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Preparation method of high-temperature-resistant anti-static type release film

A technology of anti-static and release film, which is applied in the field of preparation of high-temperature resistant anti-static release film, can solve the problems of not being able to meet market requirements, poor high-temperature resistance, and poor anti-static performance, and achieve good heat resistance and high temperature resistance Improved performance and improved antistatic properties

Inactive Publication Date: 2018-03-06
李巧珍
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is to provide a method for preparing a high-temperature-resistant and anti-static release film in view of the defects that the current common release film has poor high temperature resistance and antistatic property and cannot meet market requirements

Method used

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  • Preparation method of high-temperature-resistant anti-static type release film

Examples

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Effect test

example 1

[0022] Mix deionized water, tetraethyl orthosilicate and absolute ethanol in a beaker at a volume ratio of 1:4:2, stir for 10 minutes at a temperature of 35°C to obtain a stirring liquid, and then add the stirring liquid to the beaker dropwise 3% by volume of hydrochloric acid with a mass fraction of 20%, continue to insulate and mix and stir for 18 minutes to obtain a reaction solution, put the reaction solution into an ultrasonic oscillator for ultrasonic oscillation for 20 minutes, leave it to age for 1 day, and discharge the material to obtain a self-made silica sol ;According to the mass ratio of 3:1:1, mix and stir bisphenol A epoxy resin, bismaleimide resin and cyanate resin for 16 minutes, heat up to 120°C to obtain a mixed resin, and then mix the mixed resin and The mass ratio of homemade silica sol is 2:1. Continue to keep warm and mix and stir for 45 minutes to obtain the modified epoxy resin; weigh 24g of graphite and grind it for 10 minutes and pass it through an 8...

example 2

[0024]Mix deionized water, tetraethyl orthosilicate and absolute ethanol in a beaker at a volume ratio of 1:4:2, and stir for 11 minutes at a temperature of 40°C to obtain a stirring liquid, and then add the stirring liquid to the beaker dropwise 3% by volume of hydrochloric acid with a mass fraction of 20%, continue to insulate and mix and stir for 22 minutes to obtain a reaction solution, put the reaction solution into an ultrasonic oscillator for ultrasonic oscillation for 25 minutes, leave it to stand and age for 1.5 days, and discharge to obtain self-made silica sol ;According to the mass ratio of 3:1:1, mix and stir bisphenol A epoxy resin, bismaleimide resin and cyanate resin for 18 minutes, heat up to 140°C to obtain a mixed resin, and then mix the mixed resin and The mass ratio of self-made silica sol is 2:1, continue to keep warm and mix and stir for 55 minutes, and obtain the modified epoxy resin; weigh 28g of graphite and grind it for 11 minutes, pass through an 80-...

example 3

[0026] Mix deionized water, tetraethyl orthosilicate and absolute ethanol in a beaker at a volume ratio of 1:4:2, stir for 12 minutes at a temperature of 45°C to obtain a stirring liquid, and then add the stirring liquid to the beaker dropwise 3% by volume of hydrochloric acid with a mass fraction of 20%, continue to insulate and mix and stir for 24 minutes to obtain a reaction solution, put the reaction solution into an ultrasonic oscillator for ultrasonic oscillation for 30 minutes, leave it to stand and age for 2 days, and discharge the material to obtain a self-made silica sol ;According to the mass ratio of 3:1:1, mix and stir bisphenol A epoxy resin, bismaleimide resin and cyanate resin for 20 minutes, heat up to 160°C to obtain a mixed resin, and then mix the mixed resin and The mass ratio of homemade silica sol is 2:1, and the heat preservation and mixing are continued for 60 minutes to obtain the modified epoxy resin; 32g of graphite is weighed and ground for 12 minute...

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Abstract

The invention relates to the technical field of film material preparation, in particular to a preparation method of a high-temperature resistant and antistatic release film. The invention uses modified epoxy resin as a matrix, self-made silver-loaded graphite powder and polyethylene terephthalate as accelerators, and supplemented with dimethyl silicone oil and ammonium persulfate to prepare a high-temperature-resistant and anti-static ionizer. Type film, first modify the epoxy resin, the bismaleimide resin and the cyanate resin are easy to form a triazine ring structure after heating, which enhances the high temperature resistance of the epoxy resin, because the silica sol contains Silicon, which can effectively isolate the contact between oxygen in the air and epoxy resin, thereby improving the high temperature resistance of the release film, and then use stannous chloride to sensitize the graphite powder, induce the reduction of silver ions to form silver simple substance, and adsorb on The surface of graphite powder improves the antistatic property of the release film, and the addition of polyethylene terephthalate further improves the antistatic property of the release film, which has a wide application prospect.

Description

technical field [0001] The invention relates to the technical field of film material preparation, in particular to a preparation method of a high-temperature resistant and antistatic release film. Background technique [0002] The release film refers to a film with a separable surface. The release film is not sticky or slightly sticky after contacting with a specific material under limited conditions. Release film, also known as peeling film, isolation film, separation film, adhesive barrier film, anti-adhesive film, etc. [0003] The release film includes a base film and a release layer. The base film is mostly made of paper or plastic film, and the release layer is mainly composed of silicon mixture. Usually, in order to increase the release force of the plastic film, the plastic film will be treated with plasma, or coated with fluorine, or coated with silicon release agent on the surface of the film material, such as PET, PE, OPP and so on. It can show extremely light ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L63/00C08L79/08C08L79/04C08L67/02C08L83/04C08K9/12C08K3/08C08K3/04C08K3/36C08K3/30C08J5/18
CPCC08J5/18C08J2363/00C08J2467/02C08J2479/04C08J2479/08C08J2483/04C08K3/04C08K3/30C08K3/36C08K9/12C08K2003/0806
Inventor 李巧珍杨明忠张建初
Owner 李巧珍
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