The invention belongs to the technical field of manufacturing of electrochemical sensor devices and particularly discloses a method for low-temperature preparation of a two-dimensional flexible
ion-sensitive
field effect transistor. The method includes: taking a flexible material as a substrate, depositing a graphic
metal layer on the substrate to serve as a back
electrode, growing an insulating
oxide layer on the back
electrode, and transferring a two-dimensional
semiconductor film on the insulating medium layer to serve as a
conductive channel of a device; forming graphic
metal layers on the two-dimensional
semiconductor film to serve as source and drain regions of the device; depositing a functional layer material above a channel area. By a
microwave annealing process for low-
temperature treatment, on the one hand, interface characteristics of
layers of the device can be improved so as to eliminate delaying and drifting caused by interface defects; on the other hand, by the aid of the
microwave absorption function of the functional layer material and a nano-structure functional layer at an interface of the two-dimensional
semiconductor film, applicability to sensing detection in different scenes can be realized. The
microwave annealing process has advantages of quickness, low thermal budget, short manufacturing period, low cost and the like.