will greatly affect the quality and performance of the sputtered film. For example, the density of the target affects the deposition rate during sputtering, the particle density and arc discharge of the sputtered coating, and also affects the electrical and optical properties of the sputtered coating. Moreover, the finer the grains of the target material, the faster the sputtering rate, the more concentrated the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/053C04B35/626C04B41/00
CPCC04B35/053C04B35/62605C04B41/0036C04B41/0045C04B2235/6562C04B2235/6567C04B2235/6581C04B2235/661C04B2235/95
Inventor 王海燕
Owner DONGGUAN JIAQIAN NEW MATERIAL TECH CO LTD
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