A metatitanic acid-coated alumina core-shell abrasive grain polishing liquid composition and preparation method thereof

A technology of polishing liquid composition and core-shell abrasive grains, which is applied in the fields of polishing compositions containing abrasives, semiconductor/solid-state device manufacturing, electrical components, etc., and can solve the problem of many scratches on the surface of sapphire substrates and unsatisfactory polishing results , high surface roughness, etc., to achieve the effect of improving polishing scratches and surface damage, reducing surface roughness, and increasing polishing rate

Active Publication Date: 2018-10-23
东莞市圣高机械科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the chemical mechanical polishing of sapphire, the abrasive (abrasive grain) is the main component. Nowadays, single abrasive grains such as silicon oxide and aluminum oxide are used to polish sapphire, but satisfactory polishing results cannot be obtained.
Due to the high hardness of alumina, there are many scratches on the surface of the polished sapphire substrate; the surface roughness is high, which reduces the polishing quality

Method used

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  • A metatitanic acid-coated alumina core-shell abrasive grain polishing liquid composition and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] A method for preparing a metatitanic acid-coated alumina core-shell abrasive grain polishing fluid composition, the steps are as follows:

[0023] (1). Disperse 100g of alumina into 900g of deionized water, then add 1g of dispersant sodium hexametaphosphate, stir evenly, carry out ultrasonic dispersion, and finally carry out ball mill dispersion to obtain a mass fraction of 5% alumina aluminum paste;

[0024] (2). Under stirring at 100°C, 25 mL of titanium sulfate with a molar concentration of 0.25 mol / L and a sodium hydroxide solution with a mass fraction of 5% are simultaneously added dropwise to the mixed slurry obtained in step (1), and the control The rate of addition of titanium sulfate and sodium hydroxide, the rate of addition is the same as the evaporation rate of the solution, so that the liquid level of the reaction solution remains constant, and the pH of the reaction solution is 10; after the addition of titanium sulfate, stop adding hydrogen Sodium oxide,...

Embodiment 2

[0033] A method for preparing a metatitanic acid-coated alumina core-shell abrasive grain polishing fluid composition, the steps are as follows:

[0034] (1). Disperse 100g of alumina into 900g of deionized water, then add 1g of dispersant sodium hexametaphosphate, stir evenly, carry out ultrasonic dispersion, and finally carry out ball mill dispersion to obtain a mass fraction of 5% alumina aluminum paste,

[0035] (2). Under stirring at 100°C, 50 mL of titanium sulfate with a molar concentration of 0.25 mol / L and a sodium hydroxide solution with a mass fraction of 5% are simultaneously added dropwise to the mixed slurry obtained in step (1), and the control The rate of addition of titanium sulfate and sodium hydroxide, the rate of addition is the same as the evaporation rate of the solution, so that the liquid level of the reaction solution remains constant, and the pH of the reaction solution is 10; after the addition of titanium sulfate, stop adding hydrogen Sodium oxide,...

Embodiment 3

[0044] A method for preparing a metatitanic acid-coated alumina core-shell abrasive grain polishing fluid composition, the steps are as follows:

[0045] (1). Disperse 100g of alumina into 900g of deionized water, then add 1g of dispersant sodium hexametaphosphate, stir evenly, carry out ultrasonic dispersion, and finally carry out ball mill dispersion to obtain a mass fraction of 5% alumina aluminum paste;

[0046] (2). Under stirring at 100°C, the molar concentration of 100mL is that the titanium sulfate of 0.25mol / L and the sodium hydroxide solution that the mass fraction is 5% are added dropwise in the mixed slurry of step (1) gained simultaneously, control The rate of addition of titanium sulfate and sodium hydroxide, the rate of addition is the same as the evaporation rate of the solution, so that the liquid level of the reaction solution remains constant, and the pH of the reaction solution is 10; after the addition of titanium sulfate, stop adding hydrogen Sodium oxid...

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Abstract

The invention discloses a metatitanic acid-coated alumina core-shell abrasive grain polishing liquid composition. The core-shell abrasive grain polishing liquid composition comprises 0.024 to 0.24 wt% of metatitanic acid, 4 wt% of alumina, 0.04 wt% of sodium hexametaphosphate, and 95.72 to 95.936 wt% of deionized water. The polishing liquid composition comprises core-shell abrasive grains containing high hardness alumina as a core and low hardness metatitanic acid as a shell. The shell has low hardness so that hard impact produced by alumina to the surface of a sapphire substrate is reduced, polishing scratches and surface damage are reduced and surface roughness is reduced. Metatitanic acid and alumina on the surface of sapphire undergo a reaction so that a sapphire polishing rate is improved. The polishing liquid polishes the sapphire substrate so that a sapphire substrate surface removal rate is improved and sapphire surface roughness is reduced.

Description

technical field [0001] The invention relates to a metatitanic acid-coated aluminum oxide core-shell abrasive grain polishing liquid composition for sapphire CMP and a preparation method thereof, belonging to the technical field of surface polishing. Background technique [0002] Single crystal sapphire has very important uses in aerospace, military and medical treatment. At the same time, sapphire single crystal has become the main substrate material of light-emitting diodes because of its small lattice coefficient mismatch rate with semiconductor G(1)N, high mechanical strength, and low price. The substrate hardness depends on the surface processing quality of sapphire wafers. , so how to obtain an ultra-smooth, less-damaged sapphire wafer has become an urgent problem to be solved. [0003] At present, chemical mechanical polishing technology is generally used to precisely polish the surface of sapphire substrates. In the chemical mechanical polishing of sapphire, the abr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/302
CPCC09G1/02
Inventor 雷红王鑫王天仙董越刘婷婷陈怡
Owner 东莞市圣高机械科技有限公司
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