Method for low-temperature preparation of two-dimensional flexible ion-sensitive field effect transistor
An ion-sensitive field effect and transistor technology, which is applied in the direction of instruments, measuring devices, scientific instruments, etc., can solve problems such as complex process, high cost, and difficult control, and achieve the effect of improving interface characteristics, short manufacturing cycle, and low cost
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[0056] In order to make the object, technical solution and advantages of the present invention clearer, various embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. However, those of ordinary skill in the art can understand that, in each implementation manner of the present invention, many technical details are provided for readers to better understand the present application. However, even without these technical details and various changes and modifications based on the following implementation modes, the technical solution claimed in each claim of the present application can be realized.
[0057]The first embodiment of the present invention relates to a method for preparing a two-dimensional flexible ion-sensitive field effect transistor at low temperature. The following combined process figure 1 and gesture Figure 2~8 Be specific. like figure 1 As shown, the specific process includes the following step...
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