NiO/Fe<2>O<3> composite electrode and preparation method thereof
A composite electrode, fe2o3 technology, applied in the direction of hybrid capacitor electrode, hybrid/electric double layer capacitor manufacturing, battery electrode, etc., can solve the problems of long reaction time, limited application and promotion, poor charge separation ability, etc., to achieve convenient Large-scale production, reduced electron recombination, strong adhesion effect
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Embodiment 1
[0020] Ultrasonic cleaning the iron wire in dilute hydrochloric acid, deionized water, and absolute ethanol for 1-10 minutes, and drying to obtain a clean iron wire;
[0021] Oxidize the clean iron wire at 450°C for 4 hours in an air atmosphere, and let it cool down to room temperature naturally after the high temperature oxidation to obtain the iron oxide nanowire array; put the above materials into a magnetron sputtering apparatus for Ni layer Plating, use metal nickel target, sputtering power is 8~10kw, use argon as working gas, vacuumize before sputtering, vacuum degree is (1-20)×10 -2 Pa, the vacuum degree after filling with argon is 10-50Kpa, the flow rate of argon is 150-300sccm, the substrate bias is -100-0V, the duty cycle is 50%, the coating temperature is 100-150℃, the thickness of the metal nickel layer 10nm; the nickel-plated iron wire was oxidized at a temperature of 450°C for 4h to obtain NiO / Fe 2 o 3 composite electrode.
[0022] The NiO / Fe prepared in the a...
Embodiment 2
[0025] Ultrasonic cleaning the iron wire in dilute hydrochloric acid, deionized water, and absolute ethanol for 1-10 minutes, and drying to obtain a clean iron wire;
[0026] Oxidize the clean iron wire at 600°C for 5 hours in an air atmosphere, and let it cool down to room temperature naturally after the high temperature oxidation to obtain the iron oxide nanowire array; put the above materials into a magnetron sputtering apparatus for Ni layer Plating, use metal nickel target, sputtering power is 8~10kw, use argon as working gas, vacuumize before sputtering, vacuum degree is (1-20)×10 -2 Pa, the vacuum degree after filling with argon is 10-50Kpa, the flow rate of argon is 150-300sccm, the substrate bias is -100-0V, the duty cycle is 50%, the coating temperature is 100-150℃, the thickness of the metal nickel layer is 60nm; the nickel-plated iron wire is oxidized at a temperature of 500°C for 2h to obtain NiO / Fe 2 o 3 composite electrode.
Embodiment 3
[0028] Ultrasonic cleaning the iron wire in dilute hydrochloric acid, deionized water, and absolute ethanol for 1-10 minutes, and drying to obtain a clean iron wire;
[0029] Oxidize the clean iron wire at 800°C for 8 hours in an air atmosphere, let it cool down to room temperature naturally after the high temperature oxidation, and you can get the iron oxide nanowire array; put the above materials into the magnetron sputtering apparatus for Ni layer Plating, use metal nickel target, sputtering power is 8~10kw, use argon as working gas, vacuumize before sputtering, vacuum degree is (1-20)×10 -2 Pa, the vacuum degree after filling with argon is 10-50Kpa, the flow rate of argon is 150-300sccm, the substrate bias is -100-0V, the duty cycle is 50%, the coating temperature is 100-150℃, the thickness of the metal nickel layer is 100nm; the nickel-plated iron wire is oxidized at a temperature of 650°C for 3h to obtain NiO / Fe 2 o 3 composite electrode.
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