Method for fabricating thin film circuits on warped co-fired ceramic substrate
A technology of thin-film circuits and co-fired ceramics, which is used in the manufacture of circuits, electrical components, semiconductor/solid-state devices, etc., can solve the uneven thickness of the dielectric layer and weaken the adhesion at the interface between the co-fired ceramic substrate and the organic dielectric layer of the thin-film circuit. , Substrate scrap, etc.
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[0027] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0028] Such as figure 2 As shown, a method for manufacturing a thin film circuit on a warped co-fired ceramic substrate comprises the following steps:
[0029] 1) The co-fired ceramic substrate is selected as a 10-layer LTCC instant-fired substrate. After the sintering furnace is taken out, it is stored in a clean box to avoid contamination. The warpage is 30 μm and the surface roughness is 250 nm; bake at 120 ° C for two hours before use. Spray BCB and cure: first spray BCB adhesion enhancer AP3000 with a molecular layer thickness, blow dry with nitrogen, then spray BCB3022-35 glue, and then cure in a nitrogen atmosphere furnace according to the BCB curing temperature curve, and the thickness after curing is 1 μm;
[0030] 2) Spray positive photoresist AZ4620 on the cured BCB dielectric layer, and use the laser beam of 355nm laser drilling ...
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