[010]-directional bismuth vanadate nanotube crystal array growing on transparent conductive substrate and preparation and application thereof
A transparent conductive, crystal array technology, applied in the direction of catalyst activation/preparation, hydrogen production, chemical instruments and methods, etc., can solve the problems of development of high-performance semiconductor devices, insufficient surface area, loss, etc., to facilitate charge transport, The effect of large specific surface area and excellent electron transport speed
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0047] Example 1: [010] BiVO grown on a transparent conductive substrate 4 Preparation of Nanotube Crystal Array
[0048] Weigh 2.5mmol of bismuth nitrate, 2.5mmol of ammonium metavanadate and 5.0mmol of citric acid and dissolve in 7mL of HNO with a volume fraction of 23.3% 3 In the solution, stir for 15 minutes; take 7mL of the above solution into a 25mL glass beaker, add 1.2g PEG-6000 and 2mL acetic acid, seal and stir until it is completely dissolved, then let stand for 1 hour to obtain a viscous BiVO 4 Blue seed liquid
[0049] Using spin coating method, rotate speed 3000r / min, keep 30s, add 200μL BiVO in step (1) 4 The seed liquid was spin-coated on a clean transparent conductive substrate FTO glass and placed in a muffle furnace, heated to 450°C at a rate of 2°C / min, and calcined for 5 hours to obtain BiVO 4 The seed layer is placed in the PTFE lining of the reactor;
[0050] In a 50mL glass beaker, add 12mL deionized water and 3mL, with a mass fraction of 68% concentrated HNO 3...
Embodiment 2
[0053] Example 2: [010] BiVO grown on a transparent conductive substrate 4 Preparation of Nanotube Crystal Array
[0054] Weigh 4.5mmol of bismuth nitrate, 4.5mmol of ammonium metavanadate and 8.5mmol of citric acid and dissolve in 12mL of HNO with a volume fraction of 23.3% 3 In the solution, stir for 15min; take 10mL of the above solution into a 25mL glass beaker, add 1.2g PEG-6000 and 2.5mL acetic acid, seal and stir until it is completely dissolved, then let it stand for 1 hour to obtain a viscous BiVO 4 Blue seed liquid
[0055] Using spin coating method, rotating speed 3000r / min, keep for 40s, add 200μL of BiVO in step (1) 4 The seed liquid was spin-coated on a clean transparent conductive substrate FTO glass and placed in a muffle furnace, heated to 500°C at a rate of 2°C / min, and calcined for 7 hours to obtain BiVO 4 The seed layer is placed in the PTFE lining of the reactor;
[0056] In a 50mL glass beaker, add 16mL deionized water and 4mL, with a mass fraction of 68% concent...
Embodiment 3
[0059] Example 3: [010] BiVO grown on a transparent conductive substrate 4 Preparation of Nanotube Crystal Array
[0060] Weigh 2.5mmol of bismuth nitrate, 2.5mmol of ammonium metavanadate and 5.0mmol of citric acid and dissolve in 7mL of HNO with a volume fraction of 23.3% 3 In the solution, stir for 15 minutes; take 7mL of the above solution into a 25mL glass beaker, add 0.9g PEG-6000 and 2mL acetic acid, seal and stir until it is completely dissolved and then stand for 1 hour to obtain a viscous BiVO 4 Blue seed liquid
[0061] Using spin coating method, rotating speed 4000r / min, keeping for 30s, add 350μL BiVO in step (1) 4 The seed liquid was spin-coated on a clean transparent conductive substrate FTO glass and placed in a muffle furnace, heated to 450°C at a rate of 2°C / min, and calcined for 5 hours to obtain BiVO 4 The seed layer is placed in the PTFE lining of the reactor;
[0062] In a 50mL glass beaker, add 3mL of 68% concentrated HNO 3 , 6mL of deionized water and 6mL of mo...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com