Trace explosive and narcotics detector and method of use thereof
A detector and explosive technology, applied in the field of trace explosives and drug detectors, can solve the problems of only one-time use, difficult recycling, gas detection, etc., and achieve the effects of low cost, ultra-high sensitivity and simple structure
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Embodiment 1
[0066] 1. Clean the substrate 3. Take a 2-inch silicon wafer, ultrasonically clean it with acetone, ethanol, and deionized water for ten minutes, and dry it in a nitrogen stream. The schematic diagram of the silicon wafer is as follows: figure 2 shown.
[0067]2. Photolithography process. A layer of photoresist was spin-coated on the 3 sides of the substrate using a KW-5 homogenizer of the Institute of Microelectronics, Chinese Academy of Sciences. The gluing process is to rotate at a low speed of 800 rpm for 10 seconds; then rotate at a high speed of 3000 rpm for 50 seconds. Remove the substrate and place it on a hot plate at 120°C for 60 s. Take out the substrate 3, and use the MA6 ultraviolet lithography machine of the German SUSS company to perform photolithography on the substrate 3. The total size of the photolithography plate is a square array of 5cm×5cm, and the material of the photolithography plate is a quartz glass plate coated with a square Cr metal thin film a...
Embodiment 2
[0081] 1. Clean the substrate 3. Take a 2-inch quartz plate, ultrasonically clean it with acetone, ethanol, and deionized water for ten minutes in sequence, and dry it in a nitrogen stream.
[0082] 2. Photolithography process. A layer of photoresist was spin-coated on the surface of the substrate 3 using a KW-5 homogenizer of the Institute of Microelectronics, Chinese Academy of Sciences. The gluing process is to rotate at a low speed of 800 rpm for 10 seconds; then rotate at a high speed of 3000 rpm for 50 seconds. The substrate 3 was removed, placed on a 120°C electric hot plate and baked for 60 s. Take out the substrate 3, and use the MA6 ultraviolet lithography machine of the German Suss company to perform photolithography on the substrate 3. The total size of the photolithography plate is a square array of 5cm×5cm, and the material of the photolithography plate is a quartz glass plate coated with a square Cr metal thin film array. The size of each square figure is 50×...
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