Manufacturing method of surface enhanced Raman scattering substrate based on aluminum nitride nano structure

A surface-enhanced Raman and nanostructure technology, applied in the field of nanomaterials, can solve the problems of unfavorable mass production of disposable SERS substrates, small longitudinal depth of nanostructures on the substrate surface, cumbersome preparation process, etc., to reduce detection costs, The effect of low cost and high process repeatability

Active Publication Date: 2018-10-23
SHANDONG UNIV OF SCI & TECH
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Problems solved by technology

[0007] However, the main disadvantages of the above technical solutions are: (1) the longitudinal depth of the nanostructure on the surface of the substrate is small, which is not conducive to the adsorption of more substances to be tested; (2) the preparation process is cumbersome, and the silicon substrate and anodized aluminum template used Or the high cost of plasma dry etching is not conducive to mass production of disposable SERS substrates

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  • Manufacturing method of surface enhanced Raman scattering substrate based on aluminum nitride nano structure
  • Manufacturing method of surface enhanced Raman scattering substrate based on aluminum nitride nano structure
  • Manufacturing method of surface enhanced Raman scattering substrate based on aluminum nitride nano structure

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Embodiment 1

[0043] A method for manufacturing a surface-enhanced Raman scattering substrate based on aluminum nitride nanostructures, comprising the following steps:

[0044] (1) Prepare the glass substrate and clean and dry it;

[0045] The aluminum nitride film with (100) texture is prepared on the substrate by magnetron sputtering method, the thickness is 100nm, and the process flow is as follows:

[0046] (i) Magnetron sputtering background vacuum pumped to less than 10 -3 Pa.

[0047] (ii) Applying a reverse bias voltage to perform plasma bombardment cleaning on the surface of the glass substrate to increase the binding force with the aluminum nitride film.

[0048] (iii) Use a high-purity aluminum target for reactive sputtering in a mixed atmosphere of nitrogen and argon. The preferred process parameters are: the volume ratio of nitrogen and argon is 7:3, the pressure of the sputtering atmosphere is 5Pa, and the sputtering power density is 4W / cm 2 .

[0049] (iv) After the spu...

Embodiment 2

[0057] A method for manufacturing a surface-enhanced Raman scattering substrate based on aluminum nitride nanostructures, comprising the following steps:

[0058] (1) Prepare the glass substrate and clean and dry it;

[0059] The aluminum nitride film with (002) texture is prepared on the substrate by magnetron sputtering method, the thickness is 200nm, and the process flow is as follows:

[0060] (i) Magnetron sputtering background vacuum pumped to less than 10 -3 Pa.

[0061] (ii) Applying a reverse bias voltage to perform plasma bombardment cleaning on the surface of the glass substrate.

[0062] (iii) Sputtering deposited tungsten metal with a thickness of 100 nanometers as a lattice mismatch buffer layer between (002) textured aluminum nitride and glass;

[0063] Use high-purity aluminum targets for reactive sputtering in a mixed atmosphere of nitrogen and argon, the volume ratio of nitrogen and argon is 2:8, the pressure of the sputtering atmosphere is 0.5Pa, and the ...

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Abstract

The invention relates to a manufacturing method of a surface enhanced Raman scattering substrate based on an aluminum nitride nano structure. The method includes the steps of firstly, preparing a (100)-texture aluminum nitride film or a (002)-texture aluminum nitride film on a substrate; secondly, using a strong base solution to etch the aluminum nitride film to obtain the aluminum nitride nano structure; thirdly, using mixed liquid of concentrated nitric acid and hydrogen peroxide to perform hydroxylation on the surface of the aluminum nitride nano structure; fourthly, using a reduced-pressure aminopropyltriethoxysilane vapor deposition method to perform amino group modification on the surface of the hydroxylated aluminum nitride nano structure to obtain the amino modified aluminum nitride nano structure; fifthly, assembling gold nanoparticles to the surface of the amino modified aluminum nitride nano structure to obtain the surface enhanced Raman scattering substrate based on the aluminum nitride nano structure. The manufacturing method has the advantages that the aluminum nitride film have sufficient thickness is used to form the nano structure, large adsorption surface area isachieved, more to-be-tested molecules can be gathered, Raman scattering strength can be increased, the nano structure can be controlled through etching conditions, and accordingly a controllable Ramanenhancing effect can be obtained.

Description

technical field [0001] The invention relates to the technical field of nanometer materials, in particular to a method for manufacturing a surface-enhanced Raman scattering substrate. Background technique [0002] Surface-Enhanced Raman Scattering (SERS) spectroscopy is a trace analysis technique with great application potential in the fields of electrochemistry, environmental analysis and biomedicine. By constructing a rough metal surface, the adsorbed compound is excited by the surface localized plasmons to cause electromagnetic enhancement, and the atomic clusters and adsorbed molecules on the rough surface form Raman-enhanced active sites. Raman scattering greatly enhances the spectral intensity. SERS technology has the advantages of selectivity and ultra-sensitivity of fingerprinting. The key issue to realize the wide application of this technology is to prepare SERS substrates with extremely high Raman enhancement ability, spectral reproducibility and large-area unifo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65
CPCG01N21/658
Inventor 陈达王鸿飞王璟璟王鹏
Owner SHANDONG UNIV OF SCI & TECH
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