An Electrolyte Gate Oxide Semiconductor Phototransistor for Ultraviolet Light Detection
An oxide semiconductor and phototransistor technology, applied in semiconductor devices, circuits, electrical components, etc., can solve problems such as reducing the ultraviolet-visible light rejection ratio, and achieve the goal of increasing the ultraviolet-visible light rejection ratio, reducing the working voltage, and improving the stability. Effect
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Embodiment 1
[0030] figure 1 It is a schematic diagram of the structure of the indium oxide thin film transistor ultraviolet light detector in the first embodiment of the present invention, and the substances in the figure have been marked in English.
[0031] The thin film transistor in Embodiment 1 can be manufactured as follows:
[0032] 1) Put the quartz substrate into the MOCVD epitaxial equipment to grow a 15nm indium oxide film. The specific growth conditions are as follows: trimethyl indium is used as the indium source, oxygen is used as the oxygen source, and the epitaxial growth temperature is 421 ° C. The pressure of the reaction chamber is controlled at 7.1 Torr, and the flow rate of trimethylindium is 3×10 -5 mol / min, the flow rate of oxygen is controlled at 7×10 -2 mol / min.
[0033] 2) Then, the grown indium oxide film is masked by photolithography, and the indium oxide is wet-etched to expose the desired shape of the active layer, so that the width-to-length ratio is 2100...
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