Preparation method of high-temperature-resistant anti-static type release film
A technology of anti-static and release film, which is applied in the field of preparation of high-temperature resistant anti-static release film, can solve the problems of not being able to meet market requirements, poor high-temperature resistance, and poor anti-static performance, and achieve good heat resistance and high temperature resistance Improved performance and improved antistatic properties
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example 1
[0022] Mix deionized water, tetraethyl orthosilicate and absolute ethanol in a beaker at a volume ratio of 1:4:2, stir for 10 minutes at a temperature of 35°C to obtain a stirring liquid, and then add the stirring liquid to the beaker dropwise 3% by volume of hydrochloric acid with a mass fraction of 20%, continue to insulate and mix and stir for 18 minutes to obtain a reaction solution, put the reaction solution into an ultrasonic oscillator for ultrasonic oscillation for 20 minutes, leave it to age for 1 day, and discharge the material to obtain a self-made silica sol ;According to the mass ratio of 3:1:1, mix and stir bisphenol A epoxy resin, bismaleimide resin and cyanate resin for 16 minutes, heat up to 120°C to obtain a mixed resin, and then mix the mixed resin and The mass ratio of homemade silica sol is 2:1. Continue to keep warm and mix and stir for 45 minutes to obtain the modified epoxy resin; weigh 24g of graphite and grind it for 10 minutes and pass it through an 8...
example 2
[0024]Mix deionized water, tetraethyl orthosilicate and absolute ethanol in a beaker at a volume ratio of 1:4:2, and stir for 11 minutes at a temperature of 40°C to obtain a stirring liquid, and then add the stirring liquid to the beaker dropwise 3% by volume of hydrochloric acid with a mass fraction of 20%, continue to insulate and mix and stir for 22 minutes to obtain a reaction solution, put the reaction solution into an ultrasonic oscillator for ultrasonic oscillation for 25 minutes, leave it to stand and age for 1.5 days, and discharge to obtain self-made silica sol ;According to the mass ratio of 3:1:1, mix and stir bisphenol A epoxy resin, bismaleimide resin and cyanate resin for 18 minutes, heat up to 140°C to obtain a mixed resin, and then mix the mixed resin and The mass ratio of self-made silica sol is 2:1, continue to keep warm and mix and stir for 55 minutes, and obtain the modified epoxy resin; weigh 28g of graphite and grind it for 11 minutes, pass through an 80-...
example 3
[0026] Mix deionized water, tetraethyl orthosilicate and absolute ethanol in a beaker at a volume ratio of 1:4:2, stir for 12 minutes at a temperature of 45°C to obtain a stirring liquid, and then add the stirring liquid to the beaker dropwise 3% by volume of hydrochloric acid with a mass fraction of 20%, continue to insulate and mix and stir for 24 minutes to obtain a reaction solution, put the reaction solution into an ultrasonic oscillator for ultrasonic oscillation for 30 minutes, leave it to stand and age for 2 days, and discharge the material to obtain a self-made silica sol ;According to the mass ratio of 3:1:1, mix and stir bisphenol A epoxy resin, bismaleimide resin and cyanate resin for 20 minutes, heat up to 160°C to obtain a mixed resin, and then mix the mixed resin and The mass ratio of homemade silica sol is 2:1, and the heat preservation and mixing are continued for 60 minutes to obtain the modified epoxy resin; 32g of graphite is weighed and ground for 12 minute...
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