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Porous aluminum macroscopic body and manufacturing system and method thereof

A manufacturing system, porous aluminum technology, applied in the manufacture of hybrid/electric double-layer capacitors, electrode carriers/current collectors, structural parts, etc., can solve the problem of inability to achieve simultaneous sputtering of large-area samples, and the rising cost of water removal from porous polyurethane films , the melting of porous polyurethane film, etc., to achieve the effect of low cost, high speed and improved tensile strength

Active Publication Date: 2018-09-11
ZHONGTIAN SUPERCAPACITOR TECH CO LTD +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

It also increases the cost of water removal for porous polyurethane membranes
The pure physical sputtering method overcomes the shortcomings of electrochemical aluminum plating, but its equipment is limited in size and cannot realize simultaneous sputtering of large-area samples, and the aluminum deposition rate is too slow
In addition, there is a method of high-temperature physical vaporization of aluminum in the industry, but high-temperature aluminum vapor will directly cause the melting of porous polyurethane film, and no qualified samples can be obtained.

Method used

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  • Porous aluminum macroscopic body and manufacturing system and method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Such as figure 1 As shown, a porous polyurethane film with a thickness of 0.5mm, a width of 1mm, and an aspect ratio of 400000:1 is wound on the reel a of the subsystem 5, and is fed into the magnetron sputtering subsystem 1 at a speed of 1cm / min. In an inert gas (argon) environment with an absolute pressure of 5Pa and an absolute pressure of 5Pa, the surface power of the aluminum target is controlled to be 2W / cm 2 , onto one side of the porous polymer film was deposited successively by sputtering an aluminum layer with a thickness of 1 nm. Start the high-temperature aluminum vapor subsystem 2, in which the aluminum particles are always melted at 600°C in the melting pool, and become aluminum vapor (partial pressure 0.1%) in the presence of inert gas (nitrogen). The inert gas carries the aluminum vapor and moves to the low temperature aluminum deposition subsystem 3 . Set the temperature of the low-temperature aluminum deposition subsystem 3 to 200°C, and continuously...

Embodiment 2

[0034] Such as figure 1 As shown, a porous PVDF film with a thickness of 30 mm, a width of 500 mm, and an aspect ratio of 400:1 is wound on the reel a of the subsystem 5, and fed into the magnetron sputtering subsystem 1 at a speed of 20 cm / min. , In an inert gas (argon) environment with an absolute pressure of 0.5Pa, control the surface power of the aluminum target to 10W / cm 2, onto one side of the porous polymer film was continuously deposited by sputtering an aluminum layer with a thickness of 500 nm. Start the high-temperature aluminum vapor subsystem 2, in which the aluminum particles are always melted at 800°C in the melting pool, and become aluminum vapor (partial pressure 10%) in the presence of an inert gas (nitrogen). The inert gas carries the aluminum vapor and moves to the low temperature aluminum deposition subsystem 3 . Set the temperature of the low-temperature aluminum deposition subsystem 3 to 300°C, and continuously send the film from the magnetron sputteri...

Embodiment 3

[0037] Such as figure 1 As shown, a porous PTFE film with a thickness of 5 mm, a width of 50 mm, and an aspect ratio of 4000:1 is wound on the reel a of the subsystem 5, and is fed into the magnetron sputtering subsystem 1 at a speed of 10 cm / min. , In an inert gas (argon) environment with an absolute pressure of 2Pa, control the surface power of the aluminum target to 5W / cm 2 , onto one side of the porous polymer film was continuously deposited by sputtering an aluminum layer with a thickness of 100 nm. Start the high-temperature aluminum vapor subsystem 2, in which the aluminum particles are always melted at 700°C in the melting pool, and become aluminum vapor (partial pressure 3%) in the presence of an inert gas (argon). The inert gas carries the aluminum vapor and moves to the low temperature aluminum deposition subsystem 3 . Set the temperature of the low-temperature aluminum deposition subsystem 3 to 250°C, and continuously send the film from the magnetron sputtering s...

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Abstract

The invention discloses a porous aluminum macroscopic body and a manufacturing system and method thereof. The porous aluminum macroscopic body is a three-dimensional all-through hole structure formedby connecting hollow aluminum wires; the hollow aluminum wires have a wall thickness of 7-100 micrometers; and the overall porosity of the porous aluminum macroscopic body is 85-99%, the tensile strength is 0.4-2MPa, and the compressive strength is 1-3.5Mpa. The manufacturing system includes a magnetron sputtering subsystem, a high temperature aluminum vapor subsystem, a low temperature aluminum deposition subsystem, an aluminum vapor recovery subsystem, and a porous polymer film conveying subsystem. The manufacturing method comprises: rapidly sputtering an aluminum layer having the thicknessof 1-500 nm on a porous polymer film by using the magnetron sputtering method; placing the aluminum layer in a low-pressure physical vapor deposition apparatus; and continuously depositing the aluminum layer, and decomposing the polymer film in situ to obtain the porous aluminum macroscopic body when the thickness of the aluminum layer is 7-100 micrometers. The porous aluminum macroscopic body hasthe advantages of flexible void ratio adjustment and high strength; and the manufacturing method is short in manufacturing time, the requirement for the porous polymer film is low, pretreatment can be avoided, continuous operation can be achieved, and the cost is low.

Description

technical field [0001] The invention belongs to the technical field of electrochemical energy storage and metal processing, and in particular relates to a porous aluminum used in an electrochemical energy storage system and a manufacturing system and method. Background technique [0002] At present, supercapacitors and various secondary batteries are the key research areas of clean electrochemical energy storage in the world. They have the characteristics of reversible charge and discharge, so that they can store energy and be used to drive various power equipment, such as vehicles and lifting machinery. , wind power blades, various circuit switches, and various power supplies. The common structural characteristics of supercapacitors and various secondary batteries or their hybrid products are that they have active materials, positive and negative electrodes, diaphragms, and current collectors. In traditional processing methods, non-porous, flat, mechanically strong, and co...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01G11/70H01G11/84H01M4/80C23C14/20C23C14/24C23C14/35
CPCH01M4/80H01G11/70H01G11/84C23C14/205C23C14/24C23C14/35H01G11/68H01M4/661H01M4/668H01M4/74C23C14/025C23C14/562Y02E60/10H01G11/26H01G11/24H01G11/28C23C14/046C23C14/20C23C14/5873H01M4/762
Inventor 骞伟中薛济萍杨周飞尤伟任金鹰顾孙望
Owner ZHONGTIAN SUPERCAPACITOR TECH CO LTD
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